Search

Abstract The pauci-cellular nature of cerebrospinal (CSF), particularly ventricular CSF, and the rapid cell death following sampling, incumbers the use of flow cytometric analysis of these samples in the investigation of central nervous system (CNS) pathologies. Developing a method that allows long-term storage and batched analysis of CSF samples without compromising cell integrity is highly desirable in clinical research, given that CSF is often sampled after hours creating logistical difficulties for fresh processing. We examined percentages and relative proportion of peripheral and brain-derived immune cells in cryopreserved and transfix-treated CSF, compared to freshly processed CSF. Cell proportions were more comparable between Fresh and Cryopreserved CSF (mean of differences = 3.19), than between fresh and transfix-treated CSF (mean of differences = 14.82). No significant differences in cell percentages were observed in fresh versus cryopreserved CSF; however significantly lower cell percentages were observed in transfix-treated CSF compared to Fresh CSF [(CD11b++ (p = 0.01), CD4+ (p = 0.001), CD8+ (p = 0.007), NK cells (p = 0.04), as well as CD69+ activation marker (p = 0.001)]. Furthermore, loss of marker expression of various lymphocyte sub-populations were observed in transfix-treated CSF. Cryopreservation is a feasible option for long-term storage of ventricular CSF and allows accurate immunophenotyping of peripheral and brain-derived cell populations by flow cytometry.

Consistent studies of the quaternary composition are rare as it is impossible to fully determine the quaternary composition by X-ray diffraction or deduce it from that of ternary alloys. In this paper we determined the quaternary composition by wavelength dispersive X-ray spectroscopy of InxAly layers grown by metal organic vapor phase epitaxy. Further insights explaining the peculiarities of InxAlyGa1−x−yN growth in a showerhead reactor were gained by simulations of the precursor decomposition, gas phase adduct formation and indium incorporation including desorption. The measurements and simulations agree very well showing that the indium incorporation in a range from 0% to 2% is limited by desorption which is enhanced by the compressive strain to the relaxed Al0.5Ga0.5N buffer layer as well as indium incorporation into AlN particles forming in the gas phase. Utilizing InxAlyGa1−x−yN layers containing 2% of indium for multiple quantum wells (MQWs), it was possible to show an almost five times higher photoluminescence intensity of InAlGaN MQWs in comparison to AlGaN MQWs. [ABSTRACT FROM AUTHOR]

The application of quaternary InxAlyGa1−x−yN active regions is a promising path towards high efficiency UVB-light emitting diodes (LEDs). For the utilization of InxAlyGa1−x−yN, detailed knowledge of the interplay between growth parameters, adatom incorporation, optical and structural properties is crucial. We investigated the influence of the trimethylaluminium (TMAl) and trimethylindium (TMIn) flux on the composition and luminescence properties of InxAlyGa1−x−yN layers by multi-mode scanning electron microscopy. We found that varying the molar TMIn flow from 0 to 17.3 μmol min−1 led to an InN concentration between 0% and 3.2% and an emission energy between 4.17 and 3.75 eV. The variation of the molar TMAl flow from 3.5 to 35.4 μmol min−1 resulted in a AlN composition between 7.8% and 30.7% with an emission energy variation between 3.6 and 4.1 eV. Cathodoluminescence hyperspectral imaging provided evidence for the formation of nanoscale InN-rich regions. Analyzing the emission properties of these InN-rich regions showed that their emission energy is inhomogeneous and varies by ≈150 meV. We provide evidence that the formation of these InN-rich regions is highly dependent on the AlN and InN composition of the layer and that their formation will strongly affect the performance of InxAlyGa1−x−yN LEDs. [ABSTRACT FROM AUTHOR]

Due to changes in the spontaneous and piezoelectric polarization, AlGaN/GaN heterostructures exhibit strong polarization fields at heterointerfaces. For quantum wells, the polarization fields lead to a strong band bending and a redshift of the emission wavelength, known as quantum-confined Stark effect. In this paper the polarization fields of thin AlGaN layers in a GaN matrix were determined by evaluating the changes in the depletion region width in comparison to a reference sample without heterostructure using capacitance–voltage-measurements. The polarization fields for Al0.09Ga0.91N (0.6 ± 0.7 MV cm−1), Al0.26Ga0.74N (2.3 ± 0.6 MV cm−1), Al0.34Ga0.66N (3.1 ± 0.6 MV cm−1), Al0.41Ga0.59N (4.0 ± 0.7 MV cm−1) and Al0.47Ga0.53N (5.0 ± 0.8 MV cm−1) heterostructures were determined. The results of the field strength and field direction of all samples are in excellent agreement with values predicted by theory and a capacitance–voltage based Poisson-carrier transport simulation approach giving experimental evidence for a nonlinear increasing polarization field with Al-concentration. [ABSTRACT FROM AUTHOR]

