25 results on '"Fogarassy, E."'
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2. Long Pulse Excimer Laser Doping of Silicon and Silicon Carbide for High Precision Junction Fabrication
3. Analytical description of the film thickness distribution obtained by the pulsed laser ablation of a monoatomic target: application to silicon and germanium
4. Pulsed Excimer Laser Crystallization and Doping for the Fabrication of Poly-Si and -SiGe TFTs
5. Optical and Electrical Properties of Laser Annealed Heavily Doped Silicon
6. HIGH Tc YBaCuO AND BiSrCaCuO SUPERCONDUCTING THIN FILMS DEPOSITED BY PULSED EXCIMER LASER EVAPORATION
7. Improvement of Phosphorus Diffused Silicon Solar Cells by Laser Treatment
8. Uv Laser Induced Oxidation of Silicon in Solid and Liquid Phase Regime
9. Laser Processing in the Preparation of High Efficiency Polycristalline Silicon Solar Cells
10. A-Si Solar cells prepared by the glow discharge technique
11. Photo-Induced Oxidation Processes in Silicon
12. Solar Cells Realized by Laser Induced Diffusion of Dopants Deposited on Silicon Surface
13. Influence of hydrogen on the structure and surface morphology of pulsed ArF excimer laser crystallized amorphous silicon thin films
14. Synthesis of SiO2 thin films by reactive excimer laser ablation
15. One-step growth of polycrystalline silicon thin films at low-temperature by ArF excimer laser-induced photo-CVD
16. Pulsed excimer and Nd:YAG laser crystallization of a-Si:H the specific role of hydrogen
17. Deposition of SiO2 by reactive excimer laser ablation from a SiO target
18. Optimization of the Parameters Involved in the Photochemical Doping of Si with a Pulsed Arf Excimer Laser
19. A Thermal Description of the Melting of c- and a-Silicon Under Pulsed Excimer Lasers
20. Excimer Laser Induced Melting of Heavily Doped Silicon: a Contribution to the Optimization of the Laser Doping Process
21. Comparison between Microscopical Aspects of A-Si Films Crystallized by Pulsed Uv Excimer Laser and Calculated Temperature Profiles
22. Excimer Laser Recrystallization of Amorphous Si Films Characterized by Grazing X-Ray Diffraction and Optical Reflectivity
23. Influence of Dilution in Nitrogen on the Photodissociation Processes of Silane and Disilane at 193 Nm
24. SOLUBILITY LIMIT OF DOPANTS IN LASER-TREATED SILICON
25. Chapter 12 - Long Pulse Excimer Laser Doping of Silicon and Silicon Carbide for High Precision Junction Fabrication
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