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In this article, the impacts of the off-state gate bias (VGS,OFF) on dynamic on-resistance (RON) are systematically investigated in commercial Schottky-type p-GaN Gate high-electron-mobility transistors. Double-pulse tester and pulsed I–V system are adopted to evaluate the dynamic RON with various off-state gate and drain bias (VDS,OFF) under hard- and soft-switching conditions. More negative VGS,OFF can aggravate the dynamic RON degradation under both soft- and hard-switching, especially when switching with a high VDS,OFF. The impacts of VGS,OFF on switching transients and off-state stress are investigated separately to reveal the underlying mechanisms, which are found to be associated with the generation and movements of holes. The off-state gate bias of the voltage-driving scheme needs to be carefully considered according to the identified mechanisms in terms of dynamic on-resistance degradation. [ABSTRACT FROM AUTHOR]

β-Ga2O3 has been subjected to intense research interest as an ultrawide bandgap semiconductor. The epitaxial growth technique of β-Ga2O3 thin films plays a fundamental and vital role in Ga2O3-based device fabrication. In this work, the epitaxial growth mechanisms of β-Ga2O3 on four low-Miller-index facets, (100), (010), (001), and ( 2 ¯ 01), are systematically explored using large-scale machine-learning molecular dynamics simulations at the atomic scale. The simulations reveal that the migration of the face-centered cubic stacking O sublattice plays a dominant role in the different growth mechanisms between the (100)/(010)/(001) and ( 2 ¯ 01) orientations. The resultant complex combinations of the stacking faults and twin boundaries are carefully identified and show good agreement with experimental observations and ab initio calculations. Our results provide useful insights into the gas-phase epitaxial growth of β-Ga2O3 thin films and suggest possible ways to tailor its properties for specific applications. [ABSTRACT FROM AUTHOR]

In this work, we focused on investigating the transport-limited trapping effects in GaN-on-Si buffer layers as well as impact of the thickness of buffer layers (TBuf) upon such effects. Vertical transport dynamics of charges within the buffer layers and their key energy levels are quantitatively and statistically investigated and analyzed. The results show that an increased TBuf diminishes both impurity conduction of the defect band formed by carbon doping as well as the injection of electrons from the substrate, greatly diminishing the current collapse and improving the stability of the device. Such enhancement is mainly attributed to the reduced vertical electric field within the thickened epitaxy, which provides an additional pathway to address the current collapse and yields more efficient power GaN-on-Si devices. [ABSTRACT FROM AUTHOR]

β -Ga 2 O 3 , known as a next-generation wide-bandgap transparent semiconducting oxide (TSO), has considerable application potential in ultra-high-power and high-temperature devices. However, fabricating a smooth β -Ga 2 O 3 substrate is challenging owing to its strong mechanical strength and chemical stability. In this study, an atomic-scale smoothing method named plasma-enabled atomic-scale reconstruction (PEAR) is proposed. We find that three reconstruction modes, namely, 2D-island, step-flow, and step-bunching, can be identified with the increase in the input power; only the step-flow mode can result in the formation of an atomically smooth β -Ga 2 O 3 surface (S a = 0.098 nm). Various surface and subsurface characterizations indicate that the smooth β -Ga 2 O 3 surface shows excellent surface integrity, high crystalline quality, and remarkable photoelectric properties. The atomic-scale density functional theory-based calculations show that the diffusion energy barrier of a Ga atom is only 0.46 eV, thereby supporting the atomic mass migration induced by high-energy plasma irradiation in the experiment. Nanoscale molecular dynamics simulations reveal that O atoms firstly migrate to crystallization sites, followed by Ga atoms with a lower migration rate; reconstruction mainly proceeds along the <010> direction and then expands along the <100> and <001> directions. The millimeter-scale numerical simulations based on the finite element method demonstrate that the coupling of the thermal and flow fields of plasma is the impetus for PEAR of β -Ga 2 O 3. Furthermore, the smoothing generality of PEAR is demonstrated by extending it to other common TSOs (α -Al 2 O 3 , ZnO, and MgO). As a typical plasma-based atomic-scale smoothing method, PEAR is expected to enrich the theoretical and technological knowledge on atomic-scale manufacturing. [Display omitted] • Plasma-enabled atomic-scale reconstruction (PEAR) is developed to polish β -Ga 2 O 3. • The coupled thermal and flow fields are the impetus for atoms' mass reconstruction. • The reconstruction features of β -Ga 2 O 3 are revealed by multi-scale simulations. • The surface and subsurface quality of oxides can be greatly improved via PEAR. • PEAR shows excellent polishing generality for common semiconducting oxides. [ABSTRACT FROM AUTHOR]

We present evidence of homogenization of atomic diffusion properties caused by C and N interstitials in an equiatomic single-phase high entropy alloy (FeMnNiCoCr). This phenomenon is manifested by an unexpected interstitial-induced reduction and narrowing of the directly experimentally determined migration barrier distribution of mono-vacancy defects introduced by particle irradiation. Our observation by positron annihilation spectroscopy is explained by state-of-the-art theoretical calculations that predict preferential localization of C/N interstitials in regions rich in Mn and Cr, leading to a narrowing and reduction of the mono-vacancy size distribution in the random alloy. This phenomenon is likely to have a significant impact on the mechanical behavior under irradiation, as the local variations in elemental motion have a profound effect on the solute strengthening in high entropy alloys. [Display omitted] [ABSTRACT FROM AUTHOR]