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The rapid growth in artificial intelligence and modern communication systems demands innovative solutions for increased computational power and advanced signaling capabilities. Integrated photonics, leveraging the analog nature of electromagnetic waves at the chip scale, offers a promising complement to approaches based on digital electronics. To fully unlock their potential as analog processors, establishing a common technological base between conventional digital electronic systems and analog photonics is imperative to building next-generation computing and communications hardware. However, the absence of an efficient interface has critically challenged comprehensive demonstrations of analog advantage thus far, with the scalability, speed, and energy consumption as primary bottlenecks. Here, we address this challenge and demonstrate a general electro-optic digital-to-analog link (EO-DiAL) enabled by foundry-based lithium niobate nanophotonics. Using purely digital inputs, we achieve on-demand generation of (i) optical and (ii) electronic waveforms at information rates up to 186 Gbit/s. The former addresses the digital-to-analog electro-optic conversion challenge in photonic computing, showcasing high-fidelity MNIST encoding while consuming 0.058 pJ/bit. The latter enables a pulse-shaping-free microwave arbitrary waveform generation method with ultrabroadband tunable delay and gain. Our results pave the way for efficient and compact digital-to-analog conversion paradigms enabled by integrated photonics and underscore the transformative impact analog photonic hardware may have on various applications, such as computing, optical interconnects, and high-speed ranging.

Here we show a photonic computing accelerator utilizing a system-level thin-film lithium niobate circuit which overcomes this limitation. Leveraging the strong electro-optic (Pockels) effect and the scalability of this platform, we demonstrate photonic computation at speeds up to 1.36 TOPS while consuming 0.057 pJ/OP. Our system features more than 100 thin-film lithium niobate high-performance components working synergistically, surpassing state-of-the-art systems on this platform. We further demonstrate binary-classification, handwritten-digit classification, and image classification with remarkable accuracy, showcasing our system's capability of executing real algorithms. Finally, we investigate the opportunities offered by combining our system with a hybrid-integrated distributed feedback laser source and a heterogeneous-integrated modified uni-traveling carrier photodiode. Our results illustrate the promise of thin-film lithium niobate as a computational platform, addressing current bottlenecks in both electronic and photonic computation. Its unique properties of high-performance electro-optic weight encoding and conversion, wafer-scale scalability, and compatibility with integrated lasers and detectors, position thin-film lithium niobate photonics as a valuable complement to silicon photonics, with extensions to applications in ultrafast and power-efficient signal processing and ranging.

We demonstrate electro-optic modulators realized in low-loss thin-film lithium tantalate with superior DC-stability (<1 dB power fluctuation from quadrature with 12.1 dBm input) compared to equivalent thin-film lithium niobate modulators (5 dB fluctuation) over 46 hours.

Recent advancements in thin-film lithium niobate (TFLN) photonics have led to a new generation of high-performance electro-optic devices, including modulators, frequency combs, and microwave-to-optical transducers. However, the broader adoption of TFLN-based devices that rely on all-optical nonlinearities have been limited by the sensitivity of quasi-phase matching (QPM), realized via ferroelectric poling, to fabrication tolerances. Here, we propose a scalable fabrication process aimed at improving the wavelength-accuracy of optical frequency mixers in TFLN. In contrast to the conventional pole-before-etch approach, we first define the waveguide in TFLN and then perform ferroelectric poling. This sequence allows for precise metrology before and after waveguide definition to fully capture the geometry imperfections. Systematic errors can also be calibrated by measuring a subset of devices to fine-tune the QPM design for remaining devices on the wafer. Using this method, we fabricated a large number of second harmonic generation devices aimed at generating 737 nm light, with 73% operating within 5 nm of the target wavelength. Furthermore, we also demonstrate thermo-optic tuning and trimming of the devices via cladding deposition, with the former bringing ~96% of tested devices to the target wavelength. Our technique enables the rapid growth of integrated quantum frequency converters, photon pair sources, and optical parametric amplifiers, thus facilitating the integration of TFLN-based nonlinear frequency mixers into more complex and functional photonic systems.

The recent emergence of thin-film lithium niobate (TFLN) has extended the landscape of integrated photonics. This has been enabled by the commercialization of TFLN wafers and advanced nanofabrication of TFLN such as high-quality dry etching. However, fabrication imperfections still limit the propagation loss to a few dB/m, restricting the impact of this platform. Here, we demonstrate TFLN microresonators with a record-high intrinsic quality (Q) factor of twenty-nine million, corresponding to an ultra-low propagation loss of 1.3 dB/m. We present spectral analysis and the statistical distribution of Q factors across different resonator geometries. Our work pushes the fabrication limits of TFLN photonics to achieve a Q factor within one order of magnitude of the material limit.