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An accurate knowledge of lattice parameters of Sc xAl1− xN is essential for understanding the elastic and piezoelectric properties of this compound as well as for the ability to engineer its strain state in heterostructures. Using high-resolution x-ray diffractometry, we determine the lattice parameters of 100-nm-thick undoped Sc xAl1− xN layers grown on GaN(0001) templates by plasma-assisted molecular beam epitaxy. The Sc content x of the layers is measured independently by both x-ray photoelectron spectroscopy and energy-dispersive x-ray spectroscopy, and it ranges from 0 to 0.25. The in-plane lattice parameter of the layers linearly increases with increasing x, while their out-of-plane lattice parameter remains constant. Layers with [Formula: see text] are found to be lattice matched to GaN, resulting in a smooth surface and a structural perfection equivalent to that of the GaN underlayer. In addition, a two-dimensional electron gas is induced at the Sc xAl1− xN/GaN heterointerface, with the highest sheet electron density and mobility observed for lattice-matched conditions.

Journal of synchrotron radiation 27(5), 1200 - 1208 (2020). doi:10.1107/S1600577520009789, Nanoprobe X-ray diffraction (nXRD) using focused synchrotron radiation is a powerful technique to study the structural properties of individual semiconductor nanowires. However, when performing the experiment under ambient conditions, the required high X-ray dose and prolonged exposure times can lead to radiation damage. To unveil the origin of radiation damage, a comparison is made of nXRD experiments carried out on individual semiconductor nanowires in their as-grown geometry both under ambient conditions and under He atmosphere at the microfocus station of the P08 beamline at the third-generation source PETRA III. Using an incident X-ray beam energy of 9 keV and photon flux of 10$^{10}$ s$^{−1}$, the axial lattice parameter and tilt of individual GaAs/In$_{0.2}$Ga$_{0.8}$As/GaAs core–shell nanowires were monitored by continuously recording reciprocal-space maps of the 111 Bragg reflection at a fixed spatial position over several hours. In addition, the emission properties of the (In,Ga)As quantum well, the atomic composition of the exposed nanowires and the nanowire morphology were studied by cathodoluminescence spectroscopy, energy-dispersive X-ray spectroscopy and scanning electron microscopy, respectively, both prior to and after nXRD exposure. Nanowires exposed under ambient conditions show severe optical and morphological damage, which was reduced for nanowires exposed under He atmosphere. The observed damage can be largely attributed to an oxidation process from X-ray-induced ozone reactions in air. Due to the lower heat-transfer coefficient compared with GaAs, this oxide shell limits the heat transfer through the nanowire side facets, which is considered as the main channel of heat dissipation for nanowires in the as-grown geometry., Published by Wiley-Blackwell, [S.l.]

By employing a mixed SnO$_2$+Sn source, we demonstrate suboxide molecular beam epitaxy growth of phase-pure single crystalline metastable SnO(001) thin films at a growth rate of ~1.0nm/min without the need for additional oxygen. These films grow epitaxially across a wide substrate temperature range from 150 to 450{\deg}C. Hence, we present an alternative pathway to overcome the limitations of high Sn or SnO$_2$ cell temperatures and narrow growth windows encountered in previous MBE growth of metastable SnO. In-situ laser reflectometry and line-of-sight quadrupole mass spectrometry were used to investigate the rate of SnO desorption as a function of substrate temperature. While SnO ad-molecules desorption at Ts = 450{\deg}C was growth-rate limiting,the SnO films did not desorb at this temperature after growth in vacuum. The SnO (001) thin films are transparent and unintentionally p-type doped, with hole concentrations and mobilities in the range of 0.9 to 6.0x10$^{18}$cm$^{-3}$ and 2.0 to 5.5 cm$^2$/V.s, respectively. These p-type SnO films obtained at low temperatures are promising for back-end-of-line (BEOL) compatible applications and for integration with n-type oxides in p-n heterojunction and field-effect transistors, Comment: 18 pages, 10 figures

