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Graphene lateral spin valves (LSVs) are promising devices for future memory and magnetic field sensing applications. In this article, we study the dependence of the nonlocal spin resistance, $\Delta {R}_{{\text {NL}}}$ , and the baseline resistance, ${R}_{{\text {BS}}}$ , as a function of the graphene channel width, ${W}$. The scaling trend is quantitatively assessed by using graphene deposited by chemical vapor deposition, which provides a large number of devices with consistent performance. As ${W}$ is scaled from 10 to $0.5~\mu \text{m}$ , the change in $\Delta {R}_{{\text {NL}}}$ matches the theory of contact-induced spin relaxation with a current spin polarization of 3%–5% and a spin diffusion length of $\lambda _{s} = 1.5$ – $2.5~\mu \text{m}$. We also observe a systematic and dramatic decrease in ${R}_{{\text {BS}}}$ , which we attribute to the reduction in charge current spreading. However, we find in the narrowest devices that a small ${R}_{{\text {BS}}}$ remains that arises due to thermoelectric effects, and this trend is confirmed using gate voltage- and charge current-dependent analyses. Finally, we introduce a nonideality factor, ${m} = \vert {R}_{{\text {BS}}} / \Delta {R}_{{\text {NL}}}\vert $ , as a figure of merit to describe the suppression of the baseline relative to the spin signal. In an LSV with ${L} = {1.5}\,\,\mu \text{m}$ , ${W} = {0.5}\,\,\mu \text{m}$ , and n-type conduction, the nonideality factor is as low as ${m} = {0.0252}\,\,\pm \,\,0.0202$ at room temperature showing that nearly ideal bipolar and symmetric spin signals can be achieved in graphene LSVs. [ABSTRACT FROM AUTHOR]

We investigate theoretically the behavior of electron spin states near graphene edges at low temperature in the presence of an external electric field. The graphene Hamiltonian is solved directly in the low energy regime including the Rashba spin-orbit interaction. Spin propagation in graphene and spin reflection at the edge are explored by calculating the probability of spin flips between the final and initial states. The spin scattering at the edge is affected by the initial location and the propagating direction of the electron with respect to the edge. Results for an example device structure including the effects of the non-uniform electrostatic field and potential near the graphene edge are presented. [ABSTRACT FROM AUTHOR]