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1. An elastic-support model for enhanced bistable piezoelectric energy harvesting from random vibrations.

2. Highly accurate simplified lattice Boltzmann method.

3. Immersed boundary-simplified lattice Boltzmann method for incompressible viscous flows.

4. Broadband incoherent four-wave mixing and 27 dB idler conversion efficiency using ultra-silicon rich nitride devices.

5. Enhanced optical nonlinearities in CMOS-compatible ultra-silicon-rich nitride photonic crystal waveguides.

6. Kerr nonlinearity and multi-photon absorption in germanium at mid-infrared wavelengths.

7. Three-dimensional simplified and unconditionally stable lattice Boltzmann method for incompressible isothermal and thermal flows.

8. Enhancement of the EUV Emission of a Metallic Capillary Discharge Operated with Argon Ambient Gas.

9. An Extensive Study on the Boron Junctions Formed by Optimized Pre-Spike/Multiple-Pulse Flash Lamp Annealing Schemes: Junction Formation, Stability and Leakage.

10. Ultra-Shallow Junction Formation—Physics and Advanced Technology.

11. On-chip chalcogenide glass waveguide-integrated mid-infrared PbTe detectors.

12. On-chip mid-infrared gas detection using chalcogenide glass waveguide.

13. Group velocity dispersion and self phase modulation in silicon nitride waveguides.

14. Coupled chirped vertical gratings for on-chip group velocity dispersion engineering.

15. A low-cost method of forming epitaxy SiGe on Si substrate by laser annealing.

16. Vacancy engineering by optimized laser irradiation in boron-implanted, preamorphized silicon substrate.

17. Optical pulse compression on a silicon chip-Effect of group velocity dispersion and free carriers.

18. Robust reconstruction of equivalent source method based near-field acoustic holography using an alternative regularization parameter determination approach.

19. An experimental technique of split Hopkinson pressure bar using fiber micro-displacement interferometer system for any reflector.

20. Modulation of surface reactivity via electron confinement in metal quantum well films: O2 adsorption on PbSi(111).

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