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Perspectives about growth of bulk gallium nitride crystals, fabricating high structural quality gallium nitride wafers and the market demand for them are presented. Three basic crystal growth technologies, halide vapor phase epitaxy, sodium flux, and ammonothermal, are described. Their advantages and disadvantages, recent development, and possibilities are discussed. The main difficulty with crystallization of thick GaN is determined. Some new solutions for bulk growth are proposed. It is shown that only crystallization on high structural quality native seeds will ensure proper progress. New ideas for fabricating gallium nitride crystals and wafers with a better control of their structural properties and point defect concentration are proposed. [ABSTRACT FROM AUTHOR]

Unscreened (ungated) plasmons in large-area grating-gate AlGaN/GaN heterostructures were studied experimentally by Fourier-transform spectroscopy. Special attention was paid to the recently discovered THz plasmonic crystal modes observed at totally depleted gated regions when plasma oscillations were localized only in ungated parts of the grating-gate structures. The frequency of these modes is still gate voltage-dependent in the limited range due to the depletion of the ungated parts located close to the gate edges. Double gate structures with an additional bottom gate were fabricated and studied to improve the gate voltage tunability of the unscreened plasmons. Since this gate is located deep below the channel, the plasmons behaved as ungated ones, but their frequency still could be tuned by this bottom gate. We show that the combined effect of the top and bottom gates allows the efficient tuning of terahertz frequencies of unscreened modes in the grating-gate AlGaN/GaN plasmonic crystals. [ABSTRACT FROM AUTHOR]

In this letter, the authors demonstrate large size m-plane GaN substrates grown by ammonothermal method. These substrates have excellent structural quality. The concentration of threading dislocation density is below 5×104 cm-2 and the full width at half maximum for the symmetrical and asymmetrical peaks equals 16 and 19 arc sec, respectively. Also good optical quality, the energy gap-related transition is clearly observed at room temperature in photoluminescence and contactless electroreflectance spectra. GaN epilayers deposited on these substrates exhibit intrinsic narrow exciton lines which are very sensitive to the optical selection rules typical for hexagonal symmetry, proving truly nonpolar character of the material. [ABSTRACT FROM AUTHOR]

Zinc is often regarded as an alternative to magnesium p-type dopants in gallium nitride. However, besides many theoretical predictions, at present, there are poor data on experimentally revealed p-type conductivity and evaluation of Zn activation energy by means of electrical transport measurements. In this paper, ammonothermal crystallization of bulk GaN:Zn monocrystals is reported. Despite a high doping level of Zn (up to 2 × 1020 cm−3), p-type conductivity with hole concentration as low as of 4 × 1015 cm−3 at room temperature and mobility about 3 cm2/V s was observed. A deep nature of the Zn acceptor was proved, as the ionization energy can exceed 260 meV. In addition, conduction in the impurity band appeared at temperatures as high as room temperature. [ABSTRACT FROM AUTHOR]

We studied the structural and optical properties of state-of-the-art non-polar bulk GaN grown by the ammonothermal method. The investigated samples have an extremely low dislocation density (DD) of less than 5 × 104 cm-2, which results in very narrow high-resolution x-ray rocking curves. The a and c lattice parameters of these stress-free GaN samples were precisely determined by using an x-ray diffraction technique based on the modified Bond method. The obtained values are compared to the lattice parameters of free-standing GaN from different methods and sources. The observed differences are discussed in terms of free-electron concentrations, point defects, and DD. Micro Raman spectroscopy revealed a very narrow phonon linewidth and negligible built-in strain in accordance with the high-resolution x-ray diffraction data. The optical transitions were investigated by cathodoluminescence measurements. The analysis of the experimental data clearly demonstrates the excellent crystalline perfection of ammonothermal GaN material and its potential for fabrication of non-polar substrates for homoepitaxial growth of GaN based device structures. [ABSTRACT FROM AUTHOR]

Room temperature contactless electroreflectance (CER) has been applied to study optical transitions and the distribution of the built-in electric field in AlGaN/GaN heterostructures grown on c-, a-, m-, and (20.1)-plane GaN substrates obtained by the ammonothermal method. It has been clearly shown that polarization effects in the AlGaN/GaN heterostructures grown on the c-plane lead to a strong built-in electric field in the AlGaN layer. The aforementioned field was determined to be ∼0.43 MV/cm from the period of Franz-Keldysh oscillations (FKOs). In addition, polarization effects lead to the formation of a two dimensional electron gas at the AlGaN/GaN interface, which screens the band bending modulation in the GaN buffer layer, and, therefore, GaN-related excitonic transitions are not observed for this heterostructure. Such features/effects are also not observed in the AlGaN/GaN heterostructures grown on nonpolar and semipolar GaN substrates because any strong polarization effects are not expected in this case. For these heterostructures, very strong and sharp GaN excitonic resonances are clearly visible in CER spectra. The resonances are very similar to the excitonic transitions observed for the GaN epilayers deposited on nonpolar and semipolar substrates. Moreover, there is a very weak AlGaN-resonance without FKO for nonpolar and semipolar heterostructures instead of the strong AlGaN-related FKO, which is typical of polar AlGaN/GaN heterostructures. [ABSTRACT FROM AUTHOR]