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A novel polypiperazine-amide nanofiltration (NF) membrane with very high salt rejection was successfully developed in this work. The NF membrane chlorine-tolerant ability were improved greatly after mixing a small amount of α,ω-diamino poly(ethylene glycol) (NH 2 -PEG-NH 2 ) with piperazine (PIP) in the aqueous phase. The XPS result demonstrated that the polymerization degree of the NF membrane was notably enhanced with the addition of NH 2 -PEG-NH 2 . The solute rejections and chlorine tolerance were improved remarkably, while the permeate flux remained almost at the same level. When the NH 2 -PEG-NH 2 (2 kDa) content in the total amine was 1%w/w (0.01%w/v in the aqueous solution), NF membrane performance was optimal. This membrane exhibited a pure water flux (PWF) of 34.9 L m −2 h −1 along with Na 2 SO 4 , MgSO 4 , MgCl 2 and NaCl rejections of 99.5%, 99.2%, 90.9% and 58.3% (2000 ppm, 6 bar, 25 °C), respectively. Moreover, the NF membrane performance was maintained after being treated by 14,000 ppm NaClO for 1 h. Therefore, adding a small amount of NH 2 -PEG-NH 2 in the aqueous phase could be considered to be an effective way to improve the polypiperazine-amide NF membrane chlorine-tolerant ability. [ABSTRACT FROM AUTHOR]

Using Polysulfone (PSF) ultrafiltration (UF) membrane as porous support, a chlorine-tolerant nanofiltration (NF) membrane was prepared by interfacial polymerization of piperazine (PIP) and 2,2'-bis(1-hydroxyl-1-trifluoromethyl-2,2,2-triflutoethyl)-4,4'-methylenedianiline (BHTTM) mixture with trimesoyl chloride (TMC). The XPS, SEM, AFM and contact angle methods were employed to characterize the physicochemical properties and morphology of the prepared NF membranes. The effects of preparation conditions such as reaction time, monomers mixing ratio and oxidation treatment on NF membrane performance were investigated. The salt rejection of the NF membrane met the order of Na 2 SO 4 >MgSO 4 >NaCl, indicating the membrane possessed a negative surface charge. The results showed the NF membrane prepared under the optimum conditions exhibited pure water flux (PWF) with 79.1 (L/m 2 h) and Na 2 SO 4 rejection of 99.5% under 0.6 MPa. The optimized post oxidation condition was treated by 3000 ppm NaClO solution for 1 h. The best NF membrane had a molecular weight cut-off (MWCO) less than 300 Da, corresponding to the pore size of 1 nm, which was calculated from the rejection of carbohydrates. The robustness of the NF membrane was proven by showing satisfactory stability in the long time running. [ABSTRACT FROM AUTHOR]

This work describes a novel nanofiltration membrane fabrication strategy in which the octadecylamine-grafted GO with the organophilic property is incorporated in organic phase during interfacial polymerization (IP) in order to protect the polyamide backbone from the attack of free chlorine. Meanwhile, the aqueous phase containing mixed amines of piperazine (PIP) and the fluorine-containing monomer (2,2′-bis(1-hydroxyl-1-trifluoromethyl-2,2,2-triflutoethyl)-4,4′-methylenedianiline, BHTTM) enables further improvement in chlorine resistance of the thin film nanocomposite (TFN) membrane. The modified GO was systematically characterized by TEM, FT-IR, TGA and XRD. And the membrane properties were investigated by XPS, TEM, AFM and dynamic contact angle. The octadecylamine-grafted GO TFN membrane (TFNMA-GO-ODA) exhibits measurably smoother and less hydrophilic surface compared to TFC membrane with mixed amines as well as the similarly fabricated GO TFN membrane. The TFNMA-GO-ODA demonstrated a pure water flux of 49.6 L m −2 h −1 (0.6 MPa), which was nearly 2.5 times than that of pristine PIP TFC membrane and 1.6 times than that of mixed-amine TFC membrane, while keeping high Na 2 SO 4 rejection of 98.4%. More importantly, the TFNMA-GO-ODA presented excellent chlorine resistance, benefiting from the existence of fluorine-containing groups in BHTTM and the protective effect of stable graphene nanosheets. The results indicate great potential of such membrane in water desalination and purification in industrial scale. [ABSTRACT FROM AUTHOR]