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Al x Ga 1 − x N/GaN high-electron-mobility transistor (HEMT) structures are key components in electronic devices operating at gigahertz or higher frequencies. In order to optimize such HEMT structures, understanding their electronic response at high frequencies and room temperature is required. Here, we present a study of the room temperature free charge carrier properties of the two-dimensional electron gas (2DEG) in HEMT structures with varying Al content in the Al x Ga 1 − x N barrier layers between x = 0.07 and x = 0.42. We discuss and compare 2DEG sheet density, mobility, effective mass, sheet resistance, and scattering times, which are determined by theoretical calculations, contactless Hall effect, capacitance-voltage, Eddy current, and cavity-enhanced terahertz optical Hall effect (THz-OHE) measurements using a low-field permanent magnet (0.6 T). From our THz-OHE results, we observe that the measured mobility reduction from x = 0.13 to x = 0.42 is driven by the decrease in 2DEG scattering time, and not the change in effective mass. For x < 0.42 , the 2DEG effective mass is found to be larger than for electrons in bulk GaN, which in turn, contributes to a decrease in the principally achievable mobility. From our theoretical calculations, we find that values close to 0.3 m 0 can be explained by the combined effects of conduction band nonparabolicity, polarons, and hybridization of the electron wavefunction through penetration into the barrier layer. [ABSTRACT FROM AUTHOR]

Group-III nitrides have transformed solid-state lighting and are strategically positioned to revolutionize high-power and high-frequency electronics. To drive this development forward, a deep understanding of fundamental material properties, such as charge carrier behavior, is essential and can also unveil new and unforeseen applications. This underscores the necessity for novel characterization tools to study group-III nitride materials and devices. The optical Hall effect (OHE) emerges as a contactless method for exploring the transport and electronic properties of semiconductor materials, simultaneously offering insights into their dielectric function. This non-destructive technique employs spectroscopic ellipsometry at long wavelengths in the presence of a magnetic field and provides quantitative information on the charge carrier density, sign, mobility, and effective mass of individual layers in multilayer structures and bulk materials. In this paper, we explore the use of terahertz (THz) OHE to study the charge carrier properties in group-III nitride heterostructures and bulk material. Examples include graded AlGaN channel high-electron-mobility transistor (HEMT) structures for high-linearity devices, highlighting the different grading profiles and their impact on the two-dimensional electron gas (2DEG) properties. Next, we demonstrate the sensitivity of the THz OHE to distinguish the 2DEG anisotropic mobility parameters in N-polar GaN/AlGaN HEMTs and show that this anisotropy is induced by the step-like surface morphology. Finally, we present the temperature-dependent results on the charge carrier properties of 2DEG and bulk electrons in GaN with a focus on the effective mass parameter and review the effective mass parameters reported in the literature. These studies showcase the capabilities of the THz OHE for advancing the understanding and development of group-III materials and devices. [ABSTRACT FROM AUTHOR]

We investigate the interfaces and polarity domains at the atomic scale in epitaxial AlN and GaN/AlN grown by hot-wall metal organic chemical vapor epitaxy on the carbon face of SiC. X-ray diffraction, potassium hydroxide (KOH) wet chemical etching, and scanning transmission electron microscopy combined provide an in-depth understanding of polarity evolution with the film thickness, which is crucial to optimize growth. The AlN grown in a 3D mode is found to exhibit N-polar pyramid-type structures at the AlN–SiC interface. However, a mixed N-polar and Al-polar region with Al-polarity domination along with inverted pyramid-type structures evolve with increasing film thickness. We identify inclined inversion domain boundaries and propose that incorporation of oxygen on the ⟨ 40–41 ⟩ facets of the N-polar pyramids causes the polarity inversion. We find that mixed-polar AlN is common and easily etched and remains undetected by solely relying on KOH etching. Atomic scale electron microscopy is, therefore, needed to accurately determine the polarity. The polarity of GaN grown on mixed-polar AlN is further shown to undergo complex evolution with the film thickness, which is discussed in the light of growth mechanisms and polarity determination methods. [ABSTRACT FROM AUTHOR]

Electron effective mass is a fundamental material parameter defining the free charge carrier transport properties, but it is very challenging to be experimentally determined at high temperatures relevant to device operation. In this work, we obtain the electron effective mass parameters in a Si-doped GaN bulk substrate and epitaxial layers from terahertz (THz) and mid-infrared (MIR) optical Hall effect (OHE) measurements in the temperature range of 38–340 K. The OHE data are analyzed using the well-accepted Drude model to account for the free charge carrier contributions. A strong temperature dependence of the electron effective mass parameter in both bulk and epitaxial GaN with values ranging from (0.18 ± 0.02) m0 to (0.34 ± 0.01) m0 at a low temperature (38 K) and room temperature, respectively, is obtained from the THz OHE analysis. The observed effective mass enhancement with temperature is evaluated and discussed in view of conduction band nonparabolicity, polaron effect, strain, and deviations from the classical Drude behavior. On the other hand, the electron effective mass parameter determined by MIR OHE is found to be temperature independent with a value of (0.200 ± 0.002) m0. A possible explanation for the different findings from THz OHE and MIR OHE is proposed. [ABSTRACT FROM AUTHOR]

The anisotropic permittivity parameters of monoclinic single crystal lutetium oxyorthosilicate, Lu2SiO5 (LSO), have been determined in the terahertz spectral range. Using terahertz generalized spectroscopic ellipsometry (THz-GSE), we obtained the THz permittivities along the a, b, and c ⋆ crystal directions, which correspond to the ε a , ε b , and ε c ⋆ on-diagonal tensor elements. The associated off diagonal tensor element ε a c ⋆ was also determined experimentally, which is required to describe LSO's optical response in the monoclinic a–c crystallographic plane. From the four tensor elements obtained in the model fit, we calculate the direction of the principal dielectric axes in the a–c plane. We find good agreement when comparing THz-GSE permittivities to the static permittivity tensors from previous infrared and density functional theory studies. [ABSTRACT FROM AUTHOR]

