1. Directing Self-Assembly Toward Perfection.
- Author
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Segalman, Rachel A.
- Subjects
- *
BLOCK copolymers , *SEMICONDUCTORS , *SEMICONDUCTOR industry , *LITHOGRAPHY , *MICROELECTRONICS , *INFORMATION retrieval , *COPOLYMERS , *POLYMERS , *ELECTRONIC industries - Abstract
The article discusses the development in directing self-assembly of block copolymers. This study focused on the nanoscale features of block copolymers as means of turning a pattern media in microelectronic applications. Researches are under way for a new route to nanopatterning which is very significant in optical lithography. The semiconductor industry needs intrinsic technology to answer for the demands in high-density features for data storage and computing speed. New applications are tested for further developments.
- Published
- 2008
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