Search

Nano‐scale textures are formed on crystalline silicon surfaces by using a two‐step electroless wet‐chemical method consisting of a treatment in an activated Na2S2O8(K2S2O8) solution for localized oxidation/surface reaction and silver nanoparticles deposition. The oxidation/reaction products are etched in an aqueous solution of HF and H2O2assisted by the presence of silver nanoparticles. The reflectance of the nanotextured silicon wafer surfaces less than 5% in the spectral interval 300–900 nm is observed. It was found that the surface texture can withstand without significantly changing the high‐temperature solar cell processing. A weighted reflectance of 9.5% and 16.43% efficiency are obtained on nanotextured mc‐Si solar cells with an active area of 146 mm2prepared using the standard screen‐printing technique.