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The deposition of thin Cadmium Telluride (CdTe) layers was performed by a chamberless metalorganic chemical vapour deposition process, and trends in growth rates were compared with computational fluid dynamics numerical modelling. Dimethylcadmium and diisopropyltelluride were used as the reactants, released from a recently developed coating head orientated above the glass substrate (of area 15 × 15 cm2). Depositions were performed in static mode and dynamic mode (i.e., over a moving substrate). The deposited CdTe film weights were compared against the calculated theoretical value of the molar supply of the precursors, in order to estimate material utilisation. The numerical simulation gave insight into the effect that the exhaust's restricted flow orifice configuration had on the deposition uniformity observed in the static experiments. It was shown that > 59% of material utilisation could be achieved under favourable deposition conditions. The activation energy determined from the Arrhenius plot of growth rate was ~ 60 kJ/mol and was in good agreement with previously reported CdTe growth using metalorganic chemical vapour deposition (MOCVD). Process requirements for using a chamberless environment for the inline deposition of compound semiconductor layers were presented. [ABSTRACT FROM AUTHOR]

CO 2 absorption by a confined free film has been investigated using the CFD approach. Particular attention focuses on the relationship between mass transfer and flow behaviour of the confined free film. Simulation results show that the average K L value grows 26.9% for the open window region and 17.4% for the lower-wall region, respectively, in comparison to the values in the upper-wall region, and the average K L value of confined free film along the flow direction is about 19.2% higher than the value of wall-bounded film, which affirms that the use of an open window can significantly enhance mass transfer performance and such effect also has impact on the entire regions. It was revealed that there exist two types of vortices inside the film, inner vortices and interfacial vortices. In addition, a correlation coefficient R Ωc is proposed to provide a quantitative measure to characterise the relationship between the local mass concentration profile and vorticity distribution of confined free film. Simulation shows that the average value of R Ωc is 0.93, indicating that the two parameters are highly correlated. Furthermore, the cause of lower correlation coefficient value is discussed. [ABSTRACT FROM AUTHOR]

The flow behaviour under the influence of susceptor moving speed is a key factor for the fabrication of high-quality cadmium telluride (CdTe) thin films during the inline metal-organic chemical vapour deposition (MOCVD) process. The main purpose of this paper is to find a method to study the real-time dynamics of transport phenomena inside the reactor. The sliding mesh method is thus proposed and its feasibility is evaluated using computational fluid dynamics (CFD) modelling. A computational grid with 173,400 hexahedral cells is adopted through a grid sensitivity test validation. The simulations show that comparing to 2D modelling, the results of 3D modelling are found to be in good agreement with the experimental data for the temperature range of 628–728 K. Based on the velocity field, the temperature field and distribution of species concentration under different sampling time intervals of 60, 180 and 300 s, the thin film uniformity on both edges of the substrate is found to be influenced by the side effect of the baffle plate. The mass deposited on the substrate is further investigated under different susceptor moving speeds from 0.75 to 2.25 cm/min, and a moving speed between 0.75 to 1.13 cm/min is found to be effectively beneficial to the deposition process. [ABSTRACT FROM AUTHOR]

For the simulation of industrial-scale bubble column reactors, while modelling the gas distributor as uniform inlets oversimplifies the inhomogeneity introduced by inlets, the direct simulation of the full geometry of gas distributor or sparger brings about enormous pre-processing work and huge computational cost. A new inlet model is therefore proposed in this paper to simplify the modelling of gas distributor and meanwhile maintain the simulation accuracy. The new inlet model is validated by the comparison of the model prediction with experiments and the CFD simulation incorporating the full geometry of gas distributor for bubble columns of small or large diameters. Comparisons of three different inlet boundary conditions, i.e., the direct simulation of gas distributor, the uniform inlet, and the new inlet model, are made in the simulation of the total gas holdup, the radial profiles of gas holdup at different cross-sections along the column height, and the axial velocity of liquid at various superficial gas velocities. The results indicate that the new inlet model is capable of achieving a good balance between simulation accuracy and computational cost for the CFD simulation of large-scale bubble column reactors. [ABSTRACT FROM AUTHOR]

The entrainment and flow of a thin film of liquid on a vertically rotating disc partially immersed in a liquid bath has been investigated experimentally and modelled numerically. The Volume of Fluid (VOF) Computational Fluid Dynamics (CFD) modelling approach has been employed to characterise the shape and stability of the thin film thickness profile. The thickness of the rotating disc plays a significant role in the thin film profile and this is confirmed through the comparison of simulation with the experimental results. Other factors determining the film thickness were identified as the rotational speed and the fluid viscosity where the film thickness profile increases with the increase of the rotational speed and also the viscosity. A correlation equation to predict the film thickness as a function of angular position, radius, rotating speed, viscosity and surface tension is proposed. The results given in this study specifically report on the thin film thickness variation with the angular direction and the film entrained into the liquid. In both the simulation and experimental results, it is noted that the film thickness stabilises following a rotation of 15° after drag out of the liquid, and remains so until 10° before being dragged back in. [ABSTRACT FROM AUTHOR]

• A multiphase CFD model coupling the cavitation model and chemical reactions is developed for the first time. • Influences of acoustic cavitation on "local" micro-mixing process in the CIJR are investigated. • An increase in the power of ultrasound can improve the micro-mixing efficiency. • Ultrasound has larger effects on the meso-mixing process than micro-mixing process at the tip of transducer head. • Meso-mixing process controls the overall process with or without applying ultrasound. Studies on the influences of ultrasound-induced cavitation on the micro-mixing process in a confined impinging jet reactor (CIJR) are still lacking. In the present study, experimental and numerical approaches are employed to investigate the effects of ultrasound intensification on the mixing processes in a CIJR. The numerical results are experimentally validated. The model is also coupled with chemical reactions for the first time. It is found that local eddies generated by the collapse of acoustic microbubbles and "turbulence"-like acoustic streaming can significantly reduce the micro-mixing time. In all cases, the micro-mixing efficiency is found to increase with an increase in the power of ultrasound. A reduction of 15–24% in micro-mixing time can be achieved at the inlet velocity of 0.2m/s when the power of ultrasound increases from 122.5W to 175W. It is also found that the effect of ultrasound intensification on the meso-mixing process is larger than that on the micro-mixing process in the vicinity of transducer head. The ratio of micro-mixing time to meso-mixing time in the case of P ultra =175W can be 88% larger than that in the case of P ultra =0W in the front of the transducer head at Re in =5000. [Display omitted] [ABSTRACT FROM AUTHOR]