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Metal multi-layer dielectric gratings (MMDG) for pulse compressors in high-energy laser systems should provide broad bandwidth as well as high laser-induced damage thresholds. The non-uniform optical near-field distribution of MMDG is an important factor that limits damage resistant capabilities. MMDG for pulse compressors operating at 800 nm with a corrugated SiO layer are designed by using a genetic algorithm and the Fourier mode method. The diffraction efficiency, bandwidth, and near-field distribution of the MMDG are theoretically investigated. For the single dielectric match layer grating, the bandwidth is 140 nm, if the thickness and refractive index of the match layer are changed, the maximum electric field in the grating ridge, match layer, and metal layer of the grating increases with the decrease in grating diffraction efficiency. For the multi-dielectric match layer grating, the bandwidth and the maximum electric field in the metal layer decrease with the increase in high- and low-index material pairs, and the maximum electric field in the grating ridge and match layer initially decreases and then increases. Over a wide wavelength range, the maximum electric field in the grating ridge, match layer, and metal layer is minimal near the central wavelength. Moreover, MMDG should be used at larger incident angles while keeping enough bandwidth to reduce the electric field in the grating. [ABSTRACT FROM AUTHOR]