19 results on '"Muroya, Yusa"'
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2. Effects of substituents in triphenylsulfonium cation on its radiation-induced decomposition and dissolution kinetics of chemically amplified resists
3. Substituent effects of acid generators on radiation-induced degradation and dissolution kinetics in chemically amplified resist process
4. Extreme Ultraviolet Lithographic Performance and Reaction Mechanism of Polymeric Resist─Utilizing Radical- and Acid-Amplified Cross-Linking
5. Reaction mechanisms of Sn-complex-side-chain polymer used for extreme ultraviolet lithography, studied by electron pulse radiolysis and γ-radiolysis
6. Reaction mechanisms and EB patterning evaluation of Sn-complex-side-chain polymer used for EUV lithography
7. Sensitization mechanism of metal oxide nanocluster resists with carboxylic acid ligands
8. Decarboxylation efficiency of carboxylic acids as ligands of metal oxide nanocluster resists upon γ-ray irradiation
9. Pulse radiolysis study on free radical scavenger edaravone (3-methyl-1-phenyl-2-pyrazolin-5-one). 2: A comparative study on edaravone derivatives.
10. Fast repair activities towards dGMP hydroxyl radical adducts by silybin and its analogues.
11. Ultraslow Thermoresponse in Hydrogels Synthesized with Radiation Technique
12. Laser flash photolysis of carboxymethylcellulose in an aqueous solution
13. Laser photolysis study on the reaction of nitrate radical with tributylphosphate and its analogues—comparison with sulfate radical
14. Temperature dependence of ketyl radical in aqueous benzophenone solutions up to 400 °C: A pulse radiolysis study
15. High-Charge S-Band Photocathode RF-Gun and Linac System for Radiation Research
16. Pulse radiolysis of carboxylic acids used as ligands of metal oxide nanocluster resists
17. Dependence of relationship between chemical gradient and line width roughness of zirconia nanoparticle resist on pattern duty, acid generator, and developer
18. Pulse radiolysis of methacrylic acid ligand for zirconia nanoparticle resist
19. Chemical repair activity of free radical scavenger edaravone: reduction reactions with dGMP hydroxyl radical adducts and suppression of base lesions and AP sites on irradiated plasmid DNA
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