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α-Al2O3 is renowned for its extensive bandgap and diverse applications in electronic and optoelectronic devices. Employing density-functional theory-based methods, this study investigates the feasibility of chalcogen doping (S, Se, Te) in α-Al2O3. Standard modeling tools are utilized to construct α-Al2O3 supercells, focusing on the calculations of individual chalcogen-related and native point defects resulting from single-atom doping. Our analysis systematically explores the formation energies and transition levels associated with chalcogen (S, Se, Te) doping in oxygen (or aluminum) sites in Al-rich (or O-rich) limits. We observe a trend where increasing atomic number (from S to Te) correlates with a higher difficulty in forming anion-doped α-Al2O3, but a lower barrier to cationic doping. The results indicate a preferential substitution of chalcogen atoms for aluminum in O-rich environments. Specifically, in varying oxygen conditions, the dominant defect types, their prevalence, and defect formation energies in α-Al2O3 are significantly altered following chalcogen doping, offering new insights into defect processes in α-Al2O3. [ABSTRACT FROM AUTHOR]

α-Al2O3 is renowned for its extensive bandgap and diverse applications in electronic and optoelectronic devices. Employing density-functional theory-based methods, this study investigates the feasibility of chalcogen doping (S, Se, Te) in α-Al2O3. Standard modeling tools are utilized to construct α-Al2O3 supercells, focusing on the calculations of individual chalcogen-related and native point defects resulting from single-atom doping. Our analysis systematically explores the formation energies and transition levels associated with chalcogen (S, Se, Te) doping in oxygen (or aluminum) sites in Al-rich (or O-rich) limits. We observe a trend where increasing atomic number (from S to Te) correlates with a higher difficulty in forming anion-doped α-Al2O3, but a lower barrier to cationic doping. The results indicate a preferential substitution of chalcogen atoms for aluminum in O-rich environments. Specifically, in varying oxygen conditions, the dominant defect types, their prevalence, and defect formation energies in α-Al2O3 are significantly altered following chalcogen doping, offering new insights into defect processes in α-Al2O3. [ABSTRACT FROM AUTHOR]

In recent years, memristors have garnered significant attention, particularly those based on the oxygen vacancy-driven filamentary conduction mechanism. However, studies utilizing single-crystal materials for memristors remain scarce. This study investigates memristive effect of Se-implanted β-Ga2O3 single-crystal material, fabricated through ion implantation. X-ray photoelectron spectroscopy and depth profiling revealed that Se doping significantly increased the concentration of oxygen vacancies, crucial for resistive switching (RS). Electrical testing demonstrated stable and repeatable resistive switching behavior, attributed to the filamentary conduction mechanism driven by oxygen vacancies. These findings highlight the potential of ion implantation for tuning the surface properties of Ga2O3-based memristors, advancing their application in next-generation electronic devices. [ABSTRACT FROM AUTHOR]