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1 results on '"*PLASMA etching"'

1. Designer plasmas solve range of manufacturing problems.

Author

Samukawa, Seiji and U., Tohoku

Subjects
*RADIO pulse time modulation, *PLASMA gases, *PLASMA etching, *IONS, *RADICALS (Chemistry), *MANUFACTURING processes, *DIELECTRICS
Abstract

Reports that the Tohoku University researchers of Sendai, Japan, have applied pulse-time modulation technology to tailor plasma composition for specific processes. Generation of positive ions and radicals in the plasma; Application of the designed plasmas to solve specifuic manufacturing problems in etching; Control of the N density in plasma nitridization of ultrathin gate dielectric layers.

Published
2004

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