1. Lithography-free polarization-dependent absorber based on α-MoO3.
- Author
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Hu, Yang, Wu, XiaoHu, Li, HongJu, Zhao, Yi, Liu, HaoTuo, and Huang, XiuQuan
- Abstract
As a natural biaxial hyperbolic material, α-phase molybdenum trioxide (α-MoO
3 ) exhibits dielectric and metallic properties in the plane, rendering it an exceptional candidate for polarization-dependent devices. In this work, we design a lithography-free polarization-dependent absorber consisting of an α-MoO3 film, a germanium layer, and a silver substrate. The results show that a narrowband absorption of up to 0.99 is achieved at a wavelength of 12.2 µm for transverse magnetic polarization. In contrast, the absorption is only 0.06 at this wavelength for transverse electric polarization. This remarkable polarization-dependent absorption performance is attributed to the coupling of epsilon-near-zero modes and Fabry-Perot resonances, which is confirmed by the electric field and power dissipation density distributions. Furthermore, strong polarization-dependent performance could also be achieved when the crystal axis of α-MoO3 is rotated in the out-of-plane. This work demonstrates that in-plane anisotropic α-MoO3 has the potential for designing high polarization-dependent devices. [ABSTRACT FROM AUTHOR]- Published
- 2024
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