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Start Over Author "Petit B" Publisher american institute of physics
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3. Plasma etching in magnetic multipole microwave discharge.

Author

Arnal, Y., Pelletier, J., Pomot, C., Petit, B., and Durandet, A.

Subjects
PLASMA etching, MAGNETIC balances, ETCHING, ION energy, ETCHING reagents
Abstract

A plasma etching reactor is described which associates surface magnetic confinement, microwave discharge, and independently controlled substrate biasing. Preliminary measurements show that the reactor produces reactive plasmas allowing anisotropic fine line etching at low ion energy. [ABSTRACT FROM AUTHOR]

Published
1984
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