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Journal of Applied Physics, Vol. 96, nº3 This work presents a study of intrinsic zinc oxide thin film as ozone sensor based on the ultraviolet sUVd photoreduction and subsequent ozone re oxidation of zinc oxide as a fully reversible process performed at room temperature. The films analyzed were produced by spray pyrolysis, dc and rf magnetron sputtering. The dc resistivity of the films produced by rf magnetron sputtering and constituted by nanocrystallites changes more than eight orders of magnitude when exposed to an UV dose of 4 mW/cm2. On the other hand, porous and textured zinc oxide films produced by spray pyrolysis at low substrate temperature exhibit an excellent ac impedance response where the reactance changes by more than seven orders of magnitude when exposed to the same UV dose, with a response frequency above 15 kHz, thus showing improved ozone ac sensing discrimination.

We have produced amorphous intrinsic silicon thin films by hot-wire plasma assisted chemical vapor deposition, a process that combines the traditional rf plasma and the recent hot-wire techniques. In this work we have studied the influence of hydrogen gas dilution and rf power on the surface morphology, composition, structure and electro-optical properties of these films. The results show that by using this deposition technique it is possible to obtain at moderate rf power and filament temperature, compact i-type silicon films with ημτ of the order of 10−5 cm2 V−1, without hydrogen dilution.

The energy band alignments at interfaces often determine the electrical functionality of a device. Along with the size reduction into the nanoscale, functional coatings become thinner than a nanometer. With the traditional analysis of the energy band alignment by in situ photoelectron spectroscopy, a critical film thickness is needed to determine the valence band offset. By making use of the Auger parameter, it becomes possible to determine the energy band alignment to coatings, which are only a few Angstrom thin. This is demonstrated with experimental data of Cu2O on different kinds of substrate materials.

We report high-performance ZnO thin-film transistor (ZnO-TFT) fabricated by rf magnetron sputtering at room temperature with a bottom gate configuration. The ZnO-TFT operates in the enhancement mode with a threshold voltage of 19V, a saturation mobility of 27cm2∕Vs, a gate voltage swing of 1.39V∕decade and an on/off ratio of 3×105. The ZnO-TFT presents an average optical transmission (including the glass substrate) of 80% in the visible part of the spectrum. The combination of transparency, high mobility, and room-temperature processing makes the ZnO-TFT a very promising low-cost optoelectronic device for the next generation of invisible and flexible electronics.

A linear array thin film position sensitive detector (LTFPSD) based on hydrogenated amorphous silicon (a‐Si:H) is proposed for the first time. Taking advantage of the optical properties presented by a‐Si:H devices, we have developed a LTFPSD with 128 integrated elements able to be used in 3D inspections/measurements. Each element consists of a one‐dimensional LTFPSD, based on a p‐i‐n diode produced in a conventional PECVD system, where the doped layers are coated with thin resistive layers to establish the required device equipotentials. By proper incorporation of the LTFPSD into an optical inspection camera it will be possible to acquire information about an object/surface, through the optical cross‐section method. The main advantages of this system, when compared with the conventional CCDs, are the low complexity of hardware and software used and that the information can be continuously processed (analog detection).

High conductivity in the off-state and low field-effect mobility compared to bulk properties is widely observed in the p-type thin-film transistors of Cu2O, especially when processed at moderate temperature. This work presents results from in situ conductance measurements at thicknesses from sub-nm to around 250 nm with parallel X-ray photoelectron spectroscopy. An enhanced conductivity at low thickness is explained by the occurrence of Cu(II), which is segregated in the grain boundary and locally causes a conductivity similar to CuO, although the surface of the thick film has Cu2O stoichiometry. Since grains grow with an increasing film thickness, the effect of an apparent oxygen excess is most pronounced in vicinity to the substrate interface. Electrical properties of Cu2O grains are at least partially short-circuited by this effect. The study focuses on properties inherent to copper oxide, although interface effects cannot be ruled out. This non-destructive, bottom-up analysis reveals phenomena which are commonly not observable after device fabrication, but clearly dominate electrical properties of polycrystalline thin films.

