1. Improved stability of dielectric/metal/dielectric-structured transparent conductive films with the insertion of Ni layer under thermal oxidation environment.
- Author
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Zhang, Zhibo, Zhang, Xinyu, Xu, Liangge, Yang, Yanan, Min, Pingping, Zhang, Ruicong, Yang, Lei, Bolshakov, Andrey, and Zhu, Jiaqi
- Subjects
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SURFACE resistance , *STRUCTURAL failures , *OXIDATION , *SURFACE structure , *DIELECTRICS , *PHOTOELECTRIC effect , *NICKEL-chromium alloys , *SILVER phosphates - Abstract
• AZO/Ag/AZO multilayer films are prone to failures under thermal oxidation. • Inserting Ni layer can improve the photoelectric stability of AZO/Ag/AZO films. • Film had good transmittance, surface resistance and structure after oxidation at 500 °C. • Ag diffusion was inhibited by Ni layer and photoelectric stability was improved. Dielectric/metal/dielectric-structured transparent conductive films are prone to structural and functional failures under thermal oxidation environment. Herein, a Ni layer was employed to improve the photoelectric stability of AZO/Ag/AZO multilayer films. The AZO/Ni/Ag/AZO film exhibited a transmittance of 75%, surface resistance of ~7 Ω/sq, and stable structure after thermal oxidation treatment at 500 °C. The visible light transmittance, surface resistance, and figure of merit values of the AZO/Ag/AZO and AZO/Ni/Ag/AZO films were determined after high-temperature treatment in ambient air. The diffusion of Ag was effectively inhibited by the Ni layer, and the photoelectric stability of AZO/Ag/AZO films was improved under thermal environment. [ABSTRACT FROM AUTHOR]
- Published
- 2021
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