1. Substrate-Dependent Growth Mode Control of MoS2 Monolayers: Implications for Hydrogen Evolution and Field-Effect Transistors.
- Author
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Min-Yeong Choi, Chang-Won Choi, Seong-Jun Yang, Hojeong Lee, Shinyoung Choi, Jun-Ho Park, Jong Heo, Si-Young Choi, and Cheol-Joo Kim
- Abstract
The control of domain sizes provides a powerful means to engineer the characteristics of monolayer (ML) MoS
2 films for specific applications including catalysts for hydrogen evolution and thin-film transistors. Here, we report an efficient way to control domain structures of MoS2 by substrate-dependent growth mode control. Deterministic control of growth modes, associated with catalytic intermediates, is introduced by utilizing different growth substrates in metal-organic chemical vapor deposition (MOCVD) of ML MoS2 . Na-Mo-O eutectic alloys formed by a soda lime (SL) substrate dominate the growth based on a vapor-liquid-solid (VLS) process, resulting in large-crystalline domains of MoS2 with a reduced density of liquid nuclei. On the other hand, MoO3-x seeds formed from an alkali aluminosilicate (AA) substrate accelerate nucleation via a vapor-solid-solid (VSS) process for nanocrystalline domains. ML MoS2 of nanocrystalline domains resulted in efficient hydrogen evolution reactions (HERs), while large-domain films showed better electron conductivity. [ABSTRACT FROM AUTHOR]- Published
- 2022
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