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This paper proposes a modified Schmitt-trigger (ST)-based single-ended 11 T (MST11T) SRAM cell. The proposed cell is best suited to ultra-low voltage applications. Two ST-based cross-coupled inverters comprise the storage cell of the proposed MST11T bit cell. In comparison with conventional inverters, ST-based inverters have sharp voltage transfer characteristics. As a result, the proposed bit cell's stability performance increases. The proposed SRAM cell's leakage power consumption is reduced because of the use of stacked N-type transistors. For the read operation of the proposed bit cell, the read decoupled technique is used. As a result, the read static noise margin (RSNM) has greatly improved. The proposed bit cell's write static noise margin (WSNM) is increased by adopting feedback-cutting methodology. The performance of the proposed bit cell is compared with that of conventional 6 T, conventional 8 T, Schmitt-trigger 10 T (known as ST2), modified PMOS-PMOS-NMOS-based cell core 10 T (MPPN10T), feedback-cutting 11 T (FC11T), Schmitt-trigger 11 T (ST11), and Schmitt-trigger 12 T (ST12T) cells. According to the simulation results, the proposed MST11T SRAM cell has RSNM of 2.42, 1.18, 1.71, 1.30, and 1.80 times higher when compared to 6 T, FC11T, ST2, MPPN10T, and ST12T, respectively. The WSNM of the proposed bit cell has been increased by 1.56, 2.44, 1.28, 1.71, 1.35, 1.52, and 1.02 times, respectively, over 6 T, 8 T, ST2, MPPN10T, FC11T, ST11T, and ST12T. Furthermore, the suggested cell has a read delay that is 1.32, 1.79, and 1.53 times lower than ST11T, FC11T, and ST12T, respectively. The proposed bit cell has a write delay that is 1.14 and 1.63 times lower than FC11T and ST11T, respectively. The proposed MST11T bit-cell consumes 3.74, 1.56, 4.59, 5.38, and 4.83 times less leakage power than the 8 T, ST2, MPPN10T, FC11T, and ST12 bit-cells, respectively. When compared to 8 T/ST2/MPPN10T/ST12T at 0.2 V supply voltage, the enhanced facts incur a 4.87/3.79/3.78/1.97 penalty in write delay. The figure of merit (FOM) is derived as a result of this extensive access to the revolutionary SRAM cell performance, i.e., offering greater values at a 0.2 V DC supply voltage. In addition, the paper examines the impact of manufacturing process and temperature changes on MST11T cell enactment, as well as the circuit robustness using HSPICE with 7-nm FinFET technology. [ABSTRACT FROM AUTHOR]