We demonstrate the top-down fabrication of ordered arrays of GaN nanowires by selective area sublimation of pre-patterned GaN(0001) layers grown by hydride vapor phase epitaxy on Al$_{2}$O$_{3}$. Arrays with nanowire diameters and spacings ranging from 50 to 90 nm and 0.1 to 0.7 $\mu$m, respectively, are simultaneously produced under identical conditions. The sublimation process, carried out under high vacuum conditions, is analyzed \emph{in situ} by reflection high-energy electron diffraction and line-of-sight quadrupole mass spectromety. During the sublimation process, the GaN(0001) surface vanishes, giving way to the formation of semi-polar $\lbrace1\bar{1}03\rbrace$ facets which decompose congruently following an Arrhenius temperature dependence with an activation energy of ($3.54 \pm 0.07$) eV and an exponential prefactor of $1.58\times10^{31}$ atoms cm$^{-2}$ s$^{-1}$. The analysis of the samples by low-temperature cathodoluminescence spectroscopy reveals that, in contrast to dry etching, the sublimation process does not introduce nonradiative recombination centers at the nanowire sidewalls. This technique is suitable for the top-down fabrication of a variety of ordered nanostructures, and could possibly be extended to other material systems with similar crystallographic properties such as ZnO., Comment: This is the accepted manuscript version of an article that appeared in Nanoscale Advances. The CC BY-NC 3.0 license applies, see http://creativecommons.org/licenses/by-nc/3.0/

ZnTe/CdSe/(Zn,Mg)Te core/double-shell nanowires are grown by molecular beam epitaxy by employing the vapor-liquid-solid growth mechanism assisted with gold catalysts. A photoluminescence study of these structures reveals the presence of an optical emission in the near infrared. We assign this emission to the spatially indirect exciton recombination at the ZnTe/CdSe type II interface. This conclusion is confirmed by the observation of a significant blue-shift of the emission energy with an increasing excitation fluence induced by the electron-hole separation at the interface. Cathodoluminescence measurements reveal that the optical emission in the near infrared originates from nanowires and not from two dimensional residual deposits between them. Moreover, it is demonstrated that the emission energy in the near infrared depends on the average CdSe shell thickness and the average Mg concentration within the (Zn,Mg)Te shell. The main mechanism responsible for these changes is associated with the strain induced by the (Zn,Mg)Te shell in the entire core/shell nanowire heterostructure., Comment: 7 pages

GaN nanowire (NW) arrays are investigated with the main focus on their uniformity, which is a key requirement for the performance of photonic crystals. The NWs are fabricated by two established top-down approaches which are directly compared and critically discussed in terms of their individual merits and drawbacks. A statistical analysis of NW arrays with a nominal NW spacing of 200 nm and NW diameters of 30–70 nm yields distributions of the spacing (diameter) peaking around their nominal values within standard deviations of 2–6 (3–4) nm, a circularity of 0.88–0.89 and a yield of 99.9%.

We analyse the morphological, structural and luminescence properties of self-assembled ZnO nanowires grown by chemical vapour transport on Si(001). The examination of nanowire ensembles by scanning electron microscopy reveals that a non-negligible fraction of nanowires merge together forming coalesced aggregates during growth. We show that the coalescence degree can be unambiguously quantified by a statistical analysis of the cross-sectional shape of the nanowires. The examination of the structural properties by X-ray diffraction evidences that the nanowires crystallize in the wurtzite phase, elongate along the c-axis, and are randomly oriented in plane. The luminescence of the ZnO nanowires, investigated by photoluminescence and cathodoluminescence spectroscopies, is characterized by two bands, the nearband-edge emission and the characteristic defect-related green luminescence of ZnO. The cross-correlation of scanning electron micrographs and monochromatic cathodoluminescence intensity maps reveals that: (i) coalescence joints act as a source of non-radiative recombination, and (ii) the luminescence of ZnO nanowires is inhomogeneously distributed at the single nanowire level. Specifically, the near-band-edge emission arises from the nanowire cores, while the defect-related green luminescence originates from the volume close to the nanowire sidewalls. Two-dimensional simulations of the optical guided modes supported by ZnO nanowires allow us to exclude waveguiding effects as the underlying reason for the luminescence inhomogeneities. We thus attribute this observation to the formation of a core-shell structure in which the shell is characterized by a high concentration of green-emitting radiative point defects with respect to the core.

Nanotechnology 31(21), 1-7 (2020). doi:10.1088/1361-6528/ab7590, We report on the direct correlation between the structural and optical properties of single, as-grown core-multi-shell GaAs/In$_{0.15}$Ga$_{0.85}$As/GaAs/AlAs/GaAs nanowires. Fabricated by molecular beam epitaxy on a pre-patterned Si(111) substrate, on a row of well separated nucleation sites, it was possible to access individual nanowires in the as-grown geometry. The polytype distribution along the growth axis of the nanowires was revealed by synchrotron-based nanoprobe x-ray diffraction techniques monitoring the axial 111 Bragg reflection. For the same nanowires, the spatially-resolved emission properties were obtained by cathodoluminescence hyperspectral linescans in a scanning electron microscope. Correlating both measurements, we reveal a blueshift of the shell quantum well emission energy combined with an increased emission intensity for segments exhibiting a mixed structure of alternating wurtzite and zincblende stacking compared with the pure crystal polytypes. The presence of this mixed structure was independently confirmed by cross-sectional transmission electron microscopy., Published by IOP Publ., Bristol