Solution-processed p-type oxide semiconductors have recently attracted increasing interests for the applications in low-cost optoelectronic devices and low-power consumption complementary metal-oxide-semiconductor circuits. In this work, p-type nickel oxide (NiOx) thin films were prepared using low-temperature solution process and integrated as the channel layer in thin-film transistors (TFTs). The electrical properties of NiOx TFTs, together with the characteristics of NiOx thin films, were systematically investigated as a function of annealing temperature. By introducing aqueous high-k aluminum oxide (Al2O3) gate dielectric, the electrical performance of NiOx TFT was improved significantly compared with those based on SiO2 dielectric. Particularly, the hole mobility was found to be 60 times enhancement, quantitatively from 0.07 to 4.4 cm2/V s, which is mainly beneficial from the high areal capacitance of the Al2O3 dielectric and high-quality NiOx/Al2O3 interface. This simple solution-based method for pr...

The aim of this work is to provide the basis for the interpretation, under steady state conditions, of the lateral photoeffect in p‐i‐n a‐Si:H one‐dimensional thin‐film position‐sensitive detectors (1D TFPSD) and the determination of its linear spatial detection limits, function of the device, and light spot source characteristics. This leads to the development of a model, based on the application of the Poisson, continuity, and current density equations in the p‐i‐n junction, where two thin resistive layers, as equipotentials, are considered on both sides of the doped layers. The experimental data recorded in 1D TFPSD devices with different performances are compared with the predicted curves and the obtained correlations discussed.

The application of hydrogenated amorphous silicon (a–Si:H) to optoelectronic devices are now well established as a viable low cost technology and is presently receiving much interest. Taking advantage of the properties of a–Si:H based devices, single and dual axis large area (up to 80×80 mm2) thin film position sensitive detectors (TFPSD) based on a–Si:H p–i–n diodes have been developed, produced by plasma enhanced chemical vapor deposition. In this study, the main optoelectronic properties presented by the TFPSD as well as their behavior under operation conditions, concerning its linearity and signal to noise ratio, are reported.

We have investigated the electrical properties of metal-semiconductor field-effect transistors (MESFET) based on amorphous oxide semiconductor channels. All functional parts of the devices were sputter-deposited at room temperature. The influence on the electrical properties of a 150 °C annealing step of the gallium-indium-zinc-oxide channel is investigated. The MESFET technology offers a simple route for processing of the transistors with excellent electrical properties such as low subthreshold swing of 112 mV/decade, gate sweep voltages of 2.5 V, and channel mobilities up to 15 cm2/V s.

The effects of zinc concentration on the performance of solution processed amorphous indium gallium zinc oxide (a-IGZO) thin film transistors (TFTs) have been investigated using high-k aluminum titanium oxide as gate dielectric. The x-ray diffraction results confirmed that all the IGZO channel layers are amorphous. The performance of a-IGZO TFTs were investigated in the linear regime operation. Highest linear field-effect mobility of 5.8 cm2/V s with an Ion/Ioff ratio of 6×107 and subthreshold swing of 0.28 V/dec were obtained for the a-IGZO (311) TFTs. The obtained performance of the a-IGZO TFTs is very promising for low-voltage display applications.

A nonvacuum and low temperature process for passivating transparent metal oxides based thin-film transistors is presented. This process uses the epoxy-based SU-8 resist which prevents device degradation against environmental conditions, vacuum or sputtering surface damage. The incorporation of SU-8 as a passivation layer is based on the ability of this polymer to provide features with high mechanical and chemical stability. With this approach, lithography is performed to pattern the resist over the active area of the device in order to form the passivation layer. The resulting transistors demonstrate very good electrical characteristics, such as μFE=61 cm2/V s, VON=−3 V, ON/OFF=4.4×109, and S=0.28 V/dec. Electrical behavior due to the SU-8/metal oxide interface characteristics is also reported on the basis of Fourier transform infrared analysis. In contrast, we demonstrate how sputtering of SiO2 as a passivation layer results in severely degraded devices that cannot be switched-off. In order to obtain pro...

