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We design and numerically investigate a wide angle and broadband perfect absorber with compact multilayer structures. The proposed structure is composed of three stacks of semiconductor films and one metal layer. The absorber presents a broadband absorption between 450 nm and 700 nm with an average absorption above 99.2%. For oblique incidence, the absorber shows an average absorption about 90% for a wide range of incident angles from 0 to 60 with p polarization and s polarization. The electrical field intensity distributions are also studied to disclose the broadband absorption mechanism. This designed broadband absorber appears to have very promising applications in solar thermal energy harvesting, thermal emitters and detection. [ABSTRACT FROM AUTHOR]

Abstract: The laser-induced damage of Ta2O5 films annealed at a wide range of temperature (473–1273K) at the laser wavelengths of 1064 and 355nm was investigated. The relations between microstructure, optical properties, chemical composition, absorption and laser-induced damage threshold (LIDT) were studied. The dependence of a damage mechanism on laser wavelengths was discussed. It was found that the LIDT either at 1064 or 355nm first increased and then decreased with increase of annealing temperature. The LIDT at 1064nm was influenced by the substoichiometric defects, structural defects and thermal diffusion, whereas at 355nm it was affected mainly by the intrinsic absorption and structural defects. Both the maximum LIDT at the two wavelengths were obtained at the annealing temperature of 873K, which could be attributed to the lowest defect density in films. [Copyright &y& Elsevier]

Abstract: Ta2O5 films were deposited on BK7 substrates by e-beam evaporation with different deposition parameters such as substrate temperature (323–623K), oxygen pressure (0.5–3.0×10−2 Pa) and deposition rate (0.2–0.5nm/s). Absorption, scattering and chemical composition were investigated by surface thermal lensing (STL) technique, total integrated scattering (TIS) measurement and X-ray photoelectron spectroscopy (XPS), respectively. The laser-induced damage threshold (LIDT) was assessed using pulsed Nd:YAG 1064nm laser at a pulse length of 12ns. The results showed that optical properties, absorption and LIDT were influenced by the deposition parameters and annealing. However, scattering was little correlated with the deposition parameters. On the whole, the LIDT increased with increasing substrate temperature and oxygen pressure, whereas it increased firstly and then decreased upon increasing deposition rate. After annealing at 673K for 12h, the LIDT of films improved significantly. The dependence of possible damage mechanism on deposition parameters was discussed. [Copyright &y& Elsevier]

Abstract: Zirconium dioxide (ZrO2) thin films were deposited on BK7 glass substrates by the electron beam evaporation method. A continuous wave CO2 laser was used to anneal the ZrO2 thin films to investigate whether beneficial changes could be produced. After annealing at different laser scanning speeds by CO2 laser, weak absorption of the coatings was measured by the surface thermal lensing (STL) technique, and then laser-induced damage threshold (LIDT) was also determined. It was found that the weak absorption decreased first, while the laser scanning speed is below some value, then increased. The LIDT of the ZrO2 coatings decreased greatly when the laser scanning speeds were below some value. A Nomarski microscope was employed to map the damage morphology, and it was found that the damage behavior was defect-initiated both for annealed and as-deposited samples. The influences of post-deposition CO2 laser annealing on the structural and mechanical properties of the films have also been investigated by X-ray diffraction and ZYGO interferometer. It was found that the microstructure of the ZrO2 films did not change. The residual stress in ZrO2 films showed a tendency from tensile to compressive after CO2 laser annealing, and the variation quantity of the residual stress increased with decreasing laser scanning speed. The residual stress may be mitigated to some extent at proper treatment parameters. [Copyright &y& Elsevier]

Abstract: Antireflection coatings at the center wavelength of 1053nm were prepared on BK7 glasses by electron-beam evaporation deposition (EBD) and ion beam assisted deposition (IBAD). Parts of the two kinds of samples were post-treated with oxygen plasma at the environment temperature after deposition. Absorption at 1064nm was characterized based on surface thermal lensing (STL) technique. The laser-induced damage threshold (LIDT) was measured by a 1064-nm Nd:YAG laser with a pulse width of 38ps. Leica-DMRXE Microscope was applied to gain damage morphologies of samples. The results revealed that oxygen post-treatment could lower the absorption and increase the damage thresholds for both kinds of as-grown samples. However, the improving effects are not the same. [Copyright &y& Elsevier]

Abstract: A series of Ta2O5 films with different SiO2 additional layers including overcoat, undercoat and interlayer was prepared by electron beam evaporation under the same deposition process. Absorption of samples was measured using the surface thermal lensing (STL) technique. The electric field distributions of the samples were theoretical predicted using thin film design software (TFCalc). The laser induced damage threshold (LIDT) was assessed using an Nd:YAG laser operating at 1064nm with a pulse length of 12ns. It was found that SiO2 additional layers resulted in a slight increase of the absorption, whereas they exerted little influence on the microdefects. The electric field distribution among the samples was unchanged by adding an SiO2 overcoat and undercoat, yet was changed by adding an interlayer. SiO2 undercoat. The interlayer improved the LIDT greatly, whereas the SiO2 overcoat had little effect on the LIDT. [Copyright &y& Elsevier]