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• HfO 2 –SiO 2 mixture coatings with different proportions were investigated. • Admixing 10% or higher SiO 2 in the mixture coatings suppresses inhomogeneity of HfO 2. • Short-wave pass dichroic laser mirror coatings were prepared using mixture layers. • Using HfO 2 –SiO 2 mixture layers fundamentally solves the half-wave hole effect. • Using different mixture layers gets further optical improvement in the pass band. Hafnia/silica (HfO 2 /SiO 2) short-wavelength pass dichroic laser mirror (DLM) coatings are widely utilized in high-power laser systems. However, the half-wave hole effect resulting from the refractive index inhomogeneity of HfO 2 severely restricts the spectra and potential applications of these coatings. To address this issue, an investigation was conducted on HfO 2 –SiO 2 mixture coatings with different proportions, which were produced by electron beam co-evaporation. Compared to the inhomogeneous growth characteristics observed in pure HfO 2 coatings, the introduction of 10 % or higher SiO 2 admixing in HfO 2 –SiO 2 mixture coatings results in an amorphous structure characterized by excellent refractive index homogeneity and improved surface smoothness. Leveraging this, different DLM coatings with the objective of achieving high transmittance across the 400 to 900 nm range were designed and prepared, while ensuring high reflectance at 1064 nm. The incorporation of HfO 2 –SiO 2 mixture layers instead of pure HfO 2 layers in the mirror coatings led to a fundamental inhibition of the half-wave hole effect throughout the entire broad transmission band, resulting in a substantial improvement in the optical performance of the coatings. Moreover, by incorporating several types of HfO 2 –SiO 2 mixture layers with different proportions in the coating stacks, the transmittance of DLM coatings in the pass band can be further increased, and the transmission fluctuations at different wavelengths can be further compressed. Additionally, compared to traditional DLM coatings with HfO 2 layers, DLM coatings incorporating HfO 2 –SiO 2 mixture layers exhibit lower roughness, higher laser-induced damage threshold (LIDT) at 532 nm, and similar LIDT at 1064 nm. These results indicate a promising strategy for fabricating DLM coatings tailored for high-power laser systems. [ABSTRACT FROM AUTHOR]

Abstract: Y2O3/SiO2 coatings were deposited on fused silica by electron beam evaporation. A continuous wave CO2 laser was used to condition parts of the prepared samples at different scanning speeds in the air. LAMBDA 900 spectrometer was used to investigate the changes of the transmittance and residual reflection spectrum. A Nomarski microscope under dark field was used to examine the changes of the micro defect density. The changes of the surface roughness and the microstructure of the film before and after conditioning were investigated by AFM and X-ray diffraction, respectively. We found that laser-induced damage threshold (LIDT) of the films conditioning at 30mm/s scanning speed was increased by more than a factor of 3 over the thresholds of the as-deposited films. The conditioning effect was correlated with an irradiation-induced decrease of the defect density and absorption of the films. [Copyright &y& Elsevier]

Abstract: A model for refractive index of stratified dielectric substrate was put forward according to theories of inhomogeneous coatings. The substrate was divided into surface layer, subsurface layer and bulk layer along the normal direction of its surface. Both the surface layer (separated into N 1 sublayers of uniform thickness) and subsurface layer (separated into N 2 sublayers of uniform thickness), whose refractive indices have different statistical distributions, are equivalent to inhomogeneous coatings, respectively. And theoretical deduction was carried out by employing characteristic matrix method of optical coatings. An example of mathematical calculation for optical properties of dielectric coatings had been presented. The computing results indicate that substrate subsurface defects can bring about additional bulk scattering and change propagation characteristic in thin film and substrate. Therefore, reflectance, reflective phase shift and phase difference of an assembly of coatings and substrate deviate from ideal conditions. The model will provide some beneficial theory directions for improving optical properties of dielectric coatings via substrate surface modification. [Copyright &y& Elsevier]