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We report on the structural and optical properties of heteroepitaxial II–VI CdTe (211)B buffer layers with strained CdZnTe/CdTe superlattice layers, investigated by employing non-destructive methods including high-resolution x-ray diffraction, cathodoluminescence, and photoluminescence spectroscopy. X-ray diffraction reciprocal space mapping measurements revealed that the superlattice layers are coherently strained, leading to a spread in x-ray double-crystal rocking curve full-width at half-maximum values but better in-plane lattice-matching with HgCdTe. Both cross-sectional cathodoluminescence and photoluminescence measurements confirm the coherent growth of superlattice layers and their dislocation filtering effects. Both these techniques in CdTe layers are found to be well correlated with the dislocation density as determined by etch pit density measurements. The results indicate the potential of these non-destructive methods to be further developed into general-purpose techniques capable of characterizing the defect evolution in semiconductor heteroepitaxy. [ABSTRACT FROM AUTHOR]

A simple means of detecting and spatially mapping volatile and nonvolatile conductive filaments in metal/oxide/metal cross-point devices is introduced, and its application demonstrated. The technique is based on thermal discolouration of a thin photoresist layer deposited on the top electrode (TE) of the cross-point device and relies on the increase in temperature produced by local Joule heating of an underlying conductive filament. Finite element modelling of the temperature distribution and its dependencies shows that the maximum temperature at the TE/photoresist interface is particularly sensitive to the TE thickness. The technique is demonstrated on NbOx-based metal-oxide-metal cross-point devices with a 25 nm thick top (Pt) electrode, where it is used to undertake a statistical analysis of the filament location as a function of device area. This shows that filament formation is heterogeneous; the majority of filaments form preferentially along the TE edge, and the fraction of these increases with the decreasing device area. Transmission electron microscopy of the top and bottom electrode edges is used to explain this observation and suggests that it is due to a reduction in the effective oxide thickness in this region. [ABSTRACT FROM AUTHOR]

The ever-present demand for high-performance HgCdTe infrared detectors with larger array size and lower cost than currently available technologies based on lattice-matched CdZnTe (211)B substrates has fuelled research into heteroepitaxial growth of HgCdTe and CdTe buffer layers on lattice-mismatched alternative substrates with a (211)B orientation. Driven by the large lattice mismatch, the heteroepitaxial growth of (Hg)CdTe can result in (133)B-orientated material, which, however, has been less explored in comparison to (211)B-oriented growth. Herein, we report on the structural properties of heteroepitaxially grown single-crystal II–VI CdTe (133)B-oriented buffer layers on III–V GaAs (211)B substrates. Azimuthal-dependent x-ray double-crystal rocking curve measurements for the CdTe buffer layers show that the full-width at half-maximum value obtained along the GaAs [ 1 ¯ 11 ] direction is narrower than that obtained along the GaAs [ 01 1 ¯ ] direction, which is presumably related to the in-plane anisotropic structural characteristics of the grown CdTe layers. By incorporating strained CdZnTe/CdTe superlattice-based dislocation filtering layers (DFLs), a significant improvement in material quality has been achieved in (133)B-orientated CdTe buffer layers, including a reduced etch pit density in the low-105 cm−2 range and improved surface roughness. These results indicate that the CdTe (133)B DFL buffer layer process is a feasible approach for growing high-quality CdTe and HgCdTe materials on large-area, low-cost alternative substrates. [ABSTRACT FROM AUTHOR]