P-type thin-film transistors (TFTs) using room temperature sputtered SnOx (x

This work was funded by the Portuguese Science Foundation (FCT-MCTES) through projects PTDC/CTM/73943/2006, PTDC/EEA-ELC/64975/2006, ERC 2008 Advanced Grant (INVISIBLE Contract No. 228144) and IT R&D program of MKE (Contract No. 2006-S079-03, Smart window with transparent electronic devices) from ETRI Korea. We thank K. Nomura for the Seebeck measurements and N. Franco for the XRD analysis. Copper oxide (Cu2 O) thin films were used to produce bottom gate p-type transparent thin-film transistors (TFTs). Cu2 O was deposited by reactive rf magnetron sputtering at room temperature and the films exhibit a polycrystalline structure with a strongest orientation along (111) plane. The TFTs exhibit improved electrical performance such as a field-effect mobility of 3.9 cm2 /V s and an on/off ratio of 2× 102. publishersversion published

Molybdenum (0–1 at. %) doped indium oxide thin films with high near-infrared (NIR) transparency and high carrier mobility were deposited on Corning-1737 glass substrates at 400 °C by a spray pyrolysis experimental technique. X-ray diffraction (XRD) analysis confirmed the cubic bixbyite structure of indium oxide. The preferred growth orientation along the (222) plane for the low Mo doping level (≤0.5 at. %) shifts to (400) for higher Mo doping levels (>0.6 at. %). The crystallite size extracted from the XRD data corroborates the changes in full width at half maximum due to the variation in Mo doping. A scanning electron microscopy study illustrated the evolution in the surface microstructure as a function of Mo doping. The negative sign of the Hall coefficient confirmed the n-type conductivity. A high carrier mobility of ∼122.4 cm2/V s, a carrier concentration of ∼9.5×1019 cm−3, a resistivity of ∼5.3×10−4 Ω cm, and a high figure of merit of ∼4.2×10−2 Ω−1 are observed for the films deposited with 0.5 at. % ...

Molybdenum doped (0–1 at. %) indium oxide thin films with high near infrared (NIR) transparency and carrier mobility were deposited on Corning-1737 glass substrates at 400 °C by spray pyrolysis experimental technique. Films with mobility as high as ∼149 cm2/V s were obtained when annealed in vacuum at 550 °C, which also possess carrier concentration of ∼1×1020 cm−3 and resistivity as low as ∼4.0×10−4 Ω cm. Further, both the average visible transmittance (500–800 nm) and the average NIR transmittance are >83%. This clearly shows that the transmittance is extended well into the NIR region.

High mobility bottom gate thin film transistors (TFTs) with an amorphous gallium tin zinc oxide (a-GSZO) channel layer have been produced by rf magnetron cosputtering using a gallium zinc oxide (GZO) and tin (Sn) targets. The effect of postannealing temperatures (200, 250, and 300°C) was evaluated and compared with two series of TFTs produced at room temperature (S1) and 150°C (S2) during the channel deposition. From the results, it was observed that the effect of postannealing is crucial for both series of TFTs either for stability as well as for improving the electrical characteristics. The a-GSZO TFTs (W∕L=50∕50μm) operate in the enhancement mode (n-type), present a high saturation mobility of 24.6cm2∕Vs, a subthreshold gate swing voltage of 0.38V/decade, a turn-on voltage of −0.5V, a threshold voltage of 4.6V, and an Ion∕Ioff ratio of 8×107, satisfying all the requirements to be used as active-matrix backplane.

The role of order and disorder on the electronic performances of n-type ionic oxides such as zinc oxide, gallium zinc oxide, and indium zinc oxide used as active (channel) or passive (drain/source) layers in thin film transistors (TFTs) processed at room temperature are discussed, taking as reference the known behavior observed in conventional covalent semiconductors such as silicon. The work performed shows that while in the oxide semiconductors the Fermi level can be pinned up within the conduction band, independent of the state of order, the same does not happen with silicon. Besides, in the oxide semiconductors the carrier mobility is not bandtail limited and so disorder does not affect so strongly the mobility as it happens in covalent semiconductors. The electrical properties of the oxide films (resistivity, carrier concentration, and mobility) are highly dependent on the oxygen vacancies (source of free carriers), which can be controlled by changing the oxygen partial pressure during the deposition...

Amorphous/nanocrystalline silicon pi′ii′n devices fabricated on micromachined glass substrates are integrated with oligonucleotide-derivatized gold nanoparticles for a colorimetric detection method. The method enables the specific detection and quantification of unamplified nucleic acid sequences (DNA and RNA) without the need to functionalize the glass surface, allowing for resolution of single nucleotide differences between DNA and RNA sequences—single nucleotide polymorphism and mutation detection. The detector’s substrate is glass and the sample is directly applied on the back side of the biosensor, ensuring a direct optical coupling of the assays with a concomitant maximum photon capture and the possibility to reuse the sensor.