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The temperature-dependent Hall resistivity and carrier concentrations of Ga1−xMnxAs epilayers grown on (100) semi-insulating GaAs substrates by molecular beam epitaxy have been investigated in the temperature range of 10–300 K. A Ga1−xMnxAs sample with x≈4.4% shows typical insulator behavior and Ga1−xMnxAs samples with x≈2.2 and 3.7 % show typical metallic behavior. A model taking into account ionized impurity and spin disorder scattering mechanisms was used to portray properly the observed features of the temperature-dependent Hall resistivity data. The value of the p-d exchange energy was J=59.4±0.5 and 71.9±0.5 eV A3 for the samples with x≈2.2 and 3.7 %, respectively. Ionized impurity scattering dominates the entire temperature range, with a temperature-independent spin disorder scattering in the paramagnetic region. It was found that the spin disorder scattering mechanism had a strong temperature dependence on 1−T2 in the ferromagnetic region.

We have characterized Zn1−xCoxO (x=0.25) films grown on sapphire (0001) substrates by pulsed laser deposition using various growth conditions to investigate the growth condition dependence of properties of Co-doped ZnO films. The substrate temperature (TS) was varied from 300 to 700 °C and the O2 pressure (PO2) from 10−6 to 10−1 Torr. When TS is relatively low (≲600 °C), homogeneous alloy films with a wurtzite ZnO structure are grown and predominantly paramagnetic, whereas inhomogeneous films of wurtzite ZnO phase mixed with rock-salt CoO and hexagonal Co phases form when TS is relatively high and PO2 is fairly low (≲10−5 Torr). The presence of Co clusters leads to room temperature ferromagnetism in inhomogeneous films. The temperature dependence of the magnetization for the homogeneous Zn1−xCoxO (x=0.25) films shows spin-glass behavior at low temperature and high temperature Curie–Weiss behavior with a large negative value of the Curie–Weiss temperature, indicating strong antiferromagnetic exchange coupl...

A detailed systematic study on the growth morphology of carbon nanotubes (CNTs) on Si in atmospheric pressure thermal chemical vapor deposition was undertaken. The role of NH3 for vertical alignment of CNTs was investigated. The direct cause for the alignment was a dense distribution of the catalytic metal particles, but that the particles are maintained catalytically active under amorphous carbon deposits was established by NH3. It allows a dense nucleation of the CNTs, and consequently, assists vertical alignment through entanglement and mechanical leaning among the tubes. The CNTs grew in a base growth mode. Since Ni is consumed both by silicide reaction and by capture into the growing tube, the growth stops when Ni is totally depleted. It occurs earlier for smaller particles, and thus a long time of growth results in a thin bottom with poor adhesion.

We report on the growth of spinel ZnCo2O4 films using reactive magnetron sputtering and their electrical and magnetic properties, with particular emphasis on the relation of Curie–Weiss temperature (TCW) and conduction type. The conduction type and carrier concentration in these films were found to be dependent on the oxygen partial pressure ratio in the sputtering gas mixture. The highest electron and hole concentration at 300 K were 1.37×1020 and 2.81×1020 cm−3, respectively. A ferromagnetic coupling (TCW>0) was observable in p-type ZnCo2O4, whereas an antiferromagnetic interaction (TCW

The effects of Mg codoping on the structural, electronic transport, and magnetic properties of GaMnN films are investigated. Mg was shown to compete with Mn for incorporation into the growing films at impingement, and to replace Mn. The partial replacement of Mn by Mg in GaMnN has resulted in an increase of conductivity of the region. The enhanced transport property due to the highly efficient dopant Mg resulted in a remarkable increase of the saturation magnetization, indicating an interaction between Mn and Mg for the carrier-mediated ferromagnetism. The increased carrier population by Mg codoping enabled a full mediation among the Mn atoms, and consequently, suppressed the paramagnetic rise in the temperature-dependent magnetization measurement.

GaMnN and Mg-codoped GaMnN films were grown in molecular beam epitaxy using a GaN single precursor. The structural, electrical, and magnetic properties were examined. The Mg-codoped GaMnN layers revealed room-temperature ferromagnetism. Codoping with Mg reduces the Mn incorporation, but increases the conductivity of the GaMnN films. At the same time, the saturation magnetization and coercivity have increased at room temperature. As this improvement was obtained with much reduced Mn concentration of ∼0.3%, the crucial role of the carriers for carrier-induced ferromagnetism in magnetic semiconductors is observed.