The growth mechanisms during metalorganic vapor phase epitaxy (11-22) oriented AlxGa1-xN with x ∼ 0.80 on m-plane sapphire are studied with the intention of mitigating the expansion of misoriented grains, composed of the (1-10-3) crystal orientation and achieving a flat surface with only the (11-22) orientation. An increase in reactor pressure, metalorganic supply, and V/III ratio led to a decrease in the grain density from 1.0 × 109 cm−2 to 1.5 × 107 cm−2. By comparing different growth regimes, we found that the main factor suppressing the growth of the (1-10-3) orientation and decreasing the grain density in the AlGaN layers is the growth rate, which decreased with increasing reactor pressure, MO supply, and V/III ratio due to increasing pre-reactions in the gas phase. To mitigate pre-reactions even with lower growth rates, growth conditions with higher total flow and lower TMAl flow were chosen, yielding low growth rates of 0.13 μm h−1 and a grain density of 3.0 × 107 cm−2 at an aluminum mole fraction of 84%. To allow the growth of thick LED heterostructures we demonstrated that such a buffer can be overgrown with higher growth rate AlGaN, yielding a low grain density of 1.0 × 106 cm−2 and a smooth morphology with a rms roughness of 2.5 nm by avoiding misoriented crystal propagation during nucleation. [ABSTRACT FROM AUTHOR]

In this paper the internal electric fields of nearly lattice matched InAlN/GaN heterostructures were determined. Pin-diodes containing InAlN/GaN heterostructures grown on sapphire substrates by metalorganic vapour phase epitaxy were fabricated by standard lithography and metallization techniques. To determine the polarization fields in the InAlN quantum wells capacitance-voltage-measurements were performed on the pin-diodes. To reduce the measurement error, the heterostructure thicknesses were accurately determined by transmission electron microscopy. Large polarization fields, which correspond mainly to the spontaneous polarizations, for In0.15Al0.85N ( MV cm−1), In0.18Al0.82N ( MV cm−1) and In0.21Al0.79N ( MV cm−1) quantum wells were observed. The results of the internal field strength and field direction are in excellent agreement with values predicted by theory and a CVM-based coupled Poisson/carrier transport simulation approach. [ABSTRACT FROM AUTHOR]

The waveguide strain and the surface morphologies of AlGaN-based laser heterostructures emitting in the deep UV spectral range have been investigated. In particular, the impact of the AlGaN heterostructure design on the strain relaxation as well as the effect of the growth temperature on the surface morphology were explored. We found strain-induced plastic relaxation for laser heterostructures with 130 nm thick Al0.45Ga0.55N waveguide layers, whereas pseudomorphic growth was obtained for laser heterostructures with Al0.70Ga0.30N waveguide layers. Optically pumped lasing near 280 nm was demonstrated for the coherently grown laser heterostructures. A strong correlation of the surface morphology with the waveguide growth conditions was also observed. Low growth temperatures of 900 °C lead to a high density of V-pits originating from dislocations. By increasing the growth temperatures to 1070 °C the V-pit density significantly decreases, resulting in a more than two-fold reduction of the threshold power density of optically pumped lasers. [ABSTRACT FROM AUTHOR]

The uniformity of emission from deep ultraviolet light emitting diodes (UV LEDs) is investigated. The AlGaN-based heterostructures of the UV LEDs emitting around 235 nm were grown by metalorganic vapor phase epitaxy on epitaxially laterally overgrown AlN/sapphire substrates. The impact of different device designs on the spatial distribution of the electroluminescence for a series of UV LEDs is studied. Due to the relatively high resistivities of n-AlGaN and p-AlGaN layers, ranging from 10 to 0.1 Ω cm as well as specific contact resistances approaching 1 Ω cm2, the emission patterns revealed heavy current crowding at the mesa edges causing a drop of power in the center of the emitting area and an asymmetry towards the side of the bonding pad of the n-contact. Simple analytical models considering the transfer and the current spreading length could only qualitatively explain the observed emission pattern. Using a 3D electro-thermal simulation of the current spreading in the LEDs the experimentally observed emission pattern could also be quantitatively reproduced. Based on these findings the 3D electro-thermal simulation was employed to optimize the contact geometry of the deep UV LEDs in order to achieve a more uniform power distribution. [ABSTRACT FROM AUTHOR]

Detailed knowledge of the dopant concentration and composition of wide band gap AlxGa layers is of crucial importance for the fabrication of ultra violet light emitting diodes. This paper demonstrates the capabilities of wavelength dispersive x-ray (WDX) spectroscopy in accurately determining these parameters and compares the results with those from high resolution x-ray diffraction (HR-XRD) and secondary ion mass spectrometry (SIMS). WDX spectroscopy has been carried out on different silicon-doped wide bandgap AlxGa samples (x between 0.80 and 1). This study found a linear increase in the Si concentration with the SiH4/group-III ratio, measuring Si concentrations between cm−3 and cm−3, while no direct correlation between the AlN composition and the Si incorporation ratio was found. Comparison between the composition obtained by WDX and by HR-XRD showed very good agreement in the range investigated, while comparison of the donor concentration between WDX and SIMS found only partial agreement, which we attribute to a number of effects. [ABSTRACT FROM AUTHOR]