Herein, metal–organic chemical vapor deposition (MOCVD) of GaN layers doped with Mg atoms to the recognized optimum level of [Mg] ≈2 × 1019 cm−3 is performed. In a sequence of MOCVD runs, operational conditions, including temperature and flow rate of precursors, are maintained except for intentionally larger flows of hydrogen carrier gas fed into the reactor. By employing the largest hydrogen flow of 25 slm in this study, the performance of the as‐grown Mg‐doped GaN layers is certified by a room‐temperature hole concentration of p ≈2 × 1017 cm−3 in the absence of any thermal activation treatment. Experimental evidence is delivered that the large amounts of hydrogen during the MOCVD growth can regulate the incorporation of the Mg atoms into GaN in a significant way so that MgH complex can coexist with a dominant and evidently electrically active isolated MgGa acceptor. [ABSTRACT FROM AUTHOR]

We report on the free charge carrier properties of a two-dimensional electron gas (2DEG) in an AlN/AlxGa1–xN high electron mobility transistor structure with a high aluminum content (x = 0.78). The 2DEG sheet density N s = (7.3 ± 0.7) × 10 12 cm−2, sheet mobility μ s = (270 ± 40) cm2/(Vs), sheet resistance R s = (3200 ± 500) Ω / ◻ , and effective mass m eff = (0.63 ± 0.04) m 0 at low temperatures (T = 5 K) are determined by terahertz (THz) optical Hall effect measurements. The experimental 2DEG mobility in the channel is found within the expected range, and the sheet carrier density is in good agreement with self-consistent Poisson–Schrödinger calculations. However, a significant increase in the effective mass of 2DEG electrons at low temperatures is found in comparison with the respective value in bulk Al0.78Ga22N ( m eff = 0.334 m 0 ). Possible mechanisms for the enhanced 2DEG effective mass parameter are discussed and quantified using self-consistent Poisson–Schrödinger calculations. [ABSTRACT FROM AUTHOR]

The hot-wall metalorganic chemical vapor deposition (MOCVD) concept, previously shown to enable superior material quality and high performance devices based on wide bandgap semiconductors, such as Ga(Al)N and SiC, has been applied to the epitaxial growth of β-Ga2O3. Epitaxial β-Ga2O3 layers at high growth rates (above 1 μm/h), at low reagent flows, and at reduced growth temperatures (740 °C) are demonstrated. A high crystalline quality epitaxial material on a c-plane sapphire substrate is attained as corroborated by a combination of x-ray diffraction, high-resolution scanning transmission electron microscopy, and spectroscopic ellipsometry measurements. The hot-wall MOCVD process is transferred to homoepitaxy, and single-crystalline homoepitaxial β-Ga2O3 layers are demonstrated with a 2 ̄ 01 rocking curve width of 118 arc sec, which is comparable to those of the edge-defined film-fed grown ( 2 ̄ 01) β-Ga2O3 substrates, indicative of similar dislocation densities for epilayers and substrates. Hence, hot-wall MOCVD is proposed as a prospective growth method to be further explored for the fabrication of β-Ga2O3. [ABSTRACT FROM AUTHOR]

Flexible Organic Field-Effect Transistors (OFETs) constitute nowadays a highly promising field of the organic and printed electronics due to their multiple applications (flexible displays, sensors etc.). However, their cost-effective fabrication by large area Roll-to-Roll compatible printing methods still remains a challenge for their integration to commercial products. In this work, the moderate speed (1 m/min) process of the flexible cross-linked Poly(4-vinyl phenol) (PVP) polymer gate dielectric layer was carried out by integrating a slot-die method that mimics the Roll-to-Roll (R2R) coating conditions, in combination to an airbrush spray method for the solution-processing of the 6,13-bis(triisopropylsilylethynyl)-pentacene (TIPS-PEN) organic semiconductor. Particularly, the PVP dielectric was slot-die-coated over a 90 × 15 cm2 substrate, while subsequently the TIPS-PEN semiconductor was sprayed onto the 15 × 20 mm2 cPVP-patterned plastic substrates. Α surface investigation study on the well-formed slot-die-coated cPVP strips was conducted, revealing desirable dielectric film topography as a result of the good control over the coating process. A detailed analysis of the cPVP thickness evolution along the 90 × 1.3 cm2 patterned stripe, was carried out. The morphological analysis of the sprayed TIPS-PEN layer over the cPVP film revealed well-organized large crystalline domains across the channel area, as a result of the sufficient crystallization time and the excellent cPVP surface morphology. The fabricated bottom gate/top contact flexible OFETs exhibited excellent I-V electrical characteristics with a maximum mobility of 0.21 cm2/V, negligible hysteresis, low threshold voltages (average value of −0.1 V) and on/off current ratios in the range of 103 to >104. These results demonstrate the potentiality of the proposed scalable methods for the large scale fabrication of high performance low-cost OFET devices. Image 1 • Slot-die coating of cPVP dielectric film onto 90 × 15 cm2 PET/IMI substrate. • Smooth slot-die-coated cPVP films with RMSR values in the range of 0.5–0.7 nm. • Spray-coating of TIPS-Pentacene semiconductor onto slot-die-coated cPVP dielectric. • Well-ordered large-sized crystalline domains across the device channel area. • Mobility values up to 0.21 cm2/Vs, negligible hysteresis, on/off current ratio 103 to >104. [ABSTRACT FROM AUTHOR]