1. Towards a uniform and large-scale deposition of MoS2nanosheets via sulfurization of ultra-thin Mo-based solid films
- Author
-
Eugenio Cinquanta, Francesco Basso Basset, R. Mantovan, S. Vangelista, Massimo Longo, Fabio Pezzoli, Alessandro Molle, Christian Martella, M. Alia, Alessio Lamperti, Vangelista, S, Cinquanta, E, Martella, C, Alia, M, Longo, M, Lamperti, A, Mantovan, R, BASSO BASSET, F, Pezzoli, F, and Molle, A
- Subjects
granularity ,heterogeneous vapor-solid reaction ,Mo solid film source ,MoS2 ,Raman spectroscopy ,TMDs ,Bioengineering ,Chemistry (all) ,Materials Science (all) ,Mechanics of Materials ,Mechanical Engineering ,Electrical and Electronic Engineering ,Materials science ,Photoluminescence ,Nanostructure ,chemistry.chemical_element ,Nanotechnology ,02 engineering and technology ,010402 general chemistry ,01 natural sciences ,Crystallinity ,symbols.namesake ,Deposition (phase transition) ,General Materials Science ,Wafer ,FIS/03 - FISICA DELLA MATERIA ,Nanosheet ,business.industry ,TMD ,General Chemistry ,021001 nanoscience & nanotechnology ,0104 chemical sciences ,FIS/01 - FISICA SPERIMENTALE ,chemistry ,Molybdenum ,symbols ,Optoelectronics ,0210 nano-technology ,business - Abstract
Large-scale integration of MoS2 in electronic devices requires the development of reliable and cost-effective deposition processes, leading to uniform MoS2 layers on a wafer scale. Here we report on the detailed study of the heterogeneous vapor-solid reaction between a pre-deposited molybdenum solid film and sulfur vapor, thus resulting in a controlled growth of MoS2 films onto SiO2/Si substrates with a tunable thickness and cm(2)-scale uniformity. Based on Raman spectroscopy and photoluminescence, we show that the degree of crystallinity in the MoS2 layers is dictated by the deposition temperature and thickness. In particular, the MoS2 structural disorder observed at low temperature (
- Published
- 2016
- Full Text
- View/download PDF