1. Pulsed-laser deposited Er:ZnO films for 1.54 μm emission.
- Author
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Pradhan, A. K., Douglas, L., Mustafa, H., Mundle, R., Hunter, D., and Bonner, C. E.
- Subjects
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ZINC oxide thin films , *PULSED laser deposition , *HIGH temperatures , *SEMICONDUCTORS , *NANOCRYSTALS , *SEMICONDUCTOR doping - Abstract
High-quality Er:ZnO films were grown by the pulsed-laser deposition technique at high temperature followed by in situ annealing. The films demonstrate remarkable crystalline quality and array of self-assembled grains. Although the films show very low electrical resistivity (∼6.41×10-4 Ω cm) at room temperature, a semiconductor-metal transition was observed at 190 K for low doping in contrast to semiconductor behavior for high doping. The films show pronounced room temperature emission at 1.54 μm, illustrating the activation of Er3+ ions in ZnO matrix. Furthermore, no quenching effects in 1.54 μm emission characteristics were observed up to 2 wt % of Er doping in ZnO at room temperature. [ABSTRACT FROM AUTHOR]
- Published
- 2007
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