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A novel observation technique for secondary defects of ion implantation has been developed. Stripping of the surface by means of a combination of anodic oxidation and removal of the oxide has been found to expose the buried secondary defects induced by ion implantation. The defects observed by means of atomic force microscopy (AFM) show craterlike forms created by enhanced oxidation around the secondary defects. Detection of the defects with this technique is complementary to conventional transmission electron microscopy (TEM) observation. The technique is a promising method for clarifying the depth distribution of various defects. The technique has also been found to be advantageous for planar TEM observation.