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dc biasing of silicon-anoded silver metaphosphate glass with a pulse train enabled us to follow the process of conduction-induced oxidation of silicon. Biasing with 1000 or 500 V/cm at or below 140°C induced formation of a dielectric oxide having capacitance of around 10[sup -7] F cm[sup -2]. From a large relaxation time of polarization involved, e.g., 10[sup -4] S at 140°C, it is suggested that the oxide is not the genuine silicon dioxide. [ABSTRACT FROM AUTHOR]

Presents a comprehensive description of the current response of any medium to an alternating current electric field by using complex notations for conduction and polarization terms in Maxwell equation and by discriminating each of them. Equation of complex dielectric constant; Absorption coefficients of alkali metals at room temperature; Number of electrons per gold atom as a function of photon energy.

Presents a study which compared the nuclear magnetic resonance, dielectric, and thermally stimulated polarization/depolarization data between poly(vinylidene fluoride) and alkali silicate glass. Information on poly(vinylidene fluoride); Discussion; Conclusion.

Highlights a study which analyzed the injection of field-induced silver into glass, in the time domain. Injection of heavy metals into glass; Details on the changes in the properties of silver; Methodology used to conduct the study; Results of the study.

Diamond has been obtained by ArF excimer laser-induced chemical vapor deposition. The reaction was carried out by use of C2H2 diluted with H2 as a source gas and at the pressure range of 8–75 Torr. The products were characterized by scanning electron microscopy and reflection electron diffraction. Deposits prepared in the temperature range of 40–800 °C, which were measured by the thermocouple attached to the substrate, show several lines of diamond in the reflection electron diffraction photographs. The fact that the laser beam must be concentrated for the diamond formation to occur strongly suggests that the reaction proceeds through a multiple photon process. [ABSTRACT FROM AUTHOR]

Presents a correction to an article previously published in the periodical 'Applied Physics Letters.' Names of authors that were missing.