Understanding the interplay between the structure, composition and opto-electronic properties of semiconductor nano-objects requires combining transmission electron microscopy (TEM) based techniques with electrical and optical measurements on the very same specimen. Recent developments in TEM technologies allow not only the identification and in-situ electrical characterization of a particular object, but also the direct visualization of its modification in-situ by techniques such as Joule heating. Over the past years, we have carried out a number of studies in these fields that are reviewed in this contribution. In particular, we discuss here i) correlated studies where the same unique object is characterized electro-optically and by TEM, ii) in-situ Joule heating studies where a solid-state metal-semiconductor reaction is monitored in the TEM, and iii) in-situ biasing studies to better understand the electrical properties of contacted single nanowires. In addition, we provide detailed fabrication steps for the silicon nitride membranes crucial to these correlated and in-situ measurements., Comment: This is an author-created, un-copyedited version of a topical review published in Nanotechnology. IOP Publishing Ltd. is not responsible for any errors or omissions in this version of the manuscript or any version derived from it. The Version of Record is available online at https://doi.org/10.1088/1361-6528/ab99f0

Cyclic voltammetry measurements are carried out in neutral phosphate-buffered electrolyte using n-type Ga-polar GaN thin-film photoelectrodes with and without cobalt phosphate (Co-Pi) modification. Without Co-Pi, the variation of the photocurrent with the bias potential exhibits a two-step behavior and under chopped illumination spikes occur at low bias potential. Thus in this regime surface recombination is dominant. Co-Pi modification suppresses surface recombination and significantly increases the photocurrent, especially for low bias potentials. At the same time, stability tests reveal that Co-Pi does not protect GaN against photocorrosion. Experiments using H2O2 imply that this photocorrosion is a reductive process and probably related to the presence of charged surface defects.

The semiconducting oxide $\ensuremath{\beta}$-gallium oxide ($\ensuremath{\beta}\ensuremath{-}{\mathrm{Ga}}_{2}{\mathrm{O}}_{3}$) possesses a monoclinic unit cell, whose low symmetry generally leads to anisotropic physical properties. For example, its electrical conductivity is generally described by a polar symmetrical tensor of second rank consisting of four independent components. Using van der Pauw measurements in a well-defined square geometry on differently oriented high-quality bulk samples and the comparison to finite-element simulations, we precisely determine the ratio of all elements of the $\ensuremath{\beta}\ensuremath{-}{\mathrm{Ga}}_{2}{\mathrm{O}}_{3}$ three-dimensional electrical conductivity tensor. Despite the strong structural anisotropy, a weakly anisotropic conductivity at and above room temperature was found. In the ${a}^{*}bc$ coordinate system, the diagonal elements deviate from each other by no more than 6%. Based on these results and the off-diagonal element being $\ensuremath{\approx}5%$ of the diagonal ones, the direction of highest conductivity is rotated ${(59\ifmmode\pm\else\textpm\fi{}15)}^{\ensuremath{\circ}}$ from the $c$ direction towards the ${a}^{*}$ direction with a conductivity of $(1.12\ifmmode\pm\else\textpm\fi{}0.09)\ifmmode\times\else\texttimes\fi{}$ that in the perpendicular direction of lowest conductivity. Analysis of the temperature dependence of the anisotropy and mobility of differently doped samples allows us to compare the anisotropy for dominant phonon scattering to that for dominant ionized-impurity scattering. For both scattering mechanisms, the conductivities along the $a$ and $b$ direction agree within 2%. In contrast, the conductivity along the $c$ direction amounts to $0.96\ifmmode\times\else\texttimes\fi{}$ that along the $b$ direction for dominant phonon scattering, and up to $1.12\ifmmode\times\else\texttimes\fi{}$ for ionized-impurity scattering. The transport anisotropies are determined to be larger than the theoretically predicted effective mass anisotropy, suggesting slightly anisotropic scattering mechanisms. We demonstrate that significantly higher anisotropies can be caused by oriented, extended structural defects in the form of low-angle grain boundaries, for which we determined energy barriers of up to 93 meV.

To understand the behavior of a semiconductor device, you need to know how the material's $e\phantom{\rule{0}{0ex}}x\phantom{\rule{0}{0ex}}c\phantom{\rule{0}{0ex}}i\phantom{\rule{0}{0ex}}t\phantom{\rule{0}{0ex}}o\phantom{\rule{0}{0ex}}n\phantom{\rule{0}{0ex}}s$ (weakly bound electron-hole pairs) behave. The exciton diffusion length in GaN is often determined from the size of dark areas around dislocation outcroppings in cathodoluminescence maps. The present work shows that, contrary to common belief, the spatial extent of these areas is only weakly affected by diffusion, being set primarily by exciton dissociation in the piezoelectric field around the dislocation. In contrast, the local band-gap variation in the dislocation's strain field $d\phantom{\rule{0}{0ex}}o\phantom{\rule{0}{0ex}}e\phantom{\rule{0}{0ex}}s$ depend sensitively on exciton diffusion length, and hence enables its experimental determination.

