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The use of high-κ dielectrics is an inevitable requirement to continue the historical performance scaling trend. Recently, the electrical transport characteristics of graphene FET on an aluminum nitride (AlN) substrate in spite of other common dielectric materials indicate significant improvement of carrier mobility. This paper proposes a novel double-gate graphene nanoribbon field-effect transistor (GNRFET) on AlN dielectric substrates. More studies exploring device characteristics are included to assess the performance over the conventional SiO 2 -based one. It is found that the high-κ GNRFET affords larger on current, on–off ratio, transconductance and intrinsic gain. The high-κ structure also provides further immunity against short-channel effects including drain-induced barrier-lowering and subthreshold swing. [ABSTRACT FROM AUTHOR]

In this paper a double gate graphene nanoribbon field effect transistor with electrically-activated source extension is proposed. Source region of the proposed structure includes two sections, an electrically-activated extension and a doped section. The electrically extension, which is located between doped source section and gate region, is biased independent of the gate to form a virtual extension for source. The electrically-activated extension creates a step in potential profile which increases the horizontal distance between conduction and valance bands at channel to source junction. This step reduces the probability of band to band tunneling, lowers the leakage current and improves drain induced barrier lowering. The devices have been simulated based on self consistent solution of Poisson and Schrodinger equations within non-equilibrium Green's function formalism. In addition, the effects of the edge and third nearest neighbor are included for more accurate outcomes. Simulations show that the proposed structure is a more reliable device because of its higher ON/Off current ratio, shorter delay time, and smaller power delay product beside lower subthreshold swing than conventional graphene nanoribbon field effect transistor. [ABSTRACT FROM AUTHOR]

Abstract: At nanometer regime, fabricating the structures with non-overlapped channel and abrupt doping profile is very complicated and sometimes impossible. So, the resultant device experiences some non-ideal effects which have to be predicted and well addressed by simulation before fabrication. In this paper the effects of overlap between gate and source/drain regions on the performance of carbon nanotube field effect transistors have been investigated. The overlapped structure has been simulated with various doping profiles at drain/source and gate region junction tip. The device performance has been investigated in terms of ON current, Off current, ON/Off current ratio, subthreshold swing, delay, and power delay product (PDP). Simulations show that depending on the variations in the effective channel length, the overlap deteriorates some device characteristics and enhances the others. Where the effective channel length decreases (increases), the overlap deteriorates (enhances) the current ratio and subthreshold swing but enhances (deteriorates) the delay and PDP compared to non-overlapped structure. Furthermore, the overlapped structure with graded profile results in lower current ratio and higher subthreshold swing compared to overlapped structure with abrupt profile. At a fixed current ratio, the delay and PDP of overlapped structure with graded profile are more than overlapped structure with abrupt profile but at a fixed channel length, both profiles have approximately equal delay and PDP. [Copyright &y& Elsevier]

Abstract: A novel carbon nanotube field effect transistor with symmetric graded double halo channel (GDH–CNTFET) is presented for suppressing band to band tunneling and improving the device performance. GDH structure includes two symmetric graded haloes which are broadened throughout the channel. The doping concentration of GDH channel is at maximum level at drain/source side and is reduced gradually toward zero at the middle of channel. The doping distribution at source side of channel reduces the drain induced barrier lowering (DIBL) and the drain side suppresses the band to band tunneling effect. In addition, broadening the doping throughout the channel increases the recombination of electrons and holes and acts as an additional factor for improving the band to band tunneling. Simulation results show that applying this structure on CNTFET enhances the device performance. In comparison with double halo structure with equal saturation current, the proposed GDH structure shows better characteristics and short channel parameters. Furthermore, the delay and power delay product (PDP) analysis versus on/off current ratio shows the efficiency of the proposed GDH structure. [Copyright &y& Elsevier]

Abstract: In this paper, a novel carbon nanotube field effect transistor with linear doping profile channel (LDC–CNTFET) is presented. The channel impurity concentration of the proposed structure is at maximum level at source side and linearly decreases toward zero at drain side. The simulation results show that the leakage current, on-off current ratio, subthreshold swing, drain induced barrier lowering, and voltage gain of the proposed structure improve in comparison with conventional CNTFET. Also, due to spreading the impurity throughout the channel region, the proposed structure has superior performance compared with a single halo CNTFET structure with equal saturation current. Design considerations show that the proposed structure enhances the device performance all over a wide range of channel lengths. [Copyright &y& Elsevier]