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Monolithic perovskite/c-Si tandem solar cells have attracted enormous research attention and have achieved efficiencies above 30%. This work describes the development of monolithic tandem solar cells based on silicon heterojunction (SHJ) bottom- and perovskite top-cells and highlights light management techniques assisted by optical simulation. We first engineered (i)a-Si:H passivating layers for (100)-oriented flat c-Si surfaces and combined them with various (n)a-Si:H, (n)nc-Si:H, and (n)nc-SiOx:H interfacial layers for SHJ bottom-cells. In a symmetrical configuration, a long minority carrier lifetime of 16.9 ms was achieved when combining (i)a-Si:H bilayers with (n)nc-Si:H (extracted at the minority carrier density of 1015 cm–3). The perovskite sub-cell uses a photostable mixed-halide composition and surface passivation strategies to minimize energetic losses at charge-transport interfaces. This allows tandem efficiencies above 23% (a maximum of 24.6%) to be achieved using all three types of (n)-layers. Observations from experimentally prepared devices and optical simulations indicate that both (n)nc-SiOx:H and (n)nc-Si:H are promising for use in high-efficiency tandem solar cells. This is possible due to minimized reflection at the interfaces between the perovskite and SHJ sub-cells by optimized interference effects, demonstrating the applicability of such light management techniques to various tandem structures.

Thanks to the prominent passivating contact structures, silicon heterojunction (SHJ) solar cell has recently achieved revolutionary advancements in the photovoltaic industry. This is, however, bound to further strengthen its contact performance for gaining the competitive edge in the period of technology transformation. Here, we developed SHJ cells with improved rear contact consisting of a p-type doped nanocrystalline silicon and a tailored transparent conductive oxide. Benefiting from the low contact resistance of hole-selective contacts (2), a high power conversion efficiency of 26.74% together with a record filling factor (FF) of 86.48% were certified on industrial-grade silicon wafers (274 cm2, M6 size). The electrical properties of the modified SHJ cells were thoroughly analyzed in comparison with the normal p-type transporting layer counterparts (i.e., amorphous silicon), and the improved charge carrier transport in behind were also fully demonstrated.

Silicon heterojunction (SHJ) solar cells have reached high power conversion efficiency owing to their effective passivating contact structures. Improvements in the optoelectronic properties of these contacts can enable higher device efficiency, thus further consolidating the commercial potential of SHJ technology. Here we increase the efficiency of back junction SHJ solar cells with improved back contacts consisting of p-type doped nanocrystalline silicon and a transparent conductive oxide with a low sheet resistance. The electrical properties of the hole-selective contact are analysed and compared with a p-type doped amorphous silicon contact. We demonstrate improvement in the charge carrier transport and a low contact resistivity (2). Eventually, we report a series of certified power conversion efficiencies of up to 26.81% and fill factors up to 86.59% on industry-grade silicon wafers (274 cm2, M6 size).

Passivating contacts based on poly-Si have enabled record-high c-Si solar cell efficiencies due to their excellent surface passivation quality and carrier selectivity. The eventual existence of pinholes within the ultra-thin SiOx layer is one of the key factors for carrier collection, beside the tunneling mechanism. However, pinholes are usually believed to have negative impact on the passivation quality of poly-Si passivating contacts. This work studied the influence of the pinhole density on the passivation quality of ion-implanted poly-Si passivating contacts by decoupling the pinhole generation from the dopants diffusion process by means of two annealing steps: (1) a pre-annealing step at high temperature after the intrinsic poly-Si deposition to visualize the formation of pinholes and (2) a post-annealing step for dopants activation/diffusion after ion-implantation. The pinhole density is quantified in the range of 1✕106 to 3✕108 cm2 by the TMAH selective etching approach. The passivation quality is discussed with respect to the pinhole density and the post-annealing thermal budget (TB) for dopants diffusion. The study shows that a moderate pinhole density does not induce doping profile variations that can be detectable by the coarse spatial resolution of ECV measurements. It is surprising that the existence of pinholes in a moderate density within our thickness fixed SiOx layer can effectively enhance the passivation qualities for both n+ and p+ poly-Si passivating contacts. We speculate the reason is due to the enhanced field-effect passivation at the pinhole surrounding. In fact, the variation of the passivation quality depends on the balance between a strengthened field-effect passivation and an excessive local Auger recombination, being both effects induced by the higher and deeper level of dopants diffused into the c-Si surface through the pinholes.

Organic-inorganic metal halide perovskites have attracted a considerable interest in the photovoltaic scientific community demonstrating a rapid and unprecedented increase in conversion efficiency in the last decade. Besides the stunning progress in performance, the understanding of the physical mechanisms and limitations that govern perovskite solar cells are far to be completely unravelled. In this work, we study the origin of their hysteretic behaviour from the standpoint of fundamental semiconductor physics by means of technology computer aided design electrical simulations. Our findings identify that the density of shallow interface defects at the interfaces between perovskite and transport layers plays a key role in hysteresis phenomena. Then, by comparing the defect distributions in both spatial and energetic domains for different bias conditions and using fundamental semiconductor equations, we can identify the driving force of hysteresis in terms of slow recombination processes and charge distributions.