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• A new P-type transparent conductive LaSe 2 film with excellent photoelectric properties is found. • A novel two-step method is used to prepare LaSe 2 film. • Effect of annealing time on their photoelectric properties is investigated. • Results indicate that the best annealing time is 2 h. LaSe 2 films were prepared on sapphire (0001) substrates by combining magnetron sputtering and selenized annealing. The influence of selenized annealing time on the structures and photoelectric properties of the thin films were investigated using glancing incident X-ray diffraction, fourier transform infrared spectrometry and Hall effect measurements. The results showed that the film had a perfect monoclinic structure and a smooth surface morphology. The average transmittance in the mid-infrared range was greater than 55%, and the highest was 65%. The LaSe 2 films had a higher carrier concentration (∼1019 cm−3) and conductivity (∼1.9 S/cm) than those of other P-type transparent conductive films, which showed that LaSe 2 was a potential new P-type material. [ABSTRACT FROM AUTHOR]

Abstract Transparent electronic technology has many urgent optoelectronic device applications. A key component of plasmonic materials in conventional semiconductors is the wide band gap of oxide thin films. Although transparent electronic materials have been developed for visible and near-infrared wavelengths, systems incorporating mid-infrared and far-infrared spectra are difficult to achieve. In this study, hydrated magnesium-carbon films, a new type of non-oxide transparent conductive thin films with a magnesium hydroxide structure, were generated using the three-step method. After annealing treatment, larger crystals in the thin films typically exhibited superior film resistivity, with conductivity values of approximately 8.63 × 10−3 Ω m. Due to the free electron concentration was not more than 1020 cm−3, the films demonstrated excellent optical properties, with plasma wavelength values of approximately 8 μm for infrared transmittance above 70%. After annealing, due to the Moss-Burstein (M-B) effect, the visible light transmittance was greater than 85% and the optical bandgap shifted towards the blue region. In addition, the influences of the sputtering power of the carbon target on the properties of hydrated magnesium-carbon film were also discussed in this paper. Graphical abstract Image 1 Highlights • We prepare hydrated magnesium-carbon films using the three-step method. • We analyze the effect of annealing on structural, electrical, and optical features. • Annealing leads to crystal growth, superior film resistivity, and good conductivity. • Films exhibit excellent optical properties, particularly for far-infrared ranges. • The films can replace TCO in the application of optical-electronic devices. [ABSTRACT FROM AUTHOR]

Graphical abstract Highlights • A novel two-step method is developed to grow 2D Mg(OH) 2 nanoflakes. • The proposed method is environmentally benign. • The method does not require catalysts or harsh acid-base conditions. • The Mg(OH) 2 films had a crystalline hexagonal structure is dominant. • The water contact angle of 139° showed the good hydrophobicity of the film. Abstract A novel and environmentally benign two-step method has been developed to grow 2D magnesium hydroxide (Mg(OH) 2) nanoflakes. Our method relies on the deposition of Mg films by magnetron sputtering, followed by reaction with water vapor, and does not require any catalyst or harsh acid-base conditions. The 2D nanoflake surface morphology with a crystalline hexagonal structure was dominant on the Mg(OH) 2 films. The water contact angle on the film was ∼139°, which testified the good hydrophobicity of Mg(OH) 2 films due to the nanoflake surface. The self-cleaning effect of contaminant particles on hydrophobic Mg(OH) 2 films was analyzed. Compared with other preparation methods, this two-step method is more efficient, cleaner, and simpler, which make it suitable for complex or large-area substrate surfaces. In addition, this method can be applied to other metal hydroxides or oxides. [ABSTRACT FROM AUTHOR]

