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1. Effect of rapid thermal annealing on the mechanical stress and physico-chemical properties in plasma enhanced atomic layer deposited silicon nitride thin films

Author

Peter, Antony Premkumar, primary, Sepulveda Marquez, Alfonso, additional, Meersschaut, Johan, additional, Dara, Praveen, additional, Blanquart, Timothee, additional, Tomomi, Takayama, additional, Taishi, Ebisudani, additional, Elichiro, Shiba, additional, Kimura, Yosuke, additional, Gompel, Sander van, additional, and Morin, Pierre, additional

Published
2022
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