1. Growth of Bi2Te3 topological insulator ultra-thin layers via molecular beam epitaxy on GaAs (100).
- Author
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Rodrigues, Leonarde N., de Araujo, C. I. L., Mello, S. L. A., Laverock, J., Fonseca, Jakson M., Schwarzacher, W., Inoch, Wesley F., and Ferreira, Sukarno O.
- Subjects
MOLECULAR beam epitaxy ,TOPOLOGICAL insulators ,ATOMIC force microscopy ,AUDITING standards ,PHOTOELECTRON spectroscopy - Abstract
Ultra-thin layers (< 8 nm) of a Bi 2 Te 3 topological insulator have been grown on GaAs (100) substrates using molecular beam epitaxy. The growth was performed from a single Bi 2 Te 3 effusion cell and one source of extra tellurium. Optical and structural characterizations were carried out through Raman spectroscopy, x-ray diffraction, atomic force microscopy, and scanning electron microscopy. The topological insulator properties were also investigated by angle-resolved photoelectron spectroscopy. A layer of 5 nm showed Dirac cone-like linear electronic band dispersion, indicating the signature of a topological insulator with the Dirac point having large binding energy relative to the Fermi level as expected for ultra-thin films. Topological insulator properties were also investigated at the initial growth stage where deposition follows an islandlike growth mode. Our results can contribute to the development of practical chalcogenide-based thin-film spintronics devices. [ABSTRACT FROM AUTHOR]
- Published
- 2023
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