Vanadium pentoxide (V 2 O 5) films were deposited on sapphire substrates by radio frequency (R.F.) magnetron sputtering at 450 °C and annealed in various ambient atmospheres. The influence of ambient atmospheres on the structure, optical properties, and morphology of the thin films after annealing were characterized, and the transition behaviors in the annealing process were investigated by DSC, temperature-dependent Raman and FTIR. The results demonstrated that V 2 O 5 films underwent four different transition behaviors during post-deposition annealing due to the different oxygen proportion of ambient. Different products (VO 2 (B), VO 2 (R)) in the transition process were the main reason for the evolution of optical properties. No transition behaviors occurred because of the oxygen-rich ambient when annealed in air, and no significant change in infrared transmittance was observed. When annealed in 0.1% O 2 /Ar, the film was converted to VO 2 (B) with the decrease of infrared transmittance. In the case of 0.01% O 2 /Ar, metastable VO 2 (B) and VO 2 (R) were observed as intermediate crystalline phases before V 2 O 5 finally transformed to VO 2 (M), and the changes in the three stages of two drops and one rise were shown in infrared transmittance. While annealed in pure argon ambient, V 2 O 5 was turned into VO 2 (R) and VO 2 (M) without VO 2 (B) phase production, accompanied by a single change of infrared transmittance reduction and recovery. This provides a more detailed vanadium oxide thermal transition process and shows data reference for the preparation technology and application of vanadium oxide materials. • V 2 O 5 films were deposited on sapphire substrates by radio frequency (R.F.) magnetron sputtering; • Effect of the different oxygen proportion during annealing on thermal transition behaviors was investigated in detail by temperature-dependent Raman and FTIR; • The annealed V 2 O 5 films were transformed into V 2 O 5 , VO 2 (B), and VO 2 (M) by different thermal transition behaviors; • VO 2 (M) films with excellent thermochromic properties can be obtained by controlling the annealing atmosphere and temperature. [ABSTRACT FROM AUTHOR]

In this paper, the single-doped (Ni-WO 3 and Ti-WO 3) and binary-doped (Ni-Ag-WO 3 and Ti-Ag-WO 3) amorphous WO 3 thin films were respectively prepared on indium-doped tin oxide conductive glass substrates by radio-frequency magnetron sputtering. Among the single-doped WO 3 thin films, the electrochromic (EC) properties of films can be enhanced by the presence of Ni or Ti. However, the low conductivity of WO 3 limits its application in EC devices. A novel approach was proposed to ameliorate this disadvantage which has not been explored, that is, the highly conductive Ag was introduced into WO 3 films with Ni or Ti. The experimental results show that the addition of Ag reduces the charge transfer resistance and shortens the ion diffusion path length, thereby improving the EC response time (Ni-Ag-WO 3 : t b =1.16 s; Ti-Ag-WO 3 : t c =4.14 s), electrochemical active area, and ion diffusion coefficients (Ni-Ag-WO 3 : D a =3.032 × 10−9 cm2/s; Ti-Ag-WO 3 : D c =7.737 × 10−9 cm2/s). Based on these work, the feasibility of Ni-Ag and Ti-Ag binary-doped WO 3 films was confirmed. These discoveries contribute to the exploration of preparing high-performance WO 3 EC films for the practical applications of EC devices such as in automatic anti-glare rearview mirrors. [ABSTRACT FROM AUTHOR]

Interface engineering has emerged as a fertile and efficacious approach to turn functional properties in the field of film systems. In this work, the interfacial properties of sputtered yttrium oxide films on zinc sulfide substrate (Y 2 O 3 /ZnS) were analyzed by transmission electron microscopy (TEM), X-ray photoelectron spectrum (XPS) depth profile and nano-scratch measurement. An interface layer with the depth of 20 nm between Y 2 O 3 film and ZnS substrate was directly observed by TEM. Under different film growth conditions, although the interfacial features including interfacial width and composition distribution exhibit similar behavior, it is found that higher cohesive strength is obtained under a special substrate bias voltage of −160 V at low substrate temperature. Such an enhanced mechanical property can be understood by the role of physisorbed oxygen in the interfacial region, in which less physisorbed oxygen with van der Waals bonds leads to a strong adhesion. Our results provide a favorable strategy to achieve strong adhesion between oxide and sulfide at low temperature, which are urgent in future micro-electric applications. [ABSTRACT FROM AUTHOR]

