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In the current solution for multiwavelength achromatic flat lenses, a one-to-one correspondence exists between the number of writing phase distributions and the number of achromatic wavelengths. Breaking this correspondence requires a complex phase design and parameter optimization. Here, we show that a dual-layer cascade liquid crystal Pancharatnam-Berry lens (CLCPBL) with two writing phase distributions and a specific coupled phase distribution between the layers can achieve three wavelength achromaticity without any parameter optimization process. Similarly, in a three-layer cascade, the number of achromatic wavelengths increases to seven through the permutations of the layers, with adjustable amplitude factors. We fabricate a three-layer CLCPBL with the design wavelengths of 396.8 nm, 1064 nm, and 1550 nm, which theoretically allows the light at 632.8, 532.8, 3383 and 450 nm to form a common focus, and test such structure. Our CLCPBL enables a wider range of applications than conventional achromatic flat lenses. Metalenses are lightweight and compact alternative to achromatic lens assemblies, but they usually fulfill the focusing requirements for a single wavelength. The authors design and fabricate a cascade liquid crystal Pancharatnam-Berry lens that enables a seven-wavelength achromatic focusing in a broad range of frequencies. [ABSTRACT FROM AUTHOR]

Mid‐infrared (MIR) pulsed lasers operating at 2–5 µm have important applications in communication, sensing, and medicine. However, the lack of robust MIR saturable absorbers (SAs) remains a major obstacle. Here, a semiconductor material cadmium oxide (CdO) film with high laser‐induced damage threshold (800 nm, 134 mJ cm−2) and broadband saturable absorption (2.0–3.9 µm) is investigated. The effective tuning of the nonlinear optical response of CdO is demonstrated by adjusting the carrier concentration via a tungsten (W)‐doping scheme. The saturable absorption is improved and carrier relaxation process is accelerated after increasing the W‐dopant level. Based on these findings, the robust CdO‐SAs with customizable parameters are realized and Q‐switched lasers with decreasing pulse width from 372 to 254.3 ns are obtained at 2 µm. The design flexibility provided by CdO opens up a large parameter space that enables the continuous improvement of compact and high‐performance MIR ultrafast lasers. [ABSTRACT FROM AUTHOR]

• The performance degradation and compensation method of the beam-steering device based on liquid crystal polarization grating (LCPG) and liquid crystal adjustable half-wave plate (LCAHWP) is studied. • This beam-steering device can still work at a laser power density of 16 W/cm2 irradiation. • The laser tolerance of the device is higher than that of liquid crystal optical phased array (LCOPA) and liquid crystal micro-lens array (LCMLA). The effects of laser irradiation thermal deposition on the performance degradation of liquid crystal (LC) devices in high-power laser systems are extremely vital. In this study, the first-order beam-steering system (FBS) was developed using a passive liquid crystal polarization grating (LCPG) and liquid crystal adjustable wave-plate (LCAW). The LCPG was prepared by holographic exposure technology, and the LCAW was prepared using the standard LC cell preparation process. We investigated the influences of diffraction efficiency of FBS under a 1070-nm continuous-wave (CW) laser irradiation. The energy is concentrated in the −1st order at first. When the half-wave retardation was reached, all the energy is concentrated in the +1st order (∼97 %), and the beam is deflected. Once the phase retardation decreases below the half-wave retardation, the energy gradually reconcentrates in the −1st order. When the LCAW fails, the diffraction the energy is refocused to the −1st order by the LCPG. The results indicated that both thermal deposition and driving voltage reduce the phase retardation of the LCAW, generating a variation of energy between in ± 1 st orders. By reducing the driving voltage, this half-wave retardation can be recovered under a certain half-wave voltage and laser power density, and the diffraction efficiency of the +1st order can be compensated to ∼97 %. If the reduced phase retardation is not less than half-wave, the FBS can still be modulated in high-power continuous lasers. Our research provides a reference for the development of beam-steering technology based on LC materials in high-power laser systems. [ABSTRACT FROM AUTHOR]

Indium tin oxide (ITO) has important application in photoelectronic and photonic devices, demanding effective approach and appropriate parameters to modulate the ITO properties. The effects of laser annealing at 1064 nm with different pulse width (875 ps, 10 ns, and 300 ns) on optical and nonlinear optical properties of ITO films were investigated. Compared with 875 ps and 10 ns, laser annealing at 300 ns significantly improved the near-infrared transmittance of ITO films. The change arises from the elimination of oxygen vacancies and reduction of tin oxides, resulting in the decrease of carrier concentration. Finite element simulations indicate that laser annealing with pulse width of 875 ps and 10 ns have high instantaneous peak temperatures of 1128.5 K and 783 K, respectively, while the temperature accumulation between pulses is negligible. On the contrary, the laser annealing with a pulse width of 300 nshas lower peak transient temperature of 343 K but high static residence temperature of 973 K. The results reveal that the modification of ITO films depends more on the static average temperature rather than the instantaneous peak temperature. The modulation of carrier dynamics in both amplitude and temporal domain was demonstrated after 300 ns laser annealing, achieving ultrafast transient response approximately 150 fs. This work provides theoretical and experimental basis for us to select suitable laser conditions for directional annealing of ITO film to make it suitable for the applications of broad optical spectrum photovoltaic devices or ultrafast optical exchange for high-speed data processing. • Laser annealing (LA) is shown for three pulse widths at approximately 0.2 J/cm2. • LA at 300 ns significantly improves the near-infrared transparency due to the reduction of carrier absorption. • Tailorable amplitude and time scale of carrier transient response are achieved by LA, with ultrafast response time 150 fs. • The modification of ITO properties depends on the static temperature rather than transient peak temperature. [ABSTRACT FROM AUTHOR]

