1. Assessing DC and RF Reliability of SiGe HBTs Stress-Engineered Using Dummy BEOL Layers
- Author
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Sepulveda-Ramos, Nelson E., Lee, Harrison P., Teng, Jeffrey W., and Cressler, John D.
- Abstract
The present work demonstrates, for the first time, the impact of back-end-of-line (BEOL) design on the electrical reliability of SiGe heterojunction bipolar transistors (HBTs). Mixed-mode and high-current stress were performed for four different SiGe HBT variants designed with varying levels of dummy metal over-layers. The avalanche multiplication factor was found to be insensitive to changes in the BEOL, and thus the classical mixed-mode degradation was found to be similar across all BEOL variants. Meanwhile, high-current stress showed that adding more dummy metal layers alleviated the current gain and base current density degradation by 30% and 100%, respectively. Both the mechanical stress and temperature differences due to additional dummy metal layers were investigated using calibrated technology computer-aided design (TCAD) simulations. To assess RF implications, small-signal transition frequency (
${f}_{T}$ - Published
- 2024
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