III-V semiconductor nanowires exhibit unique features for application in novel optoelectronic devices. Due to their large surface-to-volume ratio, the realization of heterostructures beyond the capabilities of planar growth, that can still be integrated in Si-based electronics, becomes possible. Furthermore, polytypism was observed e.g. in GaAs nanowires such that different crystal phases coexist in the same nanowire. As different crystal phases have different electronic properties, this feature can be exploited to form crystal-phase heterostructures with atomically flat interfaces and only very small elastic deformation. We will discuss the specifics of electronic-structure simulations in such nanowires and present recent example studies.

We study the luminescence of unintentionally doped and Si-doped In$_x$Ga$_{1-x}$N nanowires with a low In content (x, This document is the unedited Author's version of a Submitted Work that was subsequently accepted for publication in Nano Letters (2016), copyright (C) American Chemical Society after peer review. To access the final edited and published work see http://dx.doi.org/10.1021/acs.nanolett.5b03748

Correction to Absence of Quantum-Confined Stark Effect in GaN Quantum Disks Embedded in (Al,Ga)N Nanowires Grown by Molecular Beam Epitaxy

We report on luminescent centers contained in a few-layer-thick hexagonal boron nitride (h-BN) film grown on Ni by molecular beam epitaxy. After transfer to a SiO$_2$/Si substrate, sharp lines are observed in photo- and cathodoluminescence spectra in both the ultraviolet and the visible range. Spatially resolved measurements reveal that the luminescent centers responsible for these lines are localized within microscopic multi-layer islands that form at the nucleation centers of the h-BN film. The comparison of their energy, polarization and phonon replica emission with previous theoretical predictions suggest that the N$_\mathrm{B}$V$_\mathrm{N}$ anti-site could be one of the light emitters present in our sample. Moreover, we have also observed evidences of other kinds of centers that could be associated to defects containing carbon or oxygen. The characterized luminescent defects could have potential applications as quantum light sources.

We present an innovative approach to integrate arrays of isolated, strain-free GaN crystals on patterned Si substrates. First, micrometer-sized pillars are patterned onto Si(0 0 1) substrates. Subsequently, 2.5 μm Si substrates are deposited by low-energy plasma-enhanced chemical vapor deposition, forming crystals mostly bounded by {1 1 1}, {1 1 3}, and {15 3 23} facets. Plasma-assisted molecular beam epitaxy is then used for GaN deposition. GaN crystals with slanted {0 0 0 1} facets having a root-mean-square surface roughness of 0.7 nm are obtained for a deposited material thickness of >3 μm. Microphotoluminescence measurements performed at room and cryogenic temperature show no yellow luminescence and a neutral donor-bound A exciton transition at 3.471 eV (10 K) with a full width at half-maximum of 10 meV. Microphotoluminescence and micro-Raman spectra reveal that GaN grown on Si pillars is strain-free. Our results indicate that the shape of GaN crystals can be tuned by the pattern periodicity and that a reduction of threading dislocations is achieved in their top part.

We observe that the growth rate of Ga_{2}O_{3} in plasma-assisted molecular beam epitaxy can be drastically enhanced by an additional In supply. This enhancement is shown to result from a catalytic effect, namely, the rapid formation of In_{2}O_{3}, immediately followed by a transformation of In_{2}O_{3} to Ga_{2}O_{3} due to an In-Ga interatomic exchange. We derive a simple model that quantitatively describes this process as well as its consequences on the formation rate of Ga_{2}O_{3}. Moreover, we demonstrate that the catalytic action of In_{2}O_{3} allows the synthesis of the metastable hexagonal phase of Ga_{2}O_{3}. Since the Ga_{2}O_{3}(0001)/In_{2}O_{3}(111) interface is closely lattice matched, this novel growth mode opens a new path for the fabrication of sesquioxide heterostructures.

