1. Cryogenic rf test of the first plasma etched SRF cavity
- Author
-
Upadhyay, J., Palczewski, A., Popović, S., Valente-Feliciano, A. -M., Im, D., Phillips, L., and Vušković, L.
- Subjects
Physics - Accelerator Physics ,Physics - Atomic Physics ,Physics - Plasma Physics - Abstract
Plasma etching has a potential to be an alternative processing technology for superconducting radio frequency (SRF) cavities. An apparatus and a method are developed for plasma etching of the inner surfaces of SRF cavities. To test the effect of the plasma etching on the cavity rf performance, a 1497 MHz single cell SRF cavity is used. The single cell cavity is mechanically polished, buffer chemically etched afterwards and rf tested at cryogenic temperatures for a baseline test. This cavity is then plasma processed. The processing was accomplished by moving axially the inner electrode and the gas flow inlet in a step-wise manner to establish segmented plasma processing. The cavity is rf tested afterwards at cryogenic temperatures. The rf test and surface condition results are presented., Comment: 6 pages, 4 figures
- Published
- 2016