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The objective of this study was to examine the present situation of dyadic coping in pregnant women with high-risk pregnancy and their spouses, as well as the relevant factors and the interactions between partners. From October 2022 to September 2023, a cross-sectional survey was undertaken, involving 460 pairs of pregnant women with high-risk pregnancy who were hospitalized for childbirth and their accompanying spouses. These participants completed self-assessments on dyadic coping, marital satisfaction, perceived stress, and self-efficacy through the completion of paper questionnaires. The collected data was then subjected to analysis utilizing correlation analysis and multiple linear regression. The actor-partner interdependence model (APIM) was then developed using the structural equation modeling(SEM) to test the binary association. Pregnant women preferred to utilize stressful communication, whereas their spouses employed supportive and delegated coping. Both external (such as education level, employment status, and medical insurance) and internal (such as marital satisfaction, perceived stress, and self-efficacy) factors were associated with pregnant women's dyadic coping. Education level and internal factors were also associated with the spouses' dyadic coping. In contrast to spouses, who can only have a partner effect on pregnant women through marriage satisfaction, all pregnant women's internal elements played the partner effect on the spouses' dyadic coping. The study's findings help identify populations with inadequate coping ability. Promoting marital satisfaction, self-efficacy, and reducing perceived stress are associated with enhancing the dyadic coping ability of pregnant women with high-risk pregnancy and their spouses. It also suggests that antenatal care should intervene with pregnant women with high-risk pregnancy and their spouses as a whole, and emphasize collaborative coping and effective mutual support between couples rather than spousal support alone. [ABSTRACT FROM AUTHOR]

"Sputtering damage" arising from high-energy negative ions plays a pivotal role in shaping the characteristics of indium tin oxide (ITO) thin films deposited through direct-current magnetron sputtering (DCMS). To mitigate this issue, we employ DCMS with an external anode. The increment in anode bias V A from 0 to +60V effectively diminishes the average kinetic energy of negative ions such as O−, O2− and InO− by reducing the cathode voltage. Additionally, the flux of positive ions (e.g., Ar+, In+, Sn+, O+) increases and their ion energy distribution functions (IEDFs) exhibit supplementary peaks at plasma potentials. Both facilitate film crystallization, as evidenced by the structural transition from subgrain to grain formations. Heightened surface roughness markedly enhances optical transmittance. Due to a reduced oxygen sticking coefficient, films grown with higher V A values exhibit increased oxygen vacancies, which serve as the primary charge carriers for ITO films. Consequently, ITO films attain their lowest resistivity (7.81 × 10 − 4 Ω c m) and highest optical transmittance (78.71 %) at V A = +60V. This investigation underscores the significant influence of the external anode bias on both ion behavior and film growth, providing a viable approach to enhance the electrical and optical properties of ITO films. • Elevating the external anode bias mitigates high-energy negative ions while promoting the generation of positive ions. • Increased external anode bias enhances crystallinity, alters orientation, and boosts oxygen vacancies in ITO films. • Higher external anode bias yielded ITO films with reduced resistivity and improved visible light transmittance. • External anode can mitigate ion-induced "sputtering damage" without reducing deposition rate. [ABSTRACT FROM AUTHOR]