We investigated the photoelectrochemical properties of both n- and p-type (In,Ga)N nanowires (NWs) for water splitting by in situ electrochemical mass spectroscopy (EMS). All NWs were prepared by plasma-assisted molecular beam epitaxy. Under illumination, the n-(In,Ga)N NWs exhibited an anodic photocurrent, however, no O2 but only N2 evolution was detected by EMS, indicating that the photocurrent was related to photocorrosion rather than water oxidation. In contrast, the p-(In,Ga)N NWs showed a cathodic photocurrent under illumination which was correlated with the evolution of H2. After photodeposition of Pt on such NWs, the photocurrent density was significantly enhanced to 5 mA/cm(2) at a potential of -0.5 V/NHE under visible light irradiation of ∼40 mW/cm(2). Also, incident photon-to-current conversion efficiencies of around 40% were obtained at -0.45 V/NHE across the entire visible spectral region. The stability of the NW photocathodes for at least 60 min was verified by EMS. These results suggest that p-(In,Ga)N NWs are a promising basis for solar hydrogen production.

Arrays of dislocation free uniform Ga-polar GaN columns have been realized on patterned SiOx/GaN/sapphire templates by metal organic vapor phase epitaxy using a continuous growth mode. The key parameters and the physical principles of growth of Ga-polar GaN three-dimensional columns are identified, and their potential for manipulating the growth process is discussed. High aspect ratio columns have been achieved using silane during the growth, leading to n-type columns. The vertical growth rate increases with increasing silane flow. In a core–shell columnar LED structure, the shells of InGaN/GaN multi quantum wells and p-GaN have been realized on a core of n-doped GaN column. Cathodoluminescence gives insight into the inner structure of these core–shell LED structures.

Electron irradiation of GaN nanowires in a scanning electron microscope strongly reduces their luminous efficiency as shown by cathodoluminescence imaging and spectroscopy. We demonstrate that this luminescence quenching originates from a combination of charge trapping at already existing surface states and the formation of new surface states induced by the adsorption of C on the nanowire sidewalls. The interplay of these effects leads to a complex temporal evolution of the quenching, which strongly depends on the incident electron dose per area. Time-resolved photoluminescence measurements on electron-irradiated samples reveal that the carbonaceous adlayer affects both the nonradiative and the radiative recombination dynamics., Comment: This is an author-created, un-copyedited version of an article accepted for publication/published in Nanotechnology. IOP Publishing Ltd is not responsible for any errors or omissions in this version of the manuscript or any version derived from it. The Version of Record is available online at http://dx.doi.org/10.1088/0957-4484/27/45/455706

Growing $I\phantom{\rule{0}{0ex}}I\phantom{\rule{0}{0ex}}I-V$ semiconductor alloys like GaN along different crystal directions, to yield either ``Ga-polar'' or ``N-polar'' structures, can have a profound effect on optoelectronic device properties---in particular, green emission from LEDs. For example, the authors find that N-polar (In,Ga)N/GaN quantum wells do not exhibit any detectable luminescence, in striking contrast to their Ga-polar counterparts. This is due to a high density of nonradiative defects at the interfaces between wells and barriers. These results point away from N-polar systems for further development of long-wavelength LEDs.

Hexagonal GaN microcrystals of a size between 1 to 3 μm are obtained by the pendeoepitaxial overgrowth of a GaN nanowire template on Si(111). The GaN microcrystals are free of threading dislocation...

The nucleation and growth of InAs nanowires on bare Si(111) has been investigated by molecular beam epitaxy. Nontapered InAs nanowires with high aspect ratio were grown perpendicular to the substrate without the use of catalyst particles, surface oxide, or other substrate mask. The nucleation of InAs takes place in In-rich areas forming spontaneously on the substrate in the beginning of the growth process. As the nucleation proceeds, the local stoichiometry on the growth interface changes from In-rich to As-rich, and the growth continues in a vapor–solid mode. This transition to As-rich conditions is correlated with the evolution of nanowire morphology, that is, with the growth becoming strictly uniaxial and with well-defined vertical sidewalls forming. The diameter, the number density, and the axial growth rate of the nanowires were found to depend exclusively on the surface diffusivity of In adatoms on the substrate.

Heteroepitaxial Fe films on GaN(0 0 0 1) are grown at 50, 350 and 500 °C by molecular beam epitaxy. The structural properties of these films are studied in situ by reflection high-energy electron diffraction φ scans and ex situ by electron backscatter diffraction and longitudinal as well as azimuthal X-ray scans. Their morphological and magnetic properties are investigated by atomic force microscopy and superconducting quantum interference device magnetometry, respectively. Higher growth temperatures lead to a clear improvement of the structural quality of the films while retaining their morphological integrity. Furthermore, the coercivity of the films increases significantly with growth temperature.

