Search

At the outermost surface, aggregation states of polymers generally tend to alter to their most stable ones in response to their surrounding environment. We here apply a time-resolved contact angle measurement to study the rate of the surface reorganization of poly(methyl methacrylate) (PMMA) in water. By doing these measurements at various temperatures, it is possible to determine the apparent activation energy of the surface dynamics based on the relation of the surface relaxation time and temperature. Also, the sum-frequency generation spectroscopy revealed that the surface reorganization involves the conformational changes in the main chain part as well as the side chains. Hence, the dynamics observed here may reflect the segmental motion at the outermost region of the PMMA film, in which water plays as a plasticizer.

Thin films of a typical glassy polymer in alcohol nonsolvents were structurally characterized by specular neutron reflectivity (NR) and were found to be discernibly swollen. The extent of penetration by the nonsolvent was determined by the chain length of the alcohol. Treating this situation as one of a macroscopic phase separation, the interaction χ parameters for the polymer and nonsolvents combinations were extracted. This observation leads us to investigate the factors that control the nonsolvent/polymer interface, being an unusual example of a liquid/liquid interface. The fractional amount of nonsolvents at the substrate interface was higher than that in the internal region of the film. This segregation of a component in a phase-separated domain was explained in terms of an entropic factor.

Qualitatively different thickness dependences have been observed in the glass transition temperature, Tg, of polystyrene (PS) films supported by hydrogen-passivated silicon (H−Si). It has been suggested that upon annealing at high temperatures in air, the polymer/substrate interface of these films (i.e., PS/Si), though buried underneath the PS layer, might be oxidized, rendering the films a different polymer/substrate interface (i.e., PS/SiOx−Si), which may account for the different thickness dependences of the Tg observed. In this experiment, we examine if the buried substrate interface of PS/H−Si films can indeed be oxidized by annealing the films at 150 °C in air. Our result shows that a residual film does form on top of the H−Si surface, but it is a bound layer of PS. X-ray photoelectron spectroscopic (XPS) analyses and independence of the residual film on the initial PS thickness evidence that the H−Si substrate buried underneath a PS film is not oxidized by annealing. We discuss a possible explanati...

Microphase-separated structures of a poly(deuterated styrene-block-2-vinylpyridine) (dPS-b-P2VP) block copolymer in thin films were studied by neutron reflectivity (NR) and transmission electron microtomography (TEMT). The dPS-b-P2VP block copolymer shows a cylindrical morphology in the bulk state. The block copolymer was spun-coated on a Si substrate, which was extensively annealed (170 °C for 14 days) before the NR experiments. The annealed thin film showed a featureless NR profile, the reflectivity monotonically decreased with the increasing scattering vector along the depth direction of the thin film, qz. The portion of the dPS-b-P2VP block copolymer thin film used in the NR experiment was examined by TEMT, from which a three-dimensional (3D) morphology of the block copolymer thin film was successfully obtained. The 3D image clearly showed that the microphase-separated structure inside the thin film had a cylindrical morphology with some order along the depth, but almost no in-plane order. In order to...