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We present self-assembly of InAs/InAlAs quantum dots by droplet epitaxy technique on vicinal GaAs(111)A substrates. The small miscut angle, while maintaining the symmetries imposed to the quantum dot from the surface, allows fast growth rate thanks to the presence of preferential nucleation sites at the step edges. A 100 nm InAlAs metamorphic layer with In content > 50% is already almost fully relaxed with a very flat surface. The quantum dots emit at the 1.3 {\mu}m telecom O-band with the fine structure splitting as low as 16 {\mu}eV, thus making them suitable as photon sources in quantum communication networks using entangled photons., Comment: 13 pages, 4 figures