We demonstrate the morphological properties of height, diameter and shape controlled N-face GaN nanorods (NRs) by adjusting conventional growth parameters of a standard metalorganic vapour phase epitaxy (MOVPE) growth process. Particularly the hydrogen fraction within the carrier gas was shown to be an important shaping tool for the grown nanostructures. Additionally, the aspect ratio of the NRs was successfully tuned by increasing the pitch of the nanoimprint lithography (NIL) pattern, while maintaining the hole-diameter constant. An optimum aspect ratio could be found at pitches between 400 and 800 nm, whereas larger pitches are counter-productive. The major conclusion drawn from our experiments is that the whole amount of growth material available over the masked surface contributes to the growth of the NRs.

GaN and ZnO are both wide band gap semiconductors with interesting properties concerning optoelectronic and sensor device applications. Due to the lack or the high costs of native substrates, alternatives like sapphire, silicon, or silicon carbide are taken, but the resulting lattice and thermal mismatches lead to increased defect densities which reduce the material quality. In contrast, nanostructures with high aspect ratio have lower defect densities as compared to layers. In this work, we give an overview on our results achieved on both ZnO as well as GaN based nanorods. ZnO nanostructures were grown by a wet chemical approach as well as by VPT on different substrates – even on flexible polymers. To compare the growth results we analyzed the structures by XRD and PL and show possible device applications. The GaN nano- and microstructures were grown by metal organic vapor phase epitaxy either in a self-organized process or by selective area growth for a better control of shape and material composition. Finally we take a look onto possible device applications, presenting our attempts, e.g., to build LEDs based on GaN nanostructures.

Nanowire photodetectors are investigated because of their compatibility with flexible electronics, or for the implementation of on-chip optical interconnects. Such devices are characterized by ultrahigh photocurrent gain, but their photoresponse scales sublinearly with the optical power. Here, we present a study of single-nanowire photodetectors displaying a linear response to ultraviolet illumination. Their structure consists of a GaN nanowire incorporating an AlN/GaN/AlN heterostructure, which generates an internal electric field. The activity of the heterostructure is confirmed by the rectifying behavior of the current-voltage characteristics in the dark, as well as by the asymmetry of the photoresponse in magnitude and linearity. Under reverse bias (negative bias on the GaN cap segment), the detectors behave linearly with the impinging optical power when the nanowire diameter is below a certain threshold ($\approx$ 80 nm), which corresponds to the total depletion of the nanowire stem due to the Fermi level pinning at the sidewalls. In the case of nanowires that are only partially depleted, their nonlinearity is explained by a nonlinear variation of the diameter of their central conducting channel under illumination., This is the accepted manuscript version of an article that appeared in Nanotechnology. The CC BY-NC-ND 3.0 license applies, see https://creativecommons.org/licences/by-nc-nd/3.0

Previously, we found that N-polar (In,Ga)N/GaN quantum wells prepared on freestanding GaN substrates by plasma-assisted molecular beam epitaxy at conventional growth temperatures of about 650 °C do not exhibit any detectable luminescence even at 10 K. In the present work, we investigate (In,Ga)N/GaN quantum wells grown on Ga- and N-polar GaN substrates at a constant temperature of 730 °C. This exceptionally high temperature results in a vanishing In incorporation for the Ga-polar sample. In contrast, quantum wells with an In content of 20% and abrupt interfaces are formed on N-polar GaN. Moreover, these quantum wells exhibit a spatially uniform green luminescence band up to room temperature, but the intensity of this band is observed to strongly quench with temperature. Temperature-dependent photoluminescence transients show that this thermal quenching is related to a high density of nonradiative Shockley-Read-Hall centers with large capture coefficients for electrons and holes.

International audience; The amount of copper excess provided during the Cu(In,Ga)Se2 (CIGSe) 3-stage co-evaporation process is among the most operator subjective. In the present paper the influence of this parameter on the properties of the CIGSe films as well as on the behaviour of the related solar cells is investigated. It is observed that both the In/Ga lateral intermixing and the grain size are enhanced when the excess of copper is increased. Contrary to what could be expected, these changes only weakly affect the performance of the solar cells. Increasing the copper excess also yields a rougher CIGSe morphology. This latter evolution is observed to be the most important factor influencing the device behaviour. Through accurate analysis of quantum efficiency, it is concluded that, in the case of the standard cell structure, there exists a threshold in copper excess, beyond which the cell performance is significantly reduced.

This paper assesses intersubband (ISB) transitions in the 1-10 THz frequency range in nonpolar m-plane GaN/AlGaN multi-quantum-wells deposited on free-standing semi-insulating GaN substrates. The quantum wells (QWs) were designed to contain two confined electronic levels, decoupled from the neighboring wells. Structural analysis reveals flat and regular QWs in the two perpendicular in-plane directions, with high-angle annular dark-field scanning transmission electron microscopy images showing inhomogeneities of the Al composition in the barriers along the growth axis. We do not observe extended structural defects (stacking faults or dislocations) introduced by the epitaxial process. Low-temperature ISB absorption from 1.5 to 9 THz (6.3-37.4 meV) is demonstrated, covering most of the 7-10 THz band forbidden to GaAs-based technologies.

