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Your search keyword '"Lee, T.L."' showing total 6 results
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6 results on '"Lee, T.L."'

3. Oxygen-Redox Activity in Non-Lithium-Excess Tungsten-Doped LiNiO2 Cathode

Author

Menon, A.S., primary, Johnston, B.J., additional, Booth, S.G., additional, Zhang, L., additional, Kress, K., additional, Murdock, B.E., additional, Paez Fajardo, G., additional, Anthonisamy, N.N., additional, Tapia-Ruiz, N., additional, Agrestini, S., additional, Garcia-Fernandez, M., additional, Zhou, K., additional, Thakur, P.K., additional, Lee, T.L., additional, Nedoma, A.J., additional, Cussen, S.A., additional, and Piper, L.F.J., additional

Published
2023
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4. A 3nm CMOS FinFlex™ Platform Technology with Enhanced Power Efficiency and Performance for Mobile SoC and High Performance Computing Applications

Author

Wu, Shien-Yang, primary, Chang, C.H., additional, Chiang, M.C., additional, Lin, C.Y., additional, Liaw, J.J., additional, Cheng, J.Y., additional, Yeh, J.Y., additional, Chen, H.F., additional, Chang, S.Y., additional, Lai, K.T., additional, Liang, M.S., additional, Pan, K.H., additional, Chen, J.H., additional, Chang, V.S., additional, Luo, T.C., additional, Wang, X., additional, Mor, Y.S., additional, Lin, C.I., additional, Wang, S.H., additional, Hsieh, M.Y., additional, Chen, C.Y., additional, Wu, B.F., additional, Lin, C.J., additional, Liang, C.S., additional, Tsao, C.P., additional, Li, C.T., additional, Chen, C.H., additional, Hsieh, C.H., additional, Liu, H.H., additional, Chen, P.N., additional, Chen, C.C., additional, Chen, R., additional, Yeo, Y.C., additional, Chui, C.O., additional, Chang, W., additional, Lee, T.L., additional, Huang, K.B., additional, Lin, H.J., additional, Chen, K.W., additional, Tsai, M.H., additional, Chen, K.S., additional, Chen, X.M., additional, Cheng, Y.K., additional, Wang, C.H., additional, Shue, W., additional, Ku, Y., additional, Jang, S. M., additional, Cao, M., additional, Lu, L.C., additional, and Chang, T.S., additional

Published
2022
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5. Critical Process Features Enabling Aggressive Contacted Gate Pitch Scaling for 3nm CMOS Technology and Beyond

Author

Chang, Chih-Hao, primary, Chang, V.S., additional, Pan, K.H., additional, Lai, K.T., additional, Lu, J. H., additional, Ng, J.A., additional, Chen, C.Y., additional, Wu, B.F., additional, Lin, C.J., additional, Liang, C.S., additional, Tsao, C.P., additional, Mor, Y.S., additional, Li, C.T., additional, Lin, T.C., additional, Hsieh, C.H., additional, Chen, P.N., additional, Hsu, H.H., additional, Chen, J.H., additional, Chen, H.F., additional, Yeh, J.Y., additional, Chiang, M.C., additional, Lin, C.Y., additional, Liaw, J.J., additional, Wang, C.H., additional, Lee, S.B., additional, Chen, C.C., additional, Lin, H.J., additional, Chen, R., additional, Chen, K.W., additional, Chui, C.O., additional, Yeo, Y.C., additional, Huang, K.B., additional, Lee, T.L., additional, Tsai, M.H., additional, Chen, K.S., additional, Lu, Y.C., additional, Jang, S.M., additional, and Wu, S.-Y., additional

Published
2022
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