• Four hybrid materials (HfO 2 /Al 2 O 3 nanolaminate, HfO 2 /SiO 2 nanolaminate, HfO 2 -Al 2 O 3 mixture, and HfO 2 -SiO 2 mixture coatings) are investigated. • Hybrid materials show suppressed crystallization and reduced surface roughness, enabling tunable bandgaps and optical constants. • Hybrid-material-based mirror coatings are investigated and mixture-based mirror coatings have the highest LIDT. • The damage initiation mechanism of the mirror coating varies around 3 ps for laser pulses ranging from 0.5 to 8 ps.. Four hybrid materials (HfO 2 /Al 2 O 3 nanolaminate, HfO 2 /SiO 2 nanolaminate, HfO 2 –Al 2 O 3 mixture, and HfO 2 –SiO 2 mixture) and four hybrid-material-based mirror coatings are prepared via electron-beam evaporation. The refractive index (n), optical bandgaps, and microstructural properties of the hybrid materials are investigated and compared with those of pure materials. Experimental results show that the hybrid materials suppress crystallization, reduce surface roughness, and provide tunable bandgaps and optical constants. Among the four hybrid materials with similar n values, the HfO 2 –Al 2 O 3 mixture shows the largest bandgap. All the hybrid-material-based mirror coatings exhibit a higher laser-induced damage threshold (LIDT) at 8 picosecond (ps) than the conventional pure-material-based mirror coating. The HfO 2 –Al 2 O 3 mixture-based mirror coating with a relative high LIDT is used for further study of the pulse width dependence of the LIDT, and shows superior LIDT over the conventional mirror coating at 0.5 ps, 1 ps and 3 ps. Typical damage morphological features induced at different pulse widths show that the damage-initiation mechanism of the mirror coating changes around 3 ps. [ABSTRACT FROM AUTHOR]

The ever-increasing demand for broadband antireflection (AR) coatings has led to a growing interest in nanolaminates (NLs) with tunable properties. However, achieving excellent optical performance in NLs can be challenging due to multiple interfaces and a rather thin sublayer. In this study, we systematically investigated the factor that deteriorates the optical performance, focusing on the sublayer thickness deviation, sublayer n deviation, and interfacial diffusion, to correct the n -profiles of NLs. A pre-correction strategy for the AR coating design is proposed and experimentally demonstrated via plasma-enhanced atomic layer deposition. The excellent fit of the spectrum demonstrates that the proposed design strategy can benefit structure-sensitive NL-based coatings. [Display omitted] • The factor that deteriorates the optical performance of nanolaminate-based broadband AR coatings has been systematically investigated. • Depending on the relative magnitudes of the interfacial diffusion and sublayer thicknesses, plasma-enhanced atomic-layer-deposited HfO 2 –SiO 2 nanolaminates were categorized into three typical types. • A pre-correction strategy considering the sublayer thickness deviation, sublayer refractive index (n) deviation, and interfacial diffusion, to correct the n -profiles of nanolaminates was proposed and experimentally demonstrated via plasma-enhanced atomic layer deposition. • The broadband AR coating with pre-correction exhibits excellent agreement between the designed and measured spectra, with a root-mean-square error of <0.100, well below that without any pre-correction. • The significant improvement in the fitness of the spectra and coating-layer thickness between the design and experimentally measurement demonstrates that the proposed pre-correction design strategy can benefit other nanolaminate-based coatings whose spectral performance is sensitive to the coating structure. [ABSTRACT FROM AUTHOR]

• HfO 2 –SiO 2 mixture coatings with different proportions were investigated. • Admixing 10% or higher SiO 2 in the mixture coatings suppresses inhomogeneity of HfO 2. • Short-wave pass dichroic laser mirror coatings were prepared using mixture layers. • Using HfO 2 –SiO 2 mixture layers fundamentally solves the half-wave hole effect. • Using different mixture layers gets further optical improvement in the pass band. Hafnia/silica (HfO 2 /SiO 2) short-wavelength pass dichroic laser mirror (DLM) coatings are widely utilized in high-power laser systems. However, the half-wave hole effect resulting from the refractive index inhomogeneity of HfO 2 severely restricts the spectra and potential applications of these coatings. To address this issue, an investigation was conducted on HfO 2 –SiO 2 mixture coatings with different proportions, which were produced by electron beam co-evaporation. Compared to the inhomogeneous growth characteristics observed in pure HfO 2 coatings, the introduction of 10 % or higher SiO 2 admixing in HfO 2 –SiO 2 mixture coatings results in an amorphous structure characterized by excellent refractive index homogeneity and improved surface smoothness. Leveraging this, different DLM coatings with the objective of achieving high transmittance across the 400 to 900 nm range were designed and prepared, while ensuring high reflectance at 1064 nm. The incorporation of HfO 2 –SiO 2 mixture layers instead of pure HfO 2 layers in the mirror coatings led to a fundamental inhibition of the half-wave hole effect throughout the entire broad transmission band, resulting in a substantial improvement in the optical performance of the coatings. Moreover, by incorporating several types of HfO 2 –SiO 2 mixture layers with different proportions in the coating stacks, the transmittance of DLM coatings in the pass band can be further increased, and the transmission fluctuations at different wavelengths can be further compressed. Additionally, compared to traditional DLM coatings with HfO 2 layers, DLM coatings incorporating HfO 2 –SiO 2 mixture layers exhibit lower roughness, higher laser-induced damage threshold (LIDT) at 532 nm, and similar LIDT at 1064 nm. These results indicate a promising strategy for fabricating DLM coatings tailored for high-power laser systems. [ABSTRACT FROM AUTHOR]

Different laser damage testing protocols, including 1-on-1, S-on-1, and Raster Scan, were conducted on 532 nm polarizers to evaluate the damage resistance and mechanisms. A comparison of the laser-induced damage thresholds (LIDTs) revealed different damage characteristics and major contributions to film failure for different polarizations. For P polarization, the LIDTs for the three test protocols were nearly the same because of the stabilization of two typical damage morphologies of flat-bottomed pits and mussel damage pits. For S polarization, the LIDTs for multiple pulses were lowest, where absorptive defect-induced damage was revealed. The damage characteristics of 532 nm polarizers and 1064 nm polarizers have been also compared. The mussel damage pits, which are similar to the typical damage morphologies of ultraviolet (UV) laser damage to fused silica, were observed for the first time in coatings of 532 nm polarizers. This suggests that, the polishing-induced subsurface damage of fused silica substrates may tend to be excited by a short-wavelength laser rather than the fundamental wavelength. • The damage resistance and damage characteristics of 532 nm polarizers in different laser damage test protocols, including 1-on-1, S-on-1, and Raster Scan, have been summarized, as a reference for thin-film optics in high-power laser applications. • The damage characteristics of 532 nm polarizers and 1064 nm polarizers were compared. The subsurface damage of fused silica substrates is easily excited by short-wavelength lasers. • Mussel pits, associated with the ultraviolet laser damage of fused silica, were observed in the coatings for the first time. [ABSTRACT FROM AUTHOR]

Liquid crystal polarization gratings (LCPGs) possess unique optical properties and therefore are widely used in laser systems. Therefore, developing our understanding of the laser damage resistance of LCPGs is critical for future high-intensity laser applications. In this study, the LCPGs (Λ = 8 μm) were fabricated from liquid crystal polymer (LCP) films with photo-alignment technology, which had a small-angle (∼7.51°) diffraction order with high diffraction efficiency (∼92 %) under chiral polarized incidence at 1064 nm. The diffraction efficiency and polarization of each diffraction order were determined by the polarization of the incident light. The damage characteristics of the LCPGs were investigated using a chiral polarized nanosecond laser at 1064 nm in a one-on-one test. The laser-induced damage thresholds (LIDTs) of left-handed circular polarization (LHCP) and right-handed circular polarization (RHCP) were 8.0 J/cm2 and 8.5 J/cm2, respectively. For comparison, the LIDTs of S-polarization and P-polarization were 7.8 J/cm2 and 8.4 J/cm2, respectively. All the damage occurred at the interface between the LCP layer and the substrate when the laser fluence was near the LIDT, and the damage morphology was observed with a scanning electron microscope (SEM), including flat pits, cracks, and bumps at the edge of the pits. The results indicate that the LIDTs and damage morphology of the LCPGs were insensitive to the polarization of the irradiation. The electrical effects of differently polarized irradiation on the LCPGs were simulated using the finite element method (FEM). The electric field distribution was symmetrical under irradiation by LHCP and RHCP lasers. However, the distribution of the electric field under different linearly polarized irradiation conditions were distinct. Based on these findings, we believe that the contribution of chiral polarized irradiation to the damage was consistent and that the LIDTs were similar. This study has important implications for the application and development of LCPGs in high-intensity laser systems. • The laser-induced damage of liquid crystal polarization gratings (LCPGs) is first proposed. • We investigated the laser-induced damage of the LCPGs using a nanosecond pulsed laser with chiral polarized irradiation. • This study provides reference for the application and development of LCPGs in high-intensity laser systems. [ABSTRACT FROM AUTHOR]