(In,Ga)N insertions embedded in self-assembled GaN nanowires are of current interest for applications in solid state light emitters. Such structures exhibit a notoriously broad emission band. We use cathodoluminescence spectral imaging in a scanning electron microscope and micro-photoluminescence spectroscopy on single nanowires to learn more about the mechanisms underlying this emission. We observe a shift of the emission energy along the stack of six insertions within single nanowires that may be explained by compositional pulling. Our results also corroborate reports that the localization of carriers at potential fluctuations within the insertions plays a crucial role for the luminescence of these nanowire based emitters. Furthermore, we resolve contributions from both structural and point defects in our measurements., Comment: 10 pages, 7 figures

The strain state and composition of a 400 nm thick (In,Ga)N layer grown by metal-organic chemical vapor deposition on a GaN template are investigated by spatially integrated x-ray diffraction and cathodoluminescence (CL) spectroscopy as well as by spatially resolved CL and energy dispersive x-ray analysis. The CL investigations confirm a process of strain relaxation accompanied by an increasing indium content toward the surface of the (In,Ga)N layer, which is known as the compositional pulling effect. Moreover, we identify the strained bottom, unstrained top, and gradually relaxed intermediate region of the (In,Ga)N layer. In addition to an increase of the indium content along the growth direction, the strain relaxation leads to an enhancement of the lateral variations of the indium distribution toward the surface., Comment: 4 pages, 5 figures

GaN nanowire ensembles with axial In(x)Ga(1-x)N multi-quantum-wells (MQWs) were grown by molecular beam epitaxy. In a series of samples we varied the In content in the MQWs from almost zero to around 20%. Within the nanowire ensemble, the MQWs fluctuate strongly in composition and size. Statistical information about the composition was obtained from x-ray diffraction and Raman spectroscopy. Photoluminescence at room temperature was obtained in the range of 2.2 to 2.5 eV, depending on In content. Contrary to planar MQWs, the intensity increases with increasing In content. We compare the observed emission energies with transition energies obtained from a one-dimensional model, and conclude that several mechanisms for carrier localization affect the luminescence of these three-dimensional structures.

Light emitting diodes (LEDs) were fabricated using ensembles of free-standing (In,Ga)N/GaN nanowires (NWs) grown on Si substrates in the self-induced growth mode by molecular beam epitaxy. Electron beam induced current analysis, cathodoluminescence as well as biased $\mu$-photoluminescence spectroscopy, transmission electron microscopy, and electrical measurements indicate that the electroluminescence of such LEDs is governed by the differences in the individual current densities of the single-NW LEDs operated in parallel, i.e. by the inhomogeneity of the current path in the ensemble LED. In addition, the optoelectronic characterization leads to the conclusion that these NWs exhibit N-polarity and that the (In,Ga)N quantum well states in the NWs are subject to a non-vanishing quantum confined Stark effect., Comment: This is an author-created, un-copyedited version of an article accepted for publication in Nanotechnology. IOP Publishing Ltd is not responsible for any errors or omissions in this version of the manuscript or any version derived from it. The Version of Record is available online at doi:10.1088/0957-4484/23/46/465301

This paper discusses some of the advantages of nanowire structures for use in LEDs as well as the challenges that need to be overcome towards the realisation of real-world devices. Our experimental results pertain to group-III nitride nanowire structures grown by MBE. We present clear evidence that the catalyst-free growth approach on Si yields best results with respect to structural and optical material properties. We elucidate the mechanism of nanowire nucleation and the factors determining the initial nanowire diameter, discuss the issue of InGaN growth in small-diameter nitride nanowires and review the results reported for nanowire-based group-III nitride LEDs reported so far.

Basal-plane stacking faults are an important class of optically active structural defects in wurtzite semiconductors. The local deviation from the 2H stacking of the wurtzite matrix to a 3C zinc-blende stacking induces a bound state in the gap of the host crystal, resulting in the localization of excitons. Due to the two-dimensional nature of these planar defects, stacking faults act as quantum wells, giving rise to radiative transitions of excitons with characteristic energies. Luminescence spectroscopy is thus capable of detecting even a single stacking fault in an otherwise perfect wurtzite crystal. This review draws a comprehensive picture of the luminescence properties related to stacking faults in GaN. The emission energies associated with different types of stacking faults as well as factors that can shift these energies are discussed. In this context, the importance of the quantum-confined Stark effect in these zinc-blende/wurtzite heterostructures, which results from the spontaneous polarization of wurtzite GaN, is underlined. This discussion is extended to zinc-blende segments in a wurtzite matrix. Furthermore, other factors affecting the emission energy and linewidth of stacking fault-related peaks as well as results obtained at room temperature are addressed. The considerations presented in this article should be transferable also to other wurtzite semiconductors., 16 pages, 14 figures

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The growth of N-polar (In,Ga)N structures by plasma-assisted molecular beam epitaxy is studied. (In,Ga)N multiple quantum well samples with atomically smooth surface were grown and their good structural quality was confirmed by x-ray diffraction, scanning transmission electron microscopy, and defect selective etching. The In incorporation was higher in the N-polar than in the Ga-polar oriented crystal, consistent with previous reports. However, despite the good morphological and structural properties of these samples, no photoluminescence signal from the (In,Ga)N wells was detected. In contrast, a thick N-polar (In,Ga)N layer exhibited a broad peak at 620 nm in good agreement with the In content determined by x-ray diffraction. The potential source of the luminescence quenching in the N-polar (In,Ga)N multiple quantum wells is discussed and attributed either to a strong nonradiative recombination channel at the surface promoted by the electric field or to the high concentration of point defects at the interfaces of the quantum well structures.

We investigate the optical switching process and the related structural properties of (GeTe)(Sb2Te3) epitaxial films close to Ge2Sb2Te5 composition on GaSb(001). While the amorphization process can take place in a single or in multiple steps, the re-crystallization process always takes place in multiple steps. Intermediate stages of the re-crystallization process are characterized by small crystalline islands within the amorphous area. The structural properties are investigated by optical microscopy and electron backscatter diffraction (EBSD) in a scanning electron microscope. The analysis of the EBSD pattern demonstrates that the crystalline islands at intermediate stages of the re-crystallization process exhibit different orientations. We conclude that the re-crystallization process is driven by nucleation without any orientation information from the substrate.

Hot-wall-epitaxy growth of Bi2Se3, Bi2Te3 and Sb2Te3 films is carried out on Si as well as GaAs surfaces. For Bi2Se3, self-assembled dots are formed at the initial stage of the growth due to the large lattice mismatch. The dots expand in a way to fill the whole substrate surface with (0 0 0 1)-oriented domains. While no in-plane epitaxial orientation relationship is established between the films and the substrates, the influence of the substrates is reflected in the morphology of the films. Throughout the growth, micrometer-size free-standing disks are spontaneously generated and eventually cover the whole surface. The disk geometry manifests that the Bi2Se3 crystal grows preferentially in the in-plane directions of the (0 0 0 1)-plane. For Bi2Te3 and Sb2Te3, we experience thermal decomposition. Although nanowires can be generated under low source-flux intensities, they are solely composed of Te as a consequence. Owing to different solidification temperatures, we obtain Bi2Te3 islands when the substrate temperature is raised. The surface of these islands is remarkably flat and the typical thickness is less than 10 nm.

Electron backscatter diffraction is utilized to determine the distribution of coexisting structural domains in MnAs layers prepared on GaAs substrates. In a layer grown on a GaAs(111)B substrate using solid phase epitaxy, the structural domains roughly correspond to the morphological features of the surface. The domains are, in contrast, considerably larger in size than the surface roughness when the substrate is GaAs(113)A. We examine the role of the freedom in in-plane crystalline alignment for causing such a difference using a numerical model. In a layer grown at an extraordinary high temperature (600 °C) on a GaAs(111)B substrate, (0001) and (11¯0l) orientations are interwoven. While the (0001) component is present mainly as thin flat films, a mixture of all the components forms thick elongated islands in the surrounding of the films. Consequences of such an inhomogeneity on the magnetic and electrical properties of the layer are discussed.

We demonstrate the fabrication of N-face GaN nanorods by metal organic vapour phase epitaxy (MOVPE), using continuous-flux conditions. This is in contrast to other approaches reported so far, which have been based on growth modes far off the conventional growth regimes. For position control of nanorods an SiO(2) masking layer with a dense hole pattern on a c-plane sapphire substrate was used. Nanorods with InGaN/GaN heterostructures have been grown catalyst-free. High growth rates up to 25 microm h(-1) were observed and a well-adjusted carrier gas mixture between hydrogen and nitrogen enabled homogeneous nanorod diameters down to 220 nm with aspect ratios of approximately 8:1. The structural quality and defect progression within nanorods were determined by transmission electron microscopy (TEM). Different emission energies for InGaN quantum wells (QWs) could be assigned to different side facets by room temperature cathodoluminescence (CL) measurements.