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Herein, the lasing threshold and gain characteristics of ultraviolet‐C optically pumped edge‐emitting lasers with thick single‐quantum‐well (SQW) active regions are investigated by the variable‐stripe length method. Positive net modal gain is observed in lasers with AlGaN‐based SQWs with thicknesses up to 12 nm. The lasers show a reduction of the threshold power density with increasing SQW thickness, with the lowest threshold of 1.3 MW cm−2 achieved for a 9 nm SQW laser. The high gain and low threshold in lasers with thick quantum wells are attributed to lasing from excited states, where the polarization fields are screened by the carriers in the fundamental state and the barriers, thus recovering larger electron and hole wavefunctions overlap. These findings are supported by k · p simulations, and for a 9 nm SQW, the calculation predicts a contribution of the fundamental transition to the gain of 75% for non‐resonant optical excitation and below 1% for resonant optical or electrical excitation. [ABSTRACT FROM AUTHOR]

Quantum well nanolasers usually show single‐mode lasing, as gain saturation suppresses emissions in other modes. In contrast, for whispering gallery mode microdisk lasers with GaN quantum wells as active material, above threshold multimode laser emission is observed. This intriguing emission feature is manifested in the fact that several modes simultaneously show the characteristic kink in the input–output curve at the onset of lasing. A quantum theory for nanolasers is used to support the experimental finding and to analyze this behavior in the presence of gain saturation. Coupling effects between neighboring modes are identified as the origin of multimode lasing, which initiate photon exchange between modes via population pulsations similar to classical wave‐mixing effects. A reduction of this type of mode coupling with increasing mode spacing is demonstrated. The results can pave the way for multimode application of nanolasers in integrated photonic circuits. [ABSTRACT FROM AUTHOR]

The monoclinic beta-phase of gallium oxide possesses an ultra-wide bandgap that surpasses other wide bandgap materials such as SiC and GaN, making it a promising candidate for power electronic device technologies. We investigate the first fundamental optical transitions in this material, which exhibit a strong directional dependence. To determine the energies and orientations of these transitions, temperature-dependent and angular resolved photoluminescence excitation spectroscopy is applied. We observe a distinct excitation channel located energetically between those of the first two optical transitions Γ 1 − 1 and Γ 1 − 2 . While previous absorption edge and reflectance spectroscopy studies have assigned a transition in this spectral range to either the Γ 1 − 1 or the Γ 1 − 2 transition, our findings demonstrate no pronounced polarization dependence of this excitation channel within the (010) plane, an observation not reflected in calculations of the band-to-band transitions in β - Ga 2 O 3 . [ABSTRACT FROM AUTHOR]

We report on the epitaxial growth, theoretical modeling, and structural as well as optical investigation of multi-layer, site-controlled quantum dots fabricated using the buried stressor method. This deterministic growth technique utilizes the strain from a partially oxidized AlAs layer to induce site-selective nucleation of InGaAs quantum dots. By implementing strain-induced spectral nano-engineering, we achieve spectral control of emission and a local increase in the emitter density. Furthermore, we achieve a threefold increase in the optical intensity and reduce the inhomogeneous broadening of the ensemble emission by 20% via stacking three layers of site-controlled emitters, which is valuable for using the SCQDs as a gain medium in microlaser applications. Our optimization of site-controlled growth of quantum dots enables the development of high-β microlasers with increased confinement factor. [ABSTRACT FROM AUTHOR]

Rutile GeO2 has been predicted to be an ultra-wide bandgap semiconductor suitable for future power electronic devices, while quartz-like GeO2 shows piezoelectric properties. To explore these crystalline phases for application and fundamental materials investigations, molecular beam epitaxy (MBE) is a well-suited thin film growth technique. In this study, we investigate the reaction kinetics of GeO2 during plasma-assisted MBE using elemental Ge and plasma-activated oxygen fluxes. The growth rate as a function of oxygen flux is measured in situ by laser reflectometry at different growth temperatures. A flux of the suboxide GeO desorbing off the growth surface is identified and quantified in situ by the line-of-sight quadrupole mass spectrometry. Our measurements reveal that the suboxide formation and desorption limits the growth rate under Ge-rich or high temperature growth conditions and leads to etching of the grown GeO2 layer under a Ge flux in the absence of oxygen. The quantitative results fit the sub-compound mediated reaction model, indicating the intermediate formation of the suboxide at the growth front. This model is further utilized to delineate the GeO2-growth window in terms of oxygen-flux and substrate temperature. Our study can serve as a guidance for the thin film synthesis of GeO2 and defect-free mesa etching in future GeO2-device processing. [ABSTRACT FROM AUTHOR]

Unintentionally doped (001)‐oriented orthorhombic κ‐Ga2O3 epitaxial films on c‐plane sapphire substrates are characterized by the presence of ≈ 10 nm wide columnar rotational domains that can severely inhibit in‐plane electronic conduction. Comparing the in‐ and out‐of‐plane resistance on well‐defined sample geometries, it is experimentally proved that the in‐plane resistivity is at least ten times higher than the out‐of‐plane one. The introduction of silane during metal‐organic vapor phase epitaxial growth not only allows for n‐type Si extrinsic doping, but also results in the increase of more than one order of magnitude in the domain size (up to ≈ 300 nm) and mobility (highest µ ≈ 10 cm2V−1s−1, with corresponding lowest ρ ≈ 0.2 Ωcm). To qualitatively compare the mean domain dimension in κ‐Ga2O3 epitaxial films, non‐destructive experimental procedures are provided based on X‐ray diffraction and Raman spectroscopy. The results of this study pave the way to significantly improved in‐plane conduction in κ‐Ga2O3 and its possible breakthrough in new generation electronics. The set of cross‐linked experimental techniques and corresponding interpretation here proposed can apply to a wide range of material systems that suffer/benefit from domain‐related functional properties. [ABSTRACT FROM AUTHOR]