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High-k materials, such as HfO2, Al2O3, and many others, have been employed to replace the SiO2 insulator in the gate dielectric device in order to offer significant gate leakage reduction. In this study, the physical properties of hafnium dioxide (HfO2) thin films were analyzed and characterized in the cases of ‘as-deposited’ and ‘post-deposition annealing’ (PDA). Ultra-thin hafnium dioxide films of thickness 2.5, 5 and 10 nm were deposited on Si (100) substrates using atomic layer deposition (ALD) at temperature of 300° C. After deposition, the films were annealed using furnace in Ar ambient for 10 minutes at 450° C, 550° C, 650° C and 750° C. The thickness, density, roughness and the crystalline evolution of the HfO2 films were investigated by Grazing Incidence X-Ray Reflectometry (GIXRR) and Grazing Incidence X-Ray Diffraction (GIXRD) for both as-deposited and post-annealing conditions. Transmission Electron Microscope (TEM) was used to provide image verification of the two-layer model applied in XRR fitting analysis. Furthermore, the grain sizes were evaluated by X-ray diffraction peak-broadening (full width at half maximum, FWHM) calculation according to the Scherrer method. The experimental results showed that the annealing temperatures had significant impact on the thickness, density and roughness of the HfO2 and SiO2 layers. In addition, the experimental results demonstrated the grain sizes depend on not only the thickness of the film, but also the annealing temperatures in the crystallization process. [ABSTRACT FROM AUTHOR]

This study aims to investigate an understudied linkage between intellectual capital and organizational commitment. As such, we attempt to delineate whether personal assets or organizational investments influences organizational commitment. A cross-level design is conducted to do the questionnaire survey. Our research variables include two levels: individual level (personal human capital and organizational commitment) and organizational level (organizational intellectual capital). Twenty-seven SMEs in Taiwanese Creative Industries were invited to participate in the study, and twenty-seven CEOs and eighty-six employees provided the research information. Research results indicate that the effect of organizational intellectual capital on OC is stronger than personal human capital. That means Taiwanese SMEs in Creative Industries should invest and accumulate intellectual capital to facilitate the quality of employee commitment. [ABSTRACT FROM AUTHOR]

This study aims to investigate the effects of interviewer characteristics (i.e., friendliness and credibility) on organizational attractiveness, through the mediation of applicant perceived person-organization fit (P-O fit) and the moderation of applicant's personality traits (i.e., agreeableness and conscientiousness). Data were gathered from 100 applicants after a face-to-face interview. Results indicate that interviewers' friendliness and credibility lead to organizational attractiveness through perceptions of P-O fit by applicants. Additionally, applicant's conscientiousness amplifies the positive effect of interviewer's credibility on their perceptions of P-O fit. Finally, the moderated mediation test reveals a significant conditional indirect effect of interviewer's friendliness and credibility on organizational attractiveness through P-O fit for applicants with a high-level of agreeableness and conscientiousness, but not for those with a low-level of agreeableness and conscientiousness. [ABSTRACT FROM AUTHOR]