1. Combined HF+MW CVD Approach for the Growth of Polycrystalline Diamond Films with Reduced Bow.
- Author
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Sedov, Vadim, Popovich, Alexey, Linnik, Stepan, Martyanov, Artem, Wei, Junjun, Zenkin, Sergei, Zavedeev, Evgeny, Savin, Sergey, Gaydaychuk, Alexander, Li, Chengming, Ralchenko, Victor, and Konov, Vitaly
- Subjects
DIAMOND films ,CHEMICAL vapor deposition ,THERMAL conductivity ,MICROWAVE plasmas ,ELECTRON field emission ,THIN films - Abstract
A combination of two methods of chemical vapor deposition (CVD) of diamond films, microwave plasma–assisted (MW CVD) and hot filament (HF CVD), was used for the growth of 100 µm-thick polycrystalline diamond (PCD) layers on Si substrates. The bow of HF CVD and MW CVD films showed opposite convex\concave trends; thus, the combined material allowed reducing the overall bow by a factor of 2–3. Using MW CVD for the growth of the initial 25 µm-thick PCD layer allowed achieving much higher thermal conductivity of the combined 110 µm-thick film at 210 W/m·K in comparison to 130 W/m·K for the 93 µm-thick pure HF CVD film. [ABSTRACT FROM AUTHOR]
- Published
- 2023
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