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We report an advanced chemical vapour deposition approach which yields not previously observed carbon-based foam-like films completely filled with a single phase of α-Fe. These films are found in the region of the chemical vapour deposition reactor where the temperature is relatively low (650–770 °C) and exhibit a high saturation magnetization as high as 200–220 emu/g at room temperature when small concentrations of Cl-radicals are added to the pyrolysing CVD system by mixing 0.15 ml of dichlorobenzene to ferrocene. Instead when the only ferrocene is used a lower saturation magnetization of 140–145 emu/g is found due to an amorphous arrangement of the Fe-phase in some parts of the foam. Also we show that for much higher concentration of Cl radicals (0.65 ml of dichlorobenzene mixed to ferrocene) a dramatic decrease of the quantity of crystalline α-Fe is found together with the formation of amorphous Fe and Fe x O x phases. [ABSTRACT FROM AUTHOR]

Ta (3.3 nm)/- (3.3 nm) integrated films deposited on substrates by magnetron sputtering, annealed at various temperatures in a ultra-high vacuum, have been studied as diffusion barrier layers between and for application in interconnection. The images of transmission electron microscopy (TEM) prove that the cross-sectional interfaces of //-/ sample annealed at 600°C are clear and sharp. No -silicide peaks can be found from the X-ray diffraction (XRD) patterns of the 850°C annealed sample, but the sheet resistance of the sample increases abruptly. Moreover, large grooves are found from the image of atomic force microscopy (AFM) for the 850°C annealed sample, implying the failure of the diffusion barrier. The integrated /- barrier layer retains thermally stable nature up to at least 800°C, indicating that the /- integrated film is an excellent diffusion barrier between and . [ABSTRACT FROM AUTHOR]