1. Texture development and grain boundary faceting in an excimer laser-crystallized silicon thin film.
- Author
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Sung Bo Lee, Jaehyun Moon, Choong-Heui Chung, Yong-Hae Kim, Jin Ho Lee, and Duck-Kyun Choi
- Subjects
THIN films ,SILICON ,CRYSTALLIZATION ,PHYSICAL & theoretical chemistry ,PHYSICS - Abstract
A 50-nm-thick amorphous silicon film on a SiO
2 substrate is crystallized by an excimer laser-induced sequential lateral solidification. In the crystallized film, the laser scanning direction has a tendency to generate the <100> texture formation, whereas the surface normal and another in-plane orientation (normal to the scanning direction), designated as rolling direction, do not reveal any distinct texture development. Some grain boundaries are faceted, suggesting having a low trap density. Thus, the presence of the faceted grain boundaries is favorable for polycrystalline silicon electronic devices, such as thin film transistors and solar cells. A further grain boundary faceting might be induced by annealing processes. [ABSTRACT FROM AUTHOR]- Published
- 2006
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