GaMnN growth on GaAs (100) using a GaN single precursor via molecular beam epitaxy was undertaken. The grown layers revealed p-type conduction. It is confirmed that p-GaMnN reveals room temperature ferromagnetism with hysteresis loop having a coercivity of ∼100 Oe. The segregated phase showing a transition temperature of ∼200 K is assigned to Mn3GaN, and which enhances the conductivity of the surrounding GaMnN region. As a consequence, the GaMnN layer with segregation revealed an anomalous Hall effect at room temperature proving magnetotransport in GaMnN phase. The enhanced conductivity of GaMnN by the highly conductive second phase also revealed the importance of the role of the free carriers in the carrier-mediated ferromagnetism.

We have investigated the effects of rapid thermal annealing under vacuum on the CoFe-doped ZnO [Zn1−x(Co0.5Fe0.5)xO] films grown by reactive magnetron co-sputtering. At least up to x=0.15, the films have the single phase of the same wurtzite structure as pure ZnO. Ferromagnetism was observed for the CoFe-doped ZnO films. We found that rapid thermal annealing leads to a remarkable increase in the spontaneous magnetization of the CoFe-doped ZnO as well as the electron concentration. The annealing also leads to a significant increase in the Curie temperature (TC), resulting in room temperature ferromagnetism with TC>300 K for the CoFe-doped ZnO films.

A (NH4)2Sx solution treatment technique was applied to a GaAs metal‐semiconductor field‐effect transistor (MESFET) to improve the electrical properties of the transistor. The gate leakage current of the MESFET remarkably decreased while the drain breakdown voltage doubled to 30 V with the (NH4)2Sx treatment. The (NH4)2Sx treatment was found to effectively suppress the formation of donor‐type defects at the GaAs surface and to increase the Schottky barrier height.

C‐V measurements on normal isotype GaAs/Al0.3Ga0.7As heterojunctions grown via molecular beam epitaxy were undertaken in the temperature ranges between 300 and 4.2 K. For temperatures ≤100 K, we found a persistent conductivity effect due to the field emitted and then capture delayed electrons in the Si‐doped Al0.3Ga0.7As layer. These capture‐delayed free carriers lead to apparent increase of the base doping in the AlGaAs and consequent reappearance of the valley in the concentration‐versus‐distance profiles of the heterojunctions at temperatures ≤100 K. The resultant temperature dependence of the calculated conduction‐band offsets and the interface‐state densities were found to be an artefact. Apparent shifting of the heterointerface positions observed in inverted heterojunctions was not observed in the normal GaAs/AlGaAs heterojunctions. The normal heterostructure enabled us to distinguish and determine the concentration of each deep donor level.

The effects of growth temperature on the microscopic structure of GaN nucleation layers were studied in a synchrotron x-ray scattering experiment. As the growth temperature increases from 467 to 655 °C, the stacking of GaN changes from random stacking to a mixture of cubic and hexagonal stacking. With increasing the growth temperature, the order in the atomic layer positions in the out-of-plane direction increases and the mosaic distribution becomes narrow. The optimal photoluminescence spectrum was obtained on the GaN epilayer deposited on the nucleation layer grown at 505 °C.

We report the first realization of extremely low free‐carrier concentration (≤4×1010 cm−2) and high LN2 electron mobilities (∼1.8×105 cm2/V s) in the dark in inverted Al0.3Ga0.7As /GaAs(100) modulation‐doped structures. The obtained results are all the more remarkable since the structures do not involve any superlattice or graded barrier, δ doping, or large spacer layer thicknesses. We attribute the observed properties to the high quality of the ambient in the molecular beam epitaxy system and the use of optimized growth kinetics and procedure as determined from reflection high‐energy electron diffraction intensity behavior.

The magnetotransport properties of ferromagnetic Ga1−xMnxAs epilayers with Mn mole fractions in the range of x≈2.2%–4.4% were investigated using Hall effect measurements. The temperature-dependent Hall carrier concentration for a metallic sample with x≈2.2% was analyzed assuming an activation energy from two acceptor levels. It was found that the two acceptor levels with activation energies of 129.4 and 31.6 meV at B=0Oe decreased to 87.6 and 30.7 meV, respectively, at B=5kOe. The decrease in acceptor activation energy from 129.6 to 87.6 meV was due to the spin splitting of the Mn acceptor level in the ferromagnetic region, and was responsible for the increase in carrier concentration. From magnetic-field-dependent Hall resistance data, the Curie temperature was estimated to be TC=60 and 70 K for Ga1−xMnxAs samples with x≈2.2 and x≈4.4%, respectively. The magnetoresistance measurements confirmed that the anomalous Hall effect existed in these samples that showed metallic and insulating behavior, respectively.