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Studies the annealing effect on porosity of amorphous hydrogenated carbon films using a quartz crystal microbalance. Background to the study; Experimental procedures; Results and discussion.

Presents a study which reported the results of ellipsometry measurements performed during the growth of hydrogenated amorphous silicon thin films on crystalline silicon substrates. Formation of low-density microstructure in the initial stages of growth; Effect of sputtering on the glow-discharge decomposition of gases; Discussion on the pseudodielectric function trajectories.

Presents information on a study which extended in situ ellipsometry characterization of the nucleation and microstrucutral evolution of amorphous silicon (a-Si:H) to the effect of deposition parameters on these processes. Details about the structural evolution of a-Si:H; Important aspects of the ellipsometer/glow-discharge reactor system; General features of in situ trajectories.

Presents information on a study which analyzed the in situ ellipsometry measurements taken during the deposition of hydrogenated amorphous silicon on crystalline silicon substrates in a convention rf glow-discharge apparatus. Nucleation behavior of hydrogenated amorphous silicon; Experimental details; Results and discussion; Conclusions.

Engineered thin films consisting of periodic arrays of silicon microcrystallites in a hydrogenated amorphous silicon host matrix have been prepared by plasma-enhanced chemical vapor deposition where the hydrogen dilution of silane is modulated in multiple cycles. These types of films have been guided by a phase evolution diagram, depicting the deposition conditions and film thickness at which the material exhibits amorphous, microcrystalline, or mixed-phase (amorphous+microcrystalline) characteristics, developed for intrinsic Si:H prepared with varying H2 dilution on unhydrogenated a-Si:H. Real time spectroscopic ellipsometry (RTSE) has been used in situ to noninvasively determine the phase evolution of the resulting hydrogenated mixed-phase (amorphous+microcrystalline) silicon thin films and corroborated with dark-field transmission electron microscopy. Such tailored microstructures are of growing interest as components of thin film photovoltaic devices, and RTSE is shown to be a key technique for structure verification. [ABSTRACT FROM AUTHOR]

To take into account the presence of multiple light-induced defect states in hydrogenated amorphous silicon (a-Si:H) the evolution of the entire spectra of photoconductive subgap absorption, α(hν), has been analyzed. Using this approach two distinctly different light-induced defect states centered around 1.0 and 1.2 eV from the conduction band edge are clearly identified. Results are presented on their evolution and respective effects on carrier recombination that clearly point to the importance of these states in evaluating the stability of different a-Si:H solar cell materials, as well as elucidating the origin of the Staebler–Wronski effect. © 2003 American Institute of Physics. [ABSTRACT FROM AUTHOR]