Molybdenum doped zinc oxide thin films have been prepared by RF magnetron sputtering. The influence of the film thickness (120–500 nm) on the structural, electrical, and optical properties of the films is investigated respectively. X-ray diffraction (XRD) studies reveal that with an increase in the film thickness, the crystallinity of the film improves. The obtained film with thickness of 500 nm exhibits the best electrical properties with the lowest resistivity of around 9.6 × 10 −4 Ω cm. The mobility varied from 7.8 to 14.7 cm 2 V −1 s −1 without reducing the achieved high carrier concentration of ∼4.5 × 10 20 cm −3 . Optical band gaps extracted from transmission spectra shows irregular changes due to the Burstein–Moss shift modulated by many-body effects. [ABSTRACT FROM AUTHOR]

[Display omitted] • Highly crystalline In 2 O 3 films are grown by pulsed reactive magnetron sputtering. • Substrate heating further improves the film crystallinity and conductivity. • 400 °C is the limit for benefiting to obtain the optimum crystallinity of In 2 O 3 films. • The films deposited at 400 °C yield the lowest resistivity of 1.28 × 10-4 Ω⋅cm. • An average transmittance of greater than 80% are also obtained at 400 °C. A transparent conductive oxide (TCO) should have a combination of high electrical conductivity and optical transmission property to fulfill the challenging demands of industrial applications. So far, doped TCOs have been mostly considered to fulfill the technological challenges. In this study, we demonstrate that indium oxide (In 2 O 3) thin films without intentional doping can be deposited with high crystallinity under specific film growth conditions leading to thin films with high mobility, high electrical conductivity, and high transmittance. In 2 O 3 thin films have been deposited by reactive pulsed direct current magnetron sputtering (pulsed DCMS) from an indium target on substrates in a temperature range from room temperature (RT) to 600 °C. Detailed investigations on In 2 O 3 thin films are performed and the film properties such as crystallinity, microstructure, chemical bonding states, electrical and optical properties are revealed. Enhanced plasma density and ionization degree provided by the employed reactive pulsed DCMS and the intentional substrate heating during the thin film deposition give possibility to deposit highly crystalline thin films which are preferentially oriented in (2 2 2) direction. The substrate heating enhances the crystallinity of the grown films up to a certain optimum temperature: 400 °C. When the substrate temperature is above 400 °C, the carrier concentration and mobility decrease due to the grain refinement effect caused by growth competition of grains in different orientations. The films grown at 400 °C indicate the presence of high oxygen vacancy concentrations, which can directly be associated with a high charge carrier concentration despite the lack of intentional doping. The undoped In 2 O 3 films in this study grown at 400 °C show highly promising and competitive electrical properties such as low resistivity of 1.28 × 10-4 Ω⋅cm and the high carrier mobility of 69 cm2/Vs. The average transmittance of the In 2 O 3 films with the highest conductivity is found to be greater than 80% in the visible to the near-infrared spectral region owing to an enhancement in the carrier mobility and an optical bandgap in the range from 3.61 eV to 3.77 eV. [ABSTRACT FROM AUTHOR]

• A self-powered vertical heterojunction photodetector based on n-SnOx/p-diamond was fabricated by RF sputtering. • The device has a peak response at 350 nm and responds to light wavelength in the 250–500 nm range at zero bias. • Analysis of the detection mechanism of the n-SnOx/p-diamond heterojunction photodetector. High-performance self-powered UV-blue photodetector was fabricated based on n-SnO x /p-diamond heterojunction. The SnO x film was deposited on the high temperature and high pressure synthetic boron doped diamond wafer by RF magnetron sputtering. This heterojunction device exhibits a good rectification behavior with a rectification ratio of 3.15 × 104 at ±3 V. At zero bias, the device responds in the wavelength ranging from 250 nm to 500 nm with a peak response at 350 nm. The photoresponse rise time and decay time of the device are both less than 2 s under UV-blue illumination with different wavelengths. These results demonstrate that the n-SnO x /p-diamond heterojunction device has potential applications in the field of UV-blue detection. [ABSTRACT FROM AUTHOR]