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We present a study of silicon (Si) and erbium (Er) coimplanted silica (SiO2) in which we observe, by combining high resolution scanning transmission electron microscopy and selective electron energy loss spectroscopy (EELS), a high spatial correlation between silicon nanocrystals (Si-NCs), Er, and oxygen (O) after a single high temperature (1100 °C) anneal. The observation of a spatial overlap of the EELS chemical maps of dark field (DF) images at the Er N4,5, Si L2,3, and O K edges is concomitant with an intense room temperature infrared luminescence around 1534 nm. We suggest that these observations correspond to Er–O complexes within an amorphous silicon (a-Si) shell at the Si-NC/SiO2 interface. The presence of a crystalline phase at the Si-NC center, verified by high resolution electron micrographs and DF diffraction contrast images and the low solubility of Er in crystalline Si (c-Si) would tend to suggest a preferential Er agglomeration toward the Si-NC/SiO2 interface during formation, particularly when high concentrations of both Si and Er are obtained in a narrow region of the SiO2 after coimplantation. The absence of narrow Stark related features in the Er emission spectrum at low temperature and an inhomogeneous broadening with increasing temperature, which are characteristic of Er confined by an amorphous, rather than a crystalline host further support these hypotheses. After comparing the luminescence to that from a SiO2:Er control sample prepared in exactly the same manner but without Si-NCs, we find that, despite the observed spatial correlation, only a small fraction ( ∼ 7%) of the Er are sensitized by the Si-NCs. We ascribe this low fraction to a combination of low sensitizer (Si-NC) density and Auger-type losses arising principally from Er ion-ion interactions.

An optical and structural study of InGaN/GaN quantum dots (QDs) is reported. With increasing InGaN deposition time, the dominant emission changes from wetting layer (WL) to QDs, and a strong redshift of the emission occurs. Emission from localized WL states is observed, with a density and nature very different to that due to the QDs. Structural measurements reveal a disordered WL, consistent with the form of the WL photoluminescence excitation spectra.

Beryllium and silicon δ-doped GaAs∕AlAs multiple quantum wells (MQWs) were designed and fabricated for selective sensing of terahertz radiation. Optical characterization of the structures by photoreflectance spectroscopy has indicated a presence of built-in electric fields–from 18 up to 49kV∕cm depending on the structure design–located mainly in the cap and buffer layers, but do not penetrating into the MQWs region. Terahertz sensing under normal incidence via impurity bound-to-unbound transitions is demonstrated in photocurrent experiments within 0.6–4.2THz in silicon-doped MQWs and 3.5–7.3THz range in beryllium-doped MQWs at low temperatures.

We report a photoluminescence (PL) study of the effects of carrier depletion on the electronic states of InGaN quantum dots. Samples were fabricated into mesa devices with top Schottky contacts and back ohmic contacts. Submicrometer apertures were created lithographically. Capacitance-voltage measurements of the devices suggest that the dots are fully depleted when they are unbiased. Micro-PL studies of individual dots show narrow linewidths under zero or reverse bias conditions. Forward biasing of the junction results in broadening of the dot levels due to the populating of nearby conduction